Patents Assigned to Unit Instruments, Inc.
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Patent number: 6474700Abstract: A gas panel for use with a tool for manufacturing a semiconductor includes a one-piece manifold body having an inlet for receiving a process gas. The manifold body has at least one lateral wall extending in the general direction of gas flow. The lateral wall includes at least one active device site having an active device thereon. The active device is in gas communication with a gas carrying path formed within the one-piece manifold. The active device may be a manual valve, a pneumatic valve, a pressure regulator, a pressure transducer, a purifier, a filter or a flow controller. The gas is received from the active device at a continuation of the gas flow path in the manifold body and is conveyed to a manifold outlet for ultimate to the tool.Type: GrantFiled: December 7, 2000Date of Patent: November 5, 2002Assignee: Unit Instruments, Inc.Inventors: Eric J. Redemann, Kim N. Vu
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Patent number: 6435215Abstract: A gas panel for use with a tool for manufacturing a semiconductor includes a one-piece manifold body having an inlet for receiving a process gas. The manifold body has at least one lateral wall extending in the general direction of gas flow. The lateral wall includes at least one active device site having an active device thereon. The active device is in gas communication with a gas carrying path formed within the one-piece manifold. The active device may be a manual valve, a pneumatic valve, a pressure regulator, a pressure transducer, a purifier, a filter or a flow controller. The gas is received from the active device at a continuation of the gas flow path in the manifold body and is conveyed to a manifold outlet for ultimate to the tool.Type: GrantFiled: August 23, 2001Date of Patent: August 20, 2002Assignee: Unit Instruments, Inc.Inventors: Eric J. Redemann, Kim N. Vu
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Patent number: 6425281Abstract: A pressure insensitive gas process device that includes a gas sensor and restrictions upstream and downstream of the gas sensor. The restrictions result in pressure drops upstream and downstream of the gas sensor which shield the gas sensor from upstream and downstream pressure changes, respectively, rendering the gas sensor and the entire gas process device insensitive to pressure changes. Gas process devices in which pressure insensitivity may be achieved include mass flow controllers as well as other types of devices.Type: GrantFiled: July 12, 2000Date of Patent: July 30, 2002Assignee: Unit Instruments, Inc.Inventors: David P. Sheriff, Chiun Wang
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Patent number: 6394138Abstract: A manifold system for enabling a distribution of fluids includes a plurality of individual manifold blocks that can be joined together to form a gas stick. Each manifold block will have a fluid passage way with an entrance port and exit port accessing a common surface. An active component can be mounted to one manifold block, while extending across a port of an adjacent manifold block. An alignment system can be provided to ensure that the entrance and exit ports are positioned in a plane containing the common surface to facilitate sealing.Type: GrantFiled: January 13, 1999Date of Patent: May 28, 2002Assignee: Unit Instruments, Inc.Inventors: Kim N. Vu, Eric J. Redemann, David P. Sherriff
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Patent number: 6374859Abstract: A manifold system for incorporation in a gas panel distribution system for semi-conductor manufacturing includes a plurality of individual manifold blocks with each manifold block having a fluid passageway with an entrance and exit port accessing a common surface. Adjacent manifold blocks are removably interconnected to permit the respective fluid passageways to be in position for interconnection. A plurality of active components can be sealingly fastened to the individual manifold blocks to complete the interconnection of the respective fluid passageways. Each active component can bridge over a pair of adjacent individual manifold blocks and form with the individual manifold blocks an operative gas stick for delivering gas to a semiconductor tool. The individual manifold blocks can be identical in configuration and can include a first upper flange on one side and a second lower flange on an opposite side to enable an interlocking of adjacent manifold blocks.Type: GrantFiled: July 8, 1998Date of Patent: April 23, 2002Assignee: Unit Instruments, Inc.Inventors: Kim N. Vu, Eric J. Redemann, David P. Sheriff
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Patent number: 6293310Abstract: A gas panel for use with a tool for manufacturing a semiconductor includes a one-piece manifold body having an inlet for receiving a process gas. The manifold body has at least one lateral wall extending in the general direction of gas flow. The lateral wall includes at least one active device site having an active device thereon. The active device is in gas communication with a gas carrying path formed within the one-piece manifold. The active device may be a manual valve, a pneumatic valve, a pressure regulator, a pressure transducer, a purifier, a filter or a flow controller. The gas is received from the active device at a continuation of the gas flow path in the manifold body and is conveyed to a manifold outlet for ultimate to the tool.Type: GrantFiled: October 29, 1997Date of Patent: September 25, 2001Assignee: Unit Instruments, Inc.Inventors: Eric J. Redemann, Kim N. Vu
