Patents Assigned to ULSI Engineering Corporation
  • Patent number: 5608881
    Abstract: In a microcomputer system, an access operation is executed in a pipeline mode via buses to which bus masters are connected, and a control of the pipeline execution is performed by a bus controller. Furthermore, an access for delaying this pipeline operation is carried out by low-level of hierarchical buses connected by a buffer and a low-level bus controller.
    Type: Grant
    Filed: October 29, 1993
    Date of Patent: March 4, 1997
    Assignees: Hitachi, Ltd., Hitachi ULSI Engineering Corporation
    Inventors: Shigeki Masumura, Hideo Nakamura, Kouki Noguchi, Shumpei Kawasaki, Kaoru Fukada, Yasushi Akao
  • Patent number: 5557147
    Abstract: Herein disclosed is a semiconductor integrated circuit device fabricating process for forming MISFETs over the principal surface in those active regions of a substrate, which are surrounded by inactive regions formed of an element separating insulating film and channel stopper regions, comprising: the step of for forming a first mask by a non-oxidizable mask and an etching mask sequentially over the principal surface of the active regions of the substrate; the step of forming a second mask on and in self-alignment with the side walls of the first mask by a non-oxidizable mask thinner than the non-oxidizable mask of the first mask and an etching mask respectively; the step of etching the principal surface of the inactive regions of the substrate by using the first mask and the second mask; the step of forming the element separating insulating film over the principal surface of the inactive regions of the substrate by an oxidization using the first mask and the second mask; and the step of forming the channel s
    Type: Grant
    Filed: April 19, 1994
    Date of Patent: September 17, 1996
    Assignees: Hitachi, Ltd., Hitachi ULSI Engineering Corporation
    Inventors: Jun Sugiura, Osamu Tsuchiya, Makoto Ogasawara, Fumio Ootsuka, Kazuyoshi Torii, Isamu Asano, Nobuo Owada, Mitsuaki Horiuchi, Tsuyoshi Tamaru, Hideo Aoki, Nobuhiro Otsuka, Seiichirou Shirai, Masakazu Sagawa, Yoshihiro Ikeda, Masatoshi Tsuneoka, Toru Kaga, Tomotsugu Shimmyo, Hidetsugu Ogishi, Osamu Kasahara, Hiromichi Enami, Atsushi Wakahara, Hiroyuki Akimori, Sinichi Suzuki, Keisuke Funatsu, Yoshinao Kawasaki, Tunehiko Tubone, Takayoshi Kogano, Ken Tsugane
  • Patent number: 5555215
    Abstract: The present invention is intended to operate a semiconductor device at high speed with low voltage. A circuit configuration is used in which the transfer impedance between a common I/O line and a data line is changed depending on whether information is to be read or written. A current/voltage converter is provided which includes a MISFET different in conduction type to a select MISFET. Thus, the speed of reading information is increased. An intermediate voltage generator having high driving capability is provided. Thus, the circuit has sufficient driving capability for an LSI having large load capacitance. A voltage converter is provided which converts a data line supply voltage or word line supply voltage to a higher voltage. Therefore, stabilized signal transmission is ensured.
    Type: Grant
    Filed: October 5, 1995
    Date of Patent: September 10, 1996
    Assignees: Hitachi, Ltd, Hitachi ULSI Engineering Corporation
    Inventors: Yoshinobu Nakagome, Kiyoo Itoh, Hitoshi Tanaka, Yasushi Watanabe, Eiji Kume, Masanori Isoda, Eiji Yamasaki, Tatsumi Uchigiri
  • Patent number: 5525547
    Abstract: A molded semiconductor device has a plurality of slender leads formed with a sealing strip connecting them together to prevent the molding material from leaking out between the leads. Specifically, the sealing strip comprising an adhesive and an electrically insulating material is applied to the leads substantially perpendicular to the lengthwise direction of the leads. The strip is place such that an inner edge thereof substantially lies on a boundary line or inside where the molding terminates. The strip is then thrust into spaces formed between the leads. Thereafter the semiconductor chip is connected to the leads, the semiconductor chip and the leads are placed in a molding unit, the strip serving to block the molding material leaking outside the molding unit.
    Type: Grant
    Filed: December 2, 1993
    Date of Patent: June 11, 1996
    Assignees: Hitachi, Ltd., Hitachi ULSI Engineering Corporation
    Inventors: Toshihiro Matsunaga, Yuji Shirai, Takayuki Okinaga, Osamu Horiuchi, Takashi Emata, Makoto Omata
  • Patent number: 5422839
    Abstract: A semiconductor static memory device, which has an increased storage capacity without imposing an increased access time, includes first, second and third metallic layers. To begin, word lines for the transfer MOSFETS are formed of the same polysilicon layer used to form the gate electrodes of the transfer MOSFETs of the memory device. A metallic layer of the first layer is used for local word lines, with the polysilicon word lines and local word lines being connected at their ends or inside of cell arrays. A metallic layer of the second layer is used for bit layers, and a metallic layer of the third layer is used for main word lines. Consequently, the word lines have a decreased time constant, allowing fast memory access. Each of sense amplifiers used in the memory device are formed with MOSFETs, which are disposed divisionally in adjacent locations. Preferably the gate electrodes of the divided MOSFETs are located symmetrically.
    Type: Grant
    Filed: September 10, 1993
    Date of Patent: June 6, 1995
    Assignees: Hitachi, Ltd., Hitachi ULSI Engineering Corporation
    Inventors: Koichiro Ishibashi, Katsuro Sasaki, Kunihiro Komiyaji, Toshiro Aoto, Sadayuki Morita