Abstract: The invention relates to a multicore processor and a method for dynamically adjusting a supply voltage and a clock frequency, with which an individual supply voltage and dock frequency adjustment, which depends on a current computing load, is facilitated for each processor core of a multicore processor. Thus, an assembly is disclosed where a local queue memory unit which is connected to the processor core, the internal memory unit, and the level converter is arranged in a voltage-variable region of the processor element in order to store events to be processed by the processor core. The invention is also directed to a method in that the required supply voltage U and the required clock frequency f are adjusted for each cycle in a controlled manner by the processor core of the respective processor element depending on the detection of a number of events to be processed which are stored in an internal queue memory unit.
Type:
Application
Filed:
May 18, 2018
Publication date:
April 29, 2021
Applicant:
TU DRESDEN
Inventors:
SEBASTIAN HÖPPNER, BERNHARD VOGGINER, YEXIN YAN, CHRISTIAN MAYR
Abstract: Disclosed are a method for providing a DNA-encoding library, the DNA-encoding library and a method of decoding a DNA-encoded library. Many different DNA molecules are synthesized which differ from each other in DNA barcode sequences. Each DNA molecule is bonded to a specific substance forming different DNA-substance conjugates. The DNA-encoded library has the advantage that, for example after an enrichment experiment performed with the library, the library may be decoded in a faster and less expensive manner than known DNA-encoded libraries.
Type:
Application
Filed:
July 30, 2019
Publication date:
February 6, 2020
Applicant:
TU Dresden
Inventors:
Yixin ZHANG, Francesco REDDAVIDE, Meiying CUI, Helena ANDRADE, Stephan HEIDEN
Abstract: A method for depositing a piezoelectric film may be provided containing AlN on a substrate by means of magnetron sputtering of at least two targets—of which at least one target contains aluminum—within a vacuum chamber, into which a mixture of gases containing at least reactive nitrogen gas and an inert gas is introduced, and during which magnetron sputtering the unipolar pulse mode and the bipolar pulse mode are alternately used. A film may be provided containing AlN of formula AlXNYOZ, where (0.1?X?1.2); (0.1?Y?1.2) and (0.001?Z?0.1).
Type:
Grant
Filed:
June 24, 2014
Date of Patent:
June 12, 2018
Assignees:
FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V., TU DRESDEN
Inventors:
Hagen Bartzsch, Daniel Glöß, Peter Frach, Stephan Barth