Patents Assigned to Translucent Inc.
  • Patent number: 9917193
    Abstract: A method of growing III-N semiconducting material on a silicon substrate including the steps of growing a layer of epitaxial rare earth oxide on a single crystal silicon substrate and modifying the surface of the layer of epitaxial rare earth oxide with nitrogen plasma. The method further includes the steps of growing a layer of low temperature epitaxial gallium nitride on the modified surface of the layer of epitaxial rare earth oxide and growing a layer of bulk epitaxial III-N semiconductive material on the layer of low temperature epitaxial gallium nitride.
    Type: Grant
    Filed: August 30, 2016
    Date of Patent: March 13, 2018
    Assignee: TRANSLUCENT, INC.
    Inventors: Rytis Dargis, Andrew Clark, Nam Pham, Erdem Arkun
  • Patent number: 9824886
    Abstract: A method of forming a REO dielectric layer and a layer of a-Si between a III-N layer and a silicon substrate. The method includes depositing single crystal REO on the substrate. The single crystal REO has a lattice constant adjacent the substrate matching the lattice constant of the substrate and a lattice constant matching a selected III-N material adjacent an upper surface. A uniform layer of a-Si is formed on the REO. A second layer of REO is deposited on the layer of a-Si with the temperature required for epitaxial growth crystallizing the layer of a-Si and the crystallized silicon being transformed to amorphous silicon after transferring the lattice constant of the selected III-N material of the first layer of REO to the second layer of REO, and a single crystal layer of the selected III-N material deposited on the second layer of REO.
    Type: Grant
    Filed: October 27, 2014
    Date of Patent: November 21, 2017
    Assignee: TRANSLUCENT, INC.
    Inventors: Rytis Dargis, Andrew Clark, Erdem Arkun
  • Patent number: 9496132
    Abstract: A method of fabricating a layer of single crystal III-N material on a silicon substrate includes epitaxially growing a REO template on a silicon substrate. The template includes a REO layer adjacent the substrate with a crystal lattice spacing substantially matching the crystal lattice spacing of the substrate and selected to protect the substrate from nitridation. Either a rare earth oxynitride or a rare earth nitride is formed adjacent the upper surface of the template and a layer of single crystal III-N material is epitaxially grown thereon.
    Type: Grant
    Filed: March 18, 2013
    Date of Patent: November 15, 2016
    Assignee: Translucent, Inc.
    Inventors: Erdem Arkun, Andrew Clark, Rytis Dargis, Radek Roucka, Michael Lebby
  • Patent number: 9460917
    Abstract: A method of growing III-N semiconducting material on a silicon substrate including the steps of growing a layer of epitaxial rare earth oxide on a single crystal silicon substrate and modifying the surface of the layer of epitaxial rare earth oxide with nitrogen plasma. The method further includes the steps of growing a layer of low temperature epitaxial gallium nitride on the modified surface of the layer of epitaxial rare earth oxide and growing a layer of bulk epitaxial III-N semiconductive material on the layer of low temperature epitaxial gallium nitride.
    Type: Grant
    Filed: February 12, 2014
    Date of Patent: October 4, 2016
    Assignee: Translucent, Inc.
    Inventors: Rytis Dargis, Andrew Clark, Nam Pham, Erdem Arkun
  • Patent number: 9443939
    Abstract: A method of fabricating a rare earth oxide buffered III-N on silicon wafer including providing a crystalline silicon substrate, depositing a rare earth oxide structure on the silicon substrate including one or more layers of single crystal rare earth oxide, and depositing a layer of single crystal III-N material on the rare earth oxide structure so as to form an interface between the rare earth oxide structure and the layer of single crystal III-N material. The layer of single crystal III-N material produces a tensile stress at the interface and the rare earth oxide structure has a compressive stress at the interface dependent upon a thickness of the rare earth oxide structure. The rare earth oxide structure is grown with a thickness sufficient to provide a compressive stress offsetting at least a portion of the tensile stress at the interface to substantially reduce bowing in the wafer.
    Type: Grant
    Filed: October 27, 2015
    Date of Patent: September 13, 2016
    Assignee: Translucent, Inc.
