Abstract: A Fizeau interferometer (10) producing spherical test and reference wavefronts (34 and 36) is operated with a linear translator (50) for making a sequence of subaperture measurements of an aspherical test surface (40). Separate phase maps (88 and 90) are assembled at different focus positions (54 and 56) along a common optical axis (52) of the interferometer (10) and aspherical test surface (40). Respective null zones (92 and 94) are isolated from the phase maps (88 and 90) and are combined to form a composite phase map (100) defining differences between the aspherical test surface (40) and a family of spheres.

Abstract: Optimum solutions for three-mirror lenses for projection lithography cameras using X-ray radiation to image a mask on a wafer are represented as single points within regions of two-dimensional magnification space defined by the magnification of a convex mirror as one coordinate and the ratio of the magnifications of a pair of concave mirrors optically on opposite sides of the convex mirror as another coordinate. Lenses within region 30, 50, and preferably within region 40, 60, of such magnification space represent potential solutions that are optimizable by standard computer optical design programs and techniques to achieve extremely low distortion lenses having a resolution of about 0.1 micron or less. Two of these lens systems having large chief ray angles at the mask and chief rays inclined away from the optical axis of the lens system in a direction from the source toward the mask are described in more detail.

Abstract: An interferometer (14) performs three topographical measures of an artifact (12) to determine taper between opposing surfaces (50 and 52) of the artifact (12) mounted on three points of support (30, 32, and 34). Two sets of three data points (60, 62, and 64 and 68, 70, and 72) are extracted from the first topographical measure and are used to calculate irregularities in one of the opposing surfaces (50). The second two topographical measures are made of the other artifact surface (52). Taper between the opposing surfaces (50 and 52) is calculated independently of both the surface irregularities and any angular deviations of the three points of support (30, 32, and 34).