Patents Assigned to Umeda Center Building
  • Publication number: 20100112460
    Abstract: The present invention provides a fluorine-containing volume holographic data recording material making it unnecessary to provide a step of eliminating a specific solvent even in the case of a thick film, and having high hologram performance and good dynamic range. There is provided a composition comprising a base polymer (a), a liquid monomer (b) and a photo-initiator (c), wherein the base polymer (a) is an amorphous polymer comprising a fluorine-containing monomer as a structural unit and having a fluorine content of 26 to 80% by mass, the liquid monomer (b) comprises at least one liquid monomer (b1) initiating polymerization by means of activated species generated from the photo-initiator (c), the photo-initiator (c) is a compound causing the liquid monomer (b1) to initiate polymerization by exposure to light having excellent coherence and, and a refractive index of the liquid monomer (b) is higher than an average refractive index of a mixture of the base polymer (a) and the photo-initiator (c).
    Type: Application
    Filed: March 26, 2008
    Publication date: May 6, 2010
    Applicant: Umeda Center Building
    Inventors: Kazuyuki Satou, Makoto Hanazawa, Kazuko Aoki
  • Publication number: 20100113700
    Abstract: There is provided a curable fluorine-containing polymer composition which is quickly cured at relatively low temperatures by hydrosilylation reaction and provides a coating film which has high hardness, excellent solvent resistance and flexibility. The curable fluorine-containing polymer composition comprises a fluorine-containing polymer comprising a fluorinated ethylenic monomer unit and a non-fluorinated ethylenic monomer unit, in which a part or the whole of the non-fluorinated ethylenic monomer units is a unit represented by the formula: wherein R1 is hydrogen or methyl; R2 is a hydrocarbon group having ethylenic C?C; X is —C(O)NH— or —C(O)—; R3 is —O—, —O[CH(R4)]mO—, —(CH2)mO—, —OC(O)—(CH2)mO— or —(CH2)mOC(O)—(CH2)nO—, where R4 is —H, —OH, —CH2OH or —O—X—R2, a siloxane compound having hydrogen atom bonded to silicon atom, and a catalyst for hydrosilylation reaction.
    Type: Application
    Filed: October 12, 2007
    Publication date: May 6, 2010
    Applicant: Umeda Center Building
    Inventors: Katsuhiko Imoto, Tetsuo Shimizu, Tatsuya Morikawa, Masayuki Hayashi, Tomohiro Iimura, Peter Cheshire Hupfield
  • Publication number: 20050245758
    Abstract: The present invention relates to a method for producing a water-soluble fluorine-containing vinyl ether which comprises subjecting a fluorine-containing 2-alkoxypropionic acid derivative represented by the following general formula (I): (wherein A represents —OM1 or —OM21/2, and M1 represents an alkali metal and M2 represents an alkaline earth metal; X represents a halogen atom; Y1 and Y2 are the same or different and each represents a fluorine atom, a chlorine atom, a perfluoroalkyl group or a fluorochloroalkyl group; n represents an integer of 0 to 3, and n of Y1s may be the same or different; m represents an integer of 1 to 5, and m of Y2s are the same or different; and Z represents a hydrophilic group) to thermal decomposition at a temperature of not lower than 50° C. but lower than 170° C.
    Type: Application
    Filed: June 16, 2003
    Publication date: November 3, 2005
    Applicant: Saikin Industries, LTD. Umeda Center Building
    Inventors: Kenji Ishii, Noriyuki Shinoki, Takuya Arase, Kazuyoshi Ichihara, Toshiya Mantani
  • Publication number: 20050118431
    Abstract: An FEP pellet having a volatile content of 0.2% by weight or less. The FEP pellet satisfies the following requirements (i) and (ii) when used to form a insulating material coating a core wire by extrusion coating at a coating speed of 2,800 ft/min.: (i) an adhesive strength between the insulating material and said core wire of 0.8 kg or more; and (ii) an average number of cone-breaks in the insulating material of one or less per 50,000 feet of the coated core wire.
    Type: Application
    Filed: January 17, 2003
    Publication date: June 2, 2005
    Applicant: DAIKIN INDUSTRIES, LTD. Umeda Center Building
    Inventors: Hideki Kono, Takayuki Hirao, George Lin, Kazuyuki Fukuda
  • Patent number: 6514425
    Abstract: Disclosed is fluorocarbon-based dry etching gas which is free of global environmental problems and a dry etching method using a plasma gas obtained therefrom. The dry etching gas includes a fluorinated ether of carbon, fluorine, hydrogen and oxygen and having 2-6 carbon atoms.
    Type: Grant
    Filed: July 2, 1999
    Date of Patent: February 4, 2003
    Assignees: Agency of Industrial Science and Technology, The Mechanical Social Systems Foundation of Mita Building, Electronic Industries Association of Japan, Asahi Glass Co., Ltd., Daikin Industries, Ltd. of Umeda Center Building
    Inventors: Akira Sekiya, Tetsuya Takagaki, Shinsuke Morikawa, Shunichi Yamashita, Tsuyoshi Takaichi, Yasuo Hibino, Yasuhisa Furutaka, Masami Iwasaki, Norifumi Ohtsuka