    Inventors: Rytis Dargis, Erdem Arkun, Radek Roucka, Andrew Clark, Michael Lebby
  • Patent number: 9431526
    Abstract: A heterostructure grown on a silicon substrate includes a single crystal rare earth oxide template positioned on a silicon substrate, the template being substantially crystal lattice matched to the surface of the silicon substrate. A heterostructure is positioned on the template and defines at least one heterojunction at an interface between a III-N layer and a III-III-N layer. The template and the heterostructure are crystal matched to induce an engineered predetermined tensile strain at the at least one heterojunction. A single crystal rare earth oxide dielectric layer is grown on the heterostructure so as to induce an engineered predetermined compressive stress in the single crystal rare earth oxide dielectric layer and a tensile strain in the III-III-N layer. The tensile strain in the III-III-N layer and the compressive stress in the REO layer combining to induce a piezoelectric field leading to higher carrier concentration in 2DEG at the heterojunction.
    Type: Grant
    Filed: September 16, 2014
    Date of Patent: August 30, 2016
    Assignee: TRANSLUCENT, INC.
    Inventors: Rytis Dargis, Andrew Clark, Erdem Arkun
  • Patent number: 9360565
    Abstract: A monolithic integrated radiation detector includes a photodetector and a scintillator deposited directly on the photodetector. Preferably the photodetector is silicon and the scintillator is a rare earth phosphor. The rare earth phosphor is crystal lattice matched to the silicon by a transitional layer epitaxially grown therebetween.
    Type: Grant
    Filed: May 13, 2010
    Date of Patent: June 7, 2016
    Assignee: Translucent, Inc.
    Inventors: Andrew Clark, David L. Williams
  • Patent number: 9236249
    Abstract: A method of growing III-N material on a silicon substrate includes the steps of epitaxially growing a single crystal rare earth oxide on a silicon substrate, epitaxially growing a single crystal rare earth nitride on the single crystal rare earth oxide, and epitaxially growing a layer of single crystal III-N material on the single crystal rare earth nitride.
    Type: Grant
    Filed: July 11, 2013
    Date of Patent: January 12, 2016
    Assignee: TRANSLUCENT, INC.
    Inventors: Rytis Dargis, Robin Smith, Andrew Clark, Erdem Arkun, Michael Lebby
  • Patent number: 9142406
    Abstract: III-N material grown on a buffer on a substrate that includes one of a single crystal silicon or a single crystal sapphire. A buffer of single crystal alloy, including one of ErxAl1-xN or (RE1yRE21-y)xAl1-xN, is positioned on the substrate. A layer of single crystal III-N material is positioned on the surface of the buffer and the single crystal alloy has a lattice constant substantially crystal lattice matched to the layer of single crystal III-N material. When the III-N material is GaN, the x in the formula for the alloy varies from less than 1 adjacent the substrate to greater than or equal to 0.249 adjacent the layer of single crystal GaN.
    Type: Grant
    Filed: May 2, 2014
    Date of Patent: September 22, 2015
    Assignee: Translucent, Inc.
    Inventors: Rytis Dargis, Andrew Clark, Nam Pham, Erdem Arkun
  • Patent number: 9139934
    Abstract: Rare earth semiconductor and ferromagnetic material epitaxially grown on a silicon substrate includes a buffer of single crystal epitaxial rare earth/aluminum nitride positioned on a single crystal silicon substrate and a single crystal epitaxial rare earth oxide positioned on the single crystal epitaxial aluminum nitride. A layer of single crystal epitaxial semiconductor and ferromagnetic rare earth nitride is positioned on the buffer. A layer of III-V semiconductive material may be optionally positioned on the rare earth nitride layer.
    Type: Grant
    Filed: January 23, 2014
    Date of Patent: September 22, 2015
    Assignee: TRANSLUCENT, INC.
    Inventors: Rytis Dargis, Robin Smith, Andrew Clark
  • Patent number: 9105471
    Abstract: Rare earth oxy-nitride buffered III-N on silicon includes a silicon substrate with a rare earth oxide (REO) structure, including several REO layers, is deposited on the silicon substrate. A layer of single crystal rare earth oxy-nitride is deposited on the REO structure. The REO structure is stress engineered to approximately crystal lattice match the layer of rare earth oxy-nitride so as to provide a predetermined amount of stress in the layer of rare earth oxy-nitride. A III oxy-nitride structure, including several layers of single crystal rare earth oxy-nitride, is deposited on the layer of rare earth oxy-nitride. A layer of single crystal III-N nitride is deposited on the III oxy-nitride structure. The III oxy-nitride structure is chemically engineered to approximately crystal lattice match the layer of III-N nitride and to transfer the predetermined amount of stress in the layer of rare earth oxy-nitride to the layer of III-N nitride.