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Patent number: 6192938Abstract: A gas panel for use with a tool for manufacturing a semiconductor includes a one-piece manifold body having an inlet for receiving a process gas. The manifold body has at least one lateral wall extending in the general direction of gas flow. The lateral wall includes at least one active device site having an active device thereon. The active device is in gas communication with a gas carrying path formed within the one-piece manifold. The active device may be a manual valve, a pneumatic valve, a pressure regulator, a pressure transducer, a purifier, a filter or a flow controller. The gas is received from the active device at a continuation of the gas flow path in the manifold body and is conveyed to a manifold outlet for ultimate to the tool.Type: GrantFiled: August 10, 1999Date of Patent: February 27, 2001Assignee: Unit Instruments, Inc.Inventors: Eric J. Redemann, Kim N. Vu
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Patent number: 6189570Abstract: A gas panel for use with a tool for manufacturing a semiconductor includes a one-piece manifold body having an inlet for receiving a process gas. The manifold body has at least one lateral wall extending in the general direction of gas flow. The lateral wall includes at least one active device site having an active device thereon. The active device is in gas communication with a gas carrying path formed within the one-piece manifold. The active device may be a manual valve, a pneumatic valve, a pressure regulator, a pressure transducer, a purifier, a filter or a flow controller. The gas is received from the active device at a continuation of the gas flow path in the manifold body and is conveyed to a manifold outlet for ultimate to the tool.Type: GrantFiled: August 10, 1999Date of Patent: February 20, 2001Assignee: Unit Instruments, Inc.Inventors: Eric J. Redemann, Kim N. Vu
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Patent number: 6142539Abstract: A gas panel for use with a tool for manufacturing a semiconductor includes a one-piece manifold body having an inlet for receiving a process gas. The manifold body has at least one lateral wall extending in the general direction of gas flow. The lateral wall includes at least one active device site having an active device thereon. The active device is in gas communication with a gas carrying path formed within the one-piece manifold. The active device may be a manual valve, a pneumatic valve, a pressure regulator, a pressure transducer, a purifier, a filter or a flow controller. The gas is received from the active device at a continuation of the gas flow path in the manifold body and is conveyed to a manifold outlet for ultimate to the tool.Type: GrantFiled: August 10, 1999Date of Patent: November 7, 2000Assignee: Unit Instruments, Inc.Inventors: Eric J. Redemann, Kim N. Vu
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Patent number: 6044701Abstract: A thermal mass flow controller having a thermal mass flow meter with an orthogonal thermal mass flow sensor includes a base defining a primary fluid flow path therein for carrying a flow of fluid to be metered. A pressure dropping bypass is positioned in the primary fluid flow path. A flow measuring portion of a thermal mass flow sensor is oriented substantially transversely or orthogonally with respect to and is in communication with the primary fluid flow path. The flow measuring portion includes a portion of an electrical bridge for determining a temperature of the sensor and produces a mass flow rate signal in response thereto. A valve is connected to an outlet of the primary flow path to control the flow of fluid in response to the mass flow rate signal.Type: GrantFiled: March 10, 1997Date of Patent: April 4, 2000Assignee: Unit Instruments, Inc.Inventors: Michael J. Doyle, Dan B. LeMay, Kim N. Vu
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Patent number: 5992463Abstract: A gas panel for use with a tool for manufacturing a semiconductor includes a one-piece manifold body having an inlet for receiving a process gas. The manifold body has at least one lateral wall extending in the general direction of gas flow. The lateral wall includes at least one active device site having an active device thereon. The active device is in gas communication with a gas carrying path formed within the one-piece manifold. The active device may be a manual valve, a pneumatic valve, a pressure regulator, a pressure transducer, a purifier, a filter or a flow controller. The gas is received from the active device at a continuation of the gas flow path in the manifold body and is conveyed to a manifold outlet for ultimate to the tool.Type: GrantFiled: October 30, 1996Date of Patent: November 30, 1999Assignee: Unit Instruments, Inc.Inventors: Eric J. Redemann, Kim N. Vu
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Patent number: 5925829Abstract: Method and apparatus for determining a mass rate of flow of gas by a rate of change of pressure includes an inlet for communicating a flow of gas from a source of gas whose mass flow rate is to be measured. A volumetric container is connected to the gas inlet to receive the gas. The volumetric container precisely defines a standard volume in its interior. Positioned within the volumetric container is a heat conductive assembly for maintaining the interior of the system substantially isothermal during pressure changes of the gas as gas flows into or leaves the container. Attached to the container is a pressure measuring transducer which measures the gas pressure within the container. The rate of change of the gas pressure under isothermal conditions within the container is indicative of the rate of mass flow of the gas into or out of the volumetric container.Type: GrantFiled: February 3, 1997Date of Patent: July 20, 1999Assignee: Unit Instruments, Inc.Inventors: Robert Laragione, Dan B. LeMay, Eric J. Redemann, Michael D. Upchurch
