Patents Assigned to Unit Instruments, Inc.
  • Patent number: 6474700
    Abstract: A gas panel for use with a tool for manufacturing a semiconductor includes a one-piece manifold body having an inlet for receiving a process gas. The manifold body has at least one lateral wall extending in the general direction of gas flow. The lateral wall includes at least one active device site having an active device thereon. The active device is in gas communication with a gas carrying path formed within the one-piece manifold. The active device may be a manual valve, a pneumatic valve, a pressure regulator, a pressure transducer, a purifier, a filter or a flow controller. The gas is received from the active device at a continuation of the gas flow path in the manifold body and is conveyed to a manifold outlet for ultimate to the tool.
    Type: Grant
    Filed: December 7, 2000
    Date of Patent: November 5, 2002
    Assignee: Unit Instruments, Inc.
    Inventors: Eric J. Redemann, Kim N. Vu
  • Patent number: 6435215
    Abstract: A gas panel for use with a tool for manufacturing a semiconductor includes a one-piece manifold body having an inlet for receiving a process gas. The manifold body has at least one lateral wall extending in the general direction of gas flow. The lateral wall includes at least one active device site having an active device thereon. The active device is in gas communication with a gas carrying path formed within the one-piece manifold. The active device may be a manual valve, a pneumatic valve, a pressure regulator, a pressure transducer, a purifier, a filter or a flow controller. The gas is received from the active device at a continuation of the gas flow path in the manifold body and is conveyed to a manifold outlet for ultimate to the tool.
    Type: Grant
    Filed: August 23, 2001
    Date of Patent: August 20, 2002
    Assignee: Unit Instruments, Inc.
    Inventors: Eric J. Redemann, Kim N. Vu
  • Patent number: 6425281
    Abstract: A pressure insensitive gas process device that includes a gas sensor and restrictions upstream and downstream of the gas sensor. The restrictions result in pressure drops upstream and downstream of the gas sensor which shield the gas sensor from upstream and downstream pressure changes, respectively, rendering the gas sensor and the entire gas process device insensitive to pressure changes. Gas process devices in which pressure insensitivity may be achieved include mass flow controllers as well as other types of devices.
    Type: Grant
    Filed: July 12, 2000
    Date of Patent: July 30, 2002
    Assignee: Unit Instruments, Inc.
    Inventors: David P. Sheriff, Chiun Wang
  • Patent number: 6394138
    Abstract: A manifold system for enabling a distribution of fluids includes a plurality of individual manifold blocks that can be joined together to form a gas stick. Each manifold block will have a fluid passage way with an entrance port and exit port accessing a common surface. An active component can be mounted to one manifold block, while extending across a port of an adjacent manifold block. An alignment system can be provided to ensure that the entrance and exit ports are positioned in a plane containing the common surface to facilitate sealing.
    Type: Grant
    Filed: January 13, 1999
    Date of Patent: May 28, 2002
    Assignee: Unit Instruments, Inc.
    Inventors: Kim N. Vu, Eric J. Redemann, David P. Sherriff
  • Patent number: 6374859
    Abstract: A manifold system for incorporation in a gas panel distribution system for semi-conductor manufacturing includes a plurality of individual manifold blocks with each manifold block having a fluid passageway with an entrance and exit port accessing a common surface. Adjacent manifold blocks are removably interconnected to permit the respective fluid passageways to be in position for interconnection. A plurality of active components can be sealingly fastened to the individual manifold blocks to complete the interconnection of the respective fluid passageways. Each active component can bridge over a pair of adjacent individual manifold blocks and form with the individual manifold blocks an operative gas stick for delivering gas to a semiconductor tool. The individual manifold blocks can be identical in configuration and can include a first upper flange on one side and a second lower flange on an opposite side to enable an interlocking of adjacent manifold blocks.
    Type: Grant
    Filed: July 8, 1998
    Date of Patent: April 23, 2002
    Assignee: Unit Instruments, Inc.
    Inventors: Kim N. Vu, Eric J. Redemann, David P. Sheriff
  • Patent number: 6293310
    Abstract: A gas panel for use with a tool for manufacturing a semiconductor includes a one-piece manifold body having an inlet for receiving a process gas. The manifold body has at least one lateral wall extending in the general direction of gas flow. The lateral wall includes at least one active device site having an active device thereon. The active device is in gas communication with a gas carrying path formed within the one-piece manifold. The active device may be a manual valve, a pneumatic valve, a pressure regulator, a pressure transducer, a purifier, a filter or a flow controller. The gas is received from the active device at a continuation of the gas flow path in the manifold body and is conveyed to a manifold outlet for ultimate to the tool.
    Type: Grant
    Filed: October 29, 1997
    Date of Patent: September 25, 2001
    Assignee: Unit Instruments, Inc.
    Inventors: Eric J. Redemann, Kim N. Vu
  • Patent number: 6192938
    Abstract: A gas panel for use with a tool for manufacturing a semiconductor includes a one-piece manifold body having an inlet for receiving a process gas. The manifold body has at least one lateral wall extending in the general direction of gas flow. The lateral wall includes at least one active device site having an active device thereon. The active device is in gas communication with a gas carrying path formed within the one-piece manifold. The active device may be a manual valve, a pneumatic valve, a pressure regulator, a pressure transducer, a purifier, a filter or a flow controller. The gas is received from the active device at a continuation of the gas flow path in the manifold body and is conveyed to a manifold outlet for ultimate to the tool.
    Type: Grant
    Filed: August 10, 1999
    Date of Patent: February 27, 2001
    Assignee: Unit Instruments, Inc.
    Inventors: Eric J. Redemann, Kim N. Vu
  • Patent number: 6189570
    Abstract: A gas panel for use with a tool for manufacturing a semiconductor includes a one-piece manifold body having an inlet for receiving a process gas. The manifold body has at least one lateral wall extending in the general direction of gas flow. The lateral wall includes at least one active device site having an active device thereon. The active device is in gas communication with a gas carrying path formed within the one-piece manifold. The active device may be a manual valve, a pneumatic valve, a pressure regulator, a pressure transducer, a purifier, a filter or a flow controller. The gas is received from the active device at a continuation of the gas flow path in the manifold body and is conveyed to a manifold outlet for ultimate to the tool.
    Type: Grant
    Filed: August 10, 1999
    Date of Patent: February 20, 2001
    Assignee: Unit Instruments, Inc.
    Inventors: Eric J. Redemann, Kim N. Vu
  • Patent number: 6142539
    Abstract: A gas panel for use with a tool for manufacturing a semiconductor includes a one-piece manifold body having an inlet for receiving a process gas. The manifold body has at least one lateral wall extending in the general direction of gas flow. The lateral wall includes at least one active device site having an active device thereon. The active device is in gas communication with a gas