Patents Assigned to ULVAC COATING CORPORATION and MITSUBISHI DENKI KABUSHIKI KAISHA
  • Phase shifter film and process for the same
    Publication number: 20020009653
    Abstract: In the formation of a halftone type phase shift mask, a reactive gas introduction inlet and an inert gas introduction inlet are provided so as to introduce the respective gases separately and by using a reactive low throw sputtering method a molybdenum silicide based phase shifter film is formed. Thereby, it becomes possible to provide a halftone type phase shift mask, which is applicable to an ArF laser or to a KrF laser, by using molybdenum silicide based materials.
    Type: Application
    Filed: March 13, 2001
    Publication date: January 24, 2002
    Applicant: ULVAC COATING CORPORATION and MITSUBISHI DENKI KABUSHIKI KAISHA
    Inventors: Susumu Kawada, Akihiko Isao, Nobuyuki Yoshioka, Kazuyuki Maetoko