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Patent number: 5803507Abstract: Apparatus for handling process fluid, that is a meter includes a mass flow meter block. A deformable metal seal is positioned between the mass flow meter block and a thermal mass flow sensor in deformable engagement with a pair of edges formed thereon to provide a low contamination, high integrity metal seal.Type: GrantFiled: November 13, 1995Date of Patent: September 8, 1998Assignee: Unit Instruments, Inc.Inventor: Kim N. Vu
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Patent number: 5730181Abstract: A mass flow controller and purifier has a canister arranged at right angles to a flow path through the mass flow controller. The canister holds a contaminant scavenging material which a gas stream contacts as it flows to remove a contaminant such as water. A purified process gas stream is fed through a bypass of a mass flow meter. A portion of the gas is supplied to a mass flow sensor which generates a signal indicative of a rate of mass flow. The mass flow signal is amplified and the amplified mass flow signal is linearized in a linearizer. The linearized mass flow signal is fed to a comparator which compares the linearized mass flow signal with an error signal and provides an output signal indicative of a mass rate of flow through the mass flow meter. A valve is connected to the mass flow meter and is controlled by the mass flow meter signal to meter the gas.Type: GrantFiled: December 2, 1996Date of Patent: March 24, 1998Assignee: Unit Instruments, Inc.Inventors: Michael J. Doyle, Nelson Urdaneta, Kim N. Vu
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Patent number: 5303731Abstract: A liquid flow controller for metering a flow of liquid has an inlet to receive the liquid. The inlet feeds the liquid to a high resistance liquid flow path across which a pressure drop arises. A pressure sensor measures the liquid flow induced pressure drop and generates pressure drop signal which is fed to an electronic circuit. A temperature sensor is connected to the high resistance liquid flow path and generates a temperature signal which is also fed to the electronic circuit. The circuit energizes a viscosity-normalized liquid flow signal, which is compared to a set point signal to generate an error signal. A valve connected downstream of the high resistance liquid flow path to control the flow of liquid is driven by the error signal and thereby controls the flow of liquid.Type: GrantFiled: June 30, 1992Date of Patent: April 19, 1994Assignee: Unit Instruments, Inc.Inventors: Randall J. Vavra, Michael J. Doyle, Kim N. Vu
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Patent number: 5279154Abstract: A vertical flow thermal mass flow sensor for a vertical flow thermal mass flow meter of a vertical flow thermal mass flow controller has a sensor tube having a gas inlet for receiving a gas to be metered. The sensor tube includes a first curved convection trap and a second curved convection trap for preventing convective flow of the gas through the sensor tube. A thermally responsive winding is wound about the sensor tube and is energized from a source of electrical energy. The resistance of the thermally responsive winding is responsive to the rate of flow of the gas through the sensor tube and provides an indication thereof.Type: GrantFiled: September 18, 1992Date of Patent: January 18, 1994Assignee: Unit Instruments, Inc.Inventors: Randall J. Vavra, Lam T. Nguyen, Erik Q. Tran
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Patent number: 4928048Abstract: A fast response control circuit for providing an output signal in miminum time after receiving an enabling input signal. The control circuit includes an amplifier which provides an output signal having a magnitude determined by a variable input signal when the enabling input signal indicates that an output signal is desired. A feedback network and the amplifier together define a control loop which has a characteristic response time. When the enable signal is absent, a bias control biases a reactive component in the control loop so as to minimize this response time. The circuit is adapted for use in a fluid mass flow controller to provide rapid response to an enabling input signal, particularly when a very low fluid flow rate is desired.Type: GrantFiled: March 28, 1988Date of Patent: May 22, 1990Assignee: Unit Instruments, Inc.Inventor: James H. Doyle
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Patent number: 4913192Abstract: Gas flow control apparatus for controlling the flow of a process gas through a conduit system to a process site, for halting the flow of gas when the process is completed, and for then developing a partial vacuum in the conduit system sufficiently high to reduce the concentration of process gas and maintain it in a gaseous state. The partial vacuum is developed by carrier gas flowing through a venturi in communication with the conduit system supplying the process gas. The carrier gas also expels any remnants of the process gas from all points between the venturi and the process site. Further, the system can be used for vaporizing gases from liquids for use in an atmospheric process at the process site, the carrier gas flowing through the venturi and vaporizing a liquid in a chamber upstream of the venturi. The vaporized gases can then be regulated by a mass flow controller.Type: GrantFiled: April 3, 1989Date of Patent: April 3, 1990Assignee: Unit Instruments, Inc.Inventor: Randall J. Vavra
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Patent number: 4858643Abstract: A fluid flow stabilizer which includes two pluralities of stabilizer units adjacent one another. Each unit includes a plurality of parallel axially extending tubules. The units are movable into different relative positions so that certain of the tubules of a unit are aligned in fluid communication with tubules of another unit. Index means are provided for fixing the units in different selected relative positions.Type: GrantFiled: March 14, 1988Date of Patent: August 22, 1989Assignee: Unit Instruments, Inc.Inventors: Randall J. Vavra, Michael Doyle