Abstract: A method reduces movement of a reflector in an unintended mechanical mode during movement of the reflector in an intended mechanical mode. The method includes using a reflector driver to apply a distribution of forces to the reflector so as to move the reflector in both the intended mechanical mode and in the unintended mechanical mode. The distribution of forces is applied at a resonant frequency of the unintended mechanical mode. The method further includes adjusting the reflector driver to alter the distribution of forces applied to the reflector such that the movement of the reflector in the unintended mechanical mode is reduced.
Abstract: A method for fabricating a module for at least partially intercepting a light beam propagating along a beam path includes providing a single crystal silicon substrate with a first substrate surface and a second substrate surface. The method further includes forming a reflector support layer on the first substrate surface. The method further includes forming a support frame and at least one reflector by etching the substrate from the second substrate surface. The method further includes forming at least one electrical conduit on the reflector support layer. The method further includes forming a reflector support by etching the reflector support layer from the first substrate surface, the reflector support mechanically coupled to the support frame and the reflector, the reflector support movable such that the reflector is movable substantially perpendicularly to the first substrate surface.
Abstract: An apparatus at least partially intercepts a plurality of light beams propagating along a respective plurality of beam paths. The apparatus includes a single crystal silicon substrate and an array including a plurality of modules. Each module includes a reflector comprising single crystal silicon and a reflector surface lying in a reflector plane substantially perpendicular to the substrate surface. Each module further includes a reflector support which mounts the reflector to move substantially within the reflector plane with a displacement component along the surface normal direction of the substrate surface. Each module further includes a reflector driver responsive to electrical current to selectively move the reflector between a first position and a second position.
Type:
Grant
Filed:
April 25, 2001
Date of Patent:
October 28, 2003
Assignee:
Umachines, Inc.
Inventors:
Chen-Wei Chiu, Aramais Avakian, Tom Tsao, Fukang Jiang, Jeff Dickson, Yu-Chong Tai