    Type: Grant
    Filed: August 3, 2011
    Date of Patent: August 11, 2015
    Assignee: TRANSLUCENT, INC.
    Inventors: Andrew Clark, Erdem Arkun, Robin Smith, Michael Lebby
  • Patent number: 8994032
    Abstract: III-N material grown on a buffer on a silicon substrate includes a single crystal electrically insulating buffer positioned on a silicon substrate. The single crystal buffer includes rare earth aluminum nitride substantially crystal lattice matched to the surface of the silicon substrate, i.e. a lattice co-incidence between REAlN and Si better than a 5:4 ratio. A layer of single crystal III-N material is positioned on the surface of the buffer and substantially crystal lattice matched to the surface of the buffer.
    Type: Grant
    Filed: March 4, 2013
    Date of Patent: March 31, 2015
    Assignee: Translucent, Inc.
    Inventors: Erdem Arkun, Andrew Clark, Rytis Dargis
  • Patent number: 8889978
    Abstract: A method of depositing III-V solar collection materials on a GeSn template on a silicon substrate including the steps of providing a crystalline silicon substrate and epitaxially growing a single crystal GeSn layer on the silicon substrate using a grading profile to grade Sn through the layer. The single crystal GeSn layer has a thickness in a range of approximately 3 ?m to approximately 5 ?m. A layer of III-V solar collection material is epitaxially grown on the graded single crystal GeSn layer. The graded single crystal GeSn layer includes Sn up to an interface with the layer of III-V solar collection material.
    Type: Grant
    Filed: September 14, 2012
    Date of Patent: November 18, 2014
    Assignee: Translucent, Inc.
    Inventors: Radek Roucka, Michael Lebby, Scott Semans
  • Patent number: 8878188
    Abstract: A rare earth oxide gate dielectric on III-N material grown on a silicon substrate includes a single crystal stress compensating template positioned on a silicon substrate. The stress compensating template is substantially crystal lattice matched to the surface of the silicon substrate. A GaN structure is positioned on the surface of the stress compensating template and substantially crystal lattice matched thereto. An active layer of single crystal III-N material is grown on the GaN structure and substantially crystal lattice matched thereto. A single crystal rare earth oxide dielectric layer is grown on the active layer of III-N material.
    Type: Grant
    Filed: February 22, 2013
    Date of Patent: November 4, 2014
    Assignee: Translucent, Inc.
    Inventors: Rytis Dargis, Robin Smith, Andrew Clark, Erdem Arkun, Michael Lebby
  • Patent number: 8872308
    Abstract: III-N material grown on a silicon substrate includes a single crystal rare earth oxide layer positioned on a silicon substrate. The rare earth oxide is substantially crystal lattice matched to the surface of the silicon substrate. A first layer of III-N material is positioned on the surface of the rare earth oxide layer. An inter-layer of aluminum nitride (AlN) is positioned on the surface of the first layer of III-N material and an additional layer of III-N material is positioned on the surface of the inter-layer of aluminum nitride. The inter-layer of aluminum nitride and the additional layer of III-N material are repeated n-times to reduce or engineer strain in a final III-N layer. A cap layer of AlN is grown on the final III-N layer and a III-N layer of material with one of an LED structure and an HEMT structure is grown on the AlN cap layer.
    Type: Grant
    Filed: February 20, 2013
    Date of Patent: October 28, 2014
    Assignee: Translucent, Inc.
    Inventors: Erdem Arkun, Michael Lebby, Andrew Clark, Rytis Dargis
  • Patent number: 8846504
    Abstract: A method of growing GaN material on a silicon substrate includes providing a single crystal silicon substrate with a (100) surface orientation or a (100) with up to a 10° offset surface orientation and using epi-twist technology, epitaxially growing a single crystal stress managing layer on the silicon substrate. The single crystal stress managing layer includes rare earth oxide with a (110) crystal orientation and a cubic crystal structure. The method further includes epitaxially growing a single crystal buffer layer on the stress managing layer. The single crystal buffer layer includes rare earth oxide with a lattice spacing closer to a lattice spacing of GaN than the rare earth oxide of the stress managing layer. Epitaxially growing a layer of single crystal GaN material on the surface of the buffer, the GaN material having one of a (11-20) crystal orientation and a (0001) crystal orientation.
    Type: Grant
    Filed: November 8, 2013
    Date of Patent: September 30, 2014
    Assignee: Translucent, Inc.
    Inventors: Rytis Dargis, Andrew Clark, Erdem Arkun, Radek Roucka
  • Patent number: 8835955
    Abstract: A silicon-on-insulator (SOI) substrate structure and method of fabrication including a single crystal silicon substrate, a layer of single crystal rare earth oxide formed on the substrate, a layer of engineered single crystal silicon formed on the layer of single crystal rare earth oxide, and a single crystal insulator layer of IIIOxNy formed on the engineered single crystal silicon layer. In some embodiments the III material in the insulator layer includes more than on III material. In a preferred embodiment the single crystal rare earth oxide includes Gd2O3 and the single crystal insulator layer of IIIOxNy includes one of AlOxNy and AlGaOxNy.
    Type: Grant
    Filed: August 30, 2011
    Date of Patent: September 16, 2014
    Assignee: Translucent, Inc.
    Inventors: Erdem Arkun, Rytis Dargis, Andrew Clark, Michael Lebby
  • Patent number: 8823025
    Abstract: III-N material grown on a silicon substrate includes a single crystal buffer positioned on a silicon substrate. The buffer is substantially crystal lattice matched to the surface of the silicon substrate and includes aluminum oxynitride adjacent the substrate and aluminum nitride adjacent the upper surface. A first layer of III-N material is positioned on the upper surface of the buffer. An inter-layer of aluminum nitride (AlN) is positioned on the first III-N layer and an additional layer of III-N material is positioned on the inter-layer. The inter-layer of aluminum nitride and the additional layer of III-N material are repeated n-times to reduce or engineer strain in a final III-N layer.
    Type: Grant
    Filed: February 20, 2013
    Date of Patent: September 2, 2014
    Assignee: Translucent, Inc.
    Inventors: Erdem Arkun, Michael Lebby, Andrew Clark, Rytis Dargis
  • Patent number: 8823055
    Abstract: A method of forming a template on a silicon substrate includes providing a single crystal silicon substrate. The method further includes epitaxially depositing a layer of rare earth oxide on the surface of the silicon substrate. The rare earth oxide being substantially crystal lattice matched to the surface of the silicon substrate. The method further includes forming an aluminum oxide layer on the rare earth oxide, the aluminum oxide being substantially crystal lattice matched to the surface of the rare earth oxide and epitaxially depositing a layer of aluminum nitride (AlN) on the aluminum oxide layer substantially crystal lattice matched to the surface of the aluminum oxide.
    Type: Grant
    Filed: December 17, 2012
    Date of Patent: September 2, 2014
    Assignee: Translucent, Inc.
    Inventors: Erdem Arkun, Michael Lebby, Andrew Clark, Rytis Dargis
  • Patent number: 8796121
    Abstract: A method of forming a REO dielectric layer and a layer of a-Si between a III-N layer and a silicon substrate. The method includes depositing single crystal REO on the substrate. The single crystal REO has a lattice constant adjacent the substrate matching the lattice constant of the substrate and a lattice constant matching a selected III-N material adjacent an upper surface. A uniform layer of a-Si is formed on the REO. A second layer of REO is deposited on the layer of a-Si with the temperature required for epitaxial growth crystallizing the layer of a-Si and the crystallized silicon being transformed to amorphous silicon after transferring the lattice constant of the selected III-N material of the first layer of REO to the second layer of REO, and a single crystal layer of the selected III-N material deposited on the second layer of REO.
    Type: Grant
    Filed: November 19, 2013
    Date of Patent: August 5, 2014
    Assignee: Translucent, Inc.
    Inventors: Rytis Dargis, Andrew Clark, Erdem Arkun