Patents Assigned to Ulvac-Phi Incorporated
  • Patent number: 11915901
    Abstract: Surface imaging apparatuses, surface analysis apparatuses, methods based on detection of secondary electrons or secondary ions that include a spatially scanned and DC or pulsed primary excitation source resulting in secondary electrons or secondary ions which are detected and provide the modulated signal for imaging of the sample; and dual polarity flood beams to effect neutralization of surface charge and surface potential variation.
    Type: Grant
    Filed: August 27, 2021
    Date of Patent: February 27, 2024
    Assignee: ULVAC-PHI, INCORPORATED
    Inventors: Scott R. Bryan, Gregory L. Fisher, David H. Narum, Ronald E. Negri
  • Patent number: 9159539
    Abstract: A system and method for acquisition of mass spectrometry data is configured to provide a stream of charged particles (e.g., from an analytical volume). A primary mass spectrometer (e.g., time-of-flight mass spectrometer) may be used to separate charged particles of the stream of charged particles based on their mass-to-charge ratio and detect the charged particles in a mass-to-charge spectrum. A stream of precursor ions having a selected mass range may be diverted from the stream of charged particles for fragmentation to provide fragment ions (e.g., fragment ions from the analytical volume). The fragment ions may be provided to a second mass spectrometer for analysis of the fragment ions (e.g., during the same time as the time-of-flight mass spectrometer is separating and detecting charged particles of the stream of charged particles based on their mass-to-charge ratio).
    Type: Grant
    Filed: March 13, 2013
    Date of Patent: October 13, 2015
    Assignees: ULVAC-PHI, INCORPORATED
    Inventors: Paul E. Larson, John S. Hammond, Gregory L. Fisher, Ron M. Heeren
  • Patent number: 6726739
    Abstract: The present invention provides a pre-treatment apparatus for an analytical metal sample, the apparatus including (1) a treatment chamber having a sample charging port which can be opened and closed and provided at the top of the chamber, a sample discharging port which can be opened and closed and provided at the bottom of the chamber, and a gas inlet and gas outlet, (2) a sample carrying bar joined to a sample holder also used as a sputtering electrode, and provided to pass through at least one side wall of the treatment chamber so as to be substantially horizontally movable and axially rotatable, and (3) a sputtering counter electrode at least having portions arranged opposite to each other in a region not inhibiting the charge and discharge of an analytical metal sample so that the sample holder can be arranged in the counter electrode.
    Type: Grant
    Filed: July 24, 2002
    Date of Patent: April 27, 2004
    Assignees: JFE Steel Corporation, Japan Analyst Corporation, Ulvac-Phi Incorporated
    Inventors: Kenji Abiko, Hisao Yasuhara, Takashi Niida, Makoto Shimura, Hideo Iwai