Abstract: Fabrication of a photovoltaic cell comprising a thin semiconductor lamina may require additional processing after the semiconductor lamina is bonded to a receiver. To minimize high-temperature steps after bonding, the p-n junction is formed at the back of the cell, at the bonded surface. In some embodiments, the front surface of the semiconductor lamina is not doped or is locally doped using low-temperature methods. The base resistivity of the photovoltaic cell may be reduced, allowing a front surface field to be reduced or omitted.
Type:
Application
Filed:
August 10, 2008
Publication date:
August 6, 2009
Applicant:
TWIN CREEKS TECHNOLOGIES, INC.
Inventors:
Mohamed M. Hilali, Christopher J. Petti
Abstract: A very thin photovoltaic cell is formed by implanting gas ions below the surface of a donor body such as a semiconductor wafer. Ion implantation defines a cleave plane, and a subsequent step exfoliates a thin lamina from the wafer at the cleave plane. A photovoltaic cell, or all or a portion of the base or emitter of a photovoltaic cell, is formed within the lamina. In preferred embodiments, the wafer is affixed to a receiver before the cleaving step. Electrical contact can be formed to both surfaces of the lamina, or to one surface only.
Type:
Application
Filed:
September 11, 2008
Publication date:
August 6, 2009
Applicant:
TWIN CREEKS TECHNOLOGIES, INC.
Inventors:
Srinivasan Sivaram, Aditya Agarwal, S. Brad Herner, Christopher J. Petti
Abstract: A very thin photovoltaic cell is formed by implanting gas ions below the surface of a donor body such as a semiconductor wafer. Ion implantation defines a cleave plane, and a subsequent step exfoliates a thin lamina from the wafer at the cleave plane. A photovoltaic cell, or all or a portion of the base or emitter of a photovoltaic cell, is formed within the lamina. In preferred embodiments, the wafer is affixed to a receiver before the cleaving step. Electrical contact can be formed to both surfaces of the lamina, or to one surface only.
Type:
Application
Filed:
September 11, 2008
Publication date:
August 6, 2009
Applicant:
TWIN CREEKS TECHNOLOGIES, INC.
Inventors:
Srinivasan Sivaram, Aditya Agarwal, S. Brad Herner, Christopher J. Petti
Abstract: A very thin photovoltaic cell is formed by implanting gas ions below the surface of a donor body such as a semiconductor wafer. Ion implantation defines a cleave plane, and a subsequent step exfoliates a thin lamina from the wafer at the cleave plane. A photovoltaic cell, or all or a portion of the base or emitter of a photovoltaic cell, is formed within the lamina. In preferred embodiments, the wafer is affixed to a receiver before the cleaving step. Electrical contact can be formed to both surfaces of the lamina, or to one surface only.
Type:
Application
Filed:
September 10, 2008
Publication date:
August 6, 2009
Applicant:
TWIN CREEKS TECHNOLOGIES, INC.
Inventors:
Srinivasan Sivaram, Aditya Agarwal, S. Brad Herner, Christopher J. Petti
Abstract: A very thin photovoltaic cell is formed by implanting gas ions below the surface of a donor body such as a semiconductor wafer. Ion implantation defines a cleave plane, and a subsequent step exfoliates a thin lamina from the wafer at the cleave plane. A photovoltaic cell, or all or a portion of the base or emitter of a photovoltaic cell, is formed within the lamina. In preferred embodiments, the wafer is affixed to a receiver before the cleaving step. Electrical contact can be formed to both surfaces of the lamina, or to one surface only.
Type:
Application
Filed:
February 5, 2008
Publication date:
August 6, 2009
Applicant:
Twin Creeks Technologies, Inc.
Inventors:
Srinivasan Sivaram, Aditya Agarwal, S. Brad Herner, Christopher J. Petti