Patents Assigned to Umeda Center Building
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Publication number: 20100112460Abstract: The present invention provides a fluorine-containing volume holographic data recording material making it unnecessary to provide a step of eliminating a specific solvent even in the case of a thick film, and having high hologram performance and good dynamic range. There is provided a composition comprising a base polymer (a), a liquid monomer (b) and a photo-initiator (c), wherein the base polymer (a) is an amorphous polymer comprising a fluorine-containing monomer as a structural unit and having a fluorine content of 26 to 80% by mass, the liquid monomer (b) comprises at least one liquid monomer (b1) initiating polymerization by means of activated species generated from the photo-initiator (c), the photo-initiator (c) is a compound causing the liquid monomer (b1) to initiate polymerization by exposure to light having excellent coherence and, and a refractive index of the liquid monomer (b) is higher than an average refractive index of a mixture of the base polymer (a) and the photo-initiator (c).Type: ApplicationFiled: March 26, 2008Publication date: May 6, 2010Applicant: Umeda Center BuildingInventors: Kazuyuki Satou, Makoto Hanazawa, Kazuko Aoki
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Publication number: 20100113700Abstract: There is provided a curable fluorine-containing polymer composition which is quickly cured at relatively low temperatures by hydrosilylation reaction and provides a coating film which has high hardness, excellent solvent resistance and flexibility. The curable fluorine-containing polymer composition comprises a fluorine-containing polymer comprising a fluorinated ethylenic monomer unit and a non-fluorinated ethylenic monomer unit, in which a part or the whole of the non-fluorinated ethylenic monomer units is a unit represented by the formula: wherein R1 is hydrogen or methyl; R2 is a hydrocarbon group having ethylenic C?C; X is —C(O)NH— or —C(O)—; R3 is —O—, —O[CH(R4)]mO—, —(CH2)mO—, —OC(O)—(CH2)mO— or —(CH2)mOC(O)—(CH2)nO—, where R4 is —H, —OH, —CH2OH or —O—X—R2, a siloxane compound having hydrogen atom bonded to silicon atom, and a catalyst for hydrosilylation reaction.Type: ApplicationFiled: October 12, 2007Publication date: May 6, 2010Applicant: Umeda Center BuildingInventors: Katsuhiko Imoto, Tetsuo Shimizu, Tatsuya Morikawa, Masayuki Hayashi, Tomohiro Iimura, Peter Cheshire Hupfield
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Publication number: 20050245758Abstract: The present invention relates to a method for producing a water-soluble fluorine-containing vinyl ether which comprises subjecting a fluorine-containing 2-alkoxypropionic acid derivative represented by the following general formula (I): (wherein A represents —OM1 or —OM21/2, and M1 represents an alkali metal and M2 represents an alkaline earth metal; X represents a halogen atom; Y1 and Y2 are the same or different and each represents a fluorine atom, a chlorine atom, a perfluoroalkyl group or a fluorochloroalkyl group; n represents an integer of 0 to 3, and n of Y1s may be the same or different; m represents an integer of 1 to 5, and m of Y2s are the same or different; and Z represents a hydrophilic group) to thermal decomposition at a temperature of not lower than 50° C. but lower than 170° C.Type: ApplicationFiled: June 16, 2003Publication date: November 3, 2005Applicant: Saikin Industries, LTD. Umeda Center BuildingInventors: Kenji Ishii, Noriyuki Shinoki, Takuya Arase, Kazuyoshi Ichihara, Toshiya Mantani
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Publication number: 20050118431Abstract: An FEP pellet having a volatile content of 0.2% by weight or less. The FEP pellet satisfies the following requirements (i) and (ii) when used to form a insulating material coating a core wire by extrusion coating at a coating speed of 2,800 ft/min.: (i) an adhesive strength between the insulating material and said core wire of 0.8 kg or more; and (ii) an average number of cone-breaks in the insulating material of one or less per 50,000 feet of the coated core wire.Type: ApplicationFiled: January 17, 2003Publication date: June 2, 2005Applicant: DAIKIN INDUSTRIES, LTD. Umeda Center BuildingInventors: Hideki Kono, Takayuki Hirao, George Lin, Kazuyuki Fukuda
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Patent number: 6514425Abstract: Disclosed is fluorocarbon-based dry etching gas which is free of global environmental problems and a dry etching method using a plasma gas obtained therefrom. The dry etching gas includes a fluorinated ether of carbon, fluorine, hydrogen and oxygen and having 2-6 carbon atoms.Type: GrantFiled: July 2, 1999Date of Patent: February 4, 2003Assignees: Agency of Industrial Science and Technology, The Mechanical Social Systems Foundation of Mita Building, Electronic Industries Association of Japan, Asahi Glass Co., Ltd., Daikin Industries, Ltd. of Umeda Center BuildingInventors: Akira Sekiya, Tetsuya Takagaki, Shinsuke Morikawa, Shunichi Yamashita, Tsuyoshi Takaichi, Yasuo Hibino, Yasuhisa Furutaka, Masami Iwasaki, Norifumi Ohtsuka