Abstract: An apparatus, system, and method are disclosed for a polishing chamber assembly. An apparatus includes an inner drum positioned on a first axis and forming an inner chamber interior to the inner drum. The inner drum includes an object intake coupled to the inner drum at a proximal end of the inner drum and an object outlet disposed at a distal end of the inner drum. The apparatus includes an agitator configured to polish objects within the inner drum as the objects move from the object intake to the object outlet. The agitator is disposed within the inner drum and is removably coupled to a rotation element disposed on an end of the inner drum. The apparatus includes an outer drum disposed around the inner drum, which is removably coupled to the outer drum. The outer drum is releasably couplable to a base unit using attachment means.

Abstract: An apparatus, system, and method are disclosed for a polishing chamber assembly. An apparatus includes an inner drum positioned on a first axis and forming an inner chamber interior to the inner drum. The inner drum includes a plurality of inner drum perforations formed in the inner drum, an object intake disposed tangential to the inner drum at a proximal end of the inner drum, and an object outlet disposed at a distal end of the inner drum. The apparatus includes an outer drum disposed around the inner drum and forming an annular chamber interior to the outer drum and exterior to the inner drum. A cyclonic gas flow is generated within the apparatus from the object intake to a gas outlet in response to drawing gas from the apparatus through the gas outlet to remove debris from objects within the inner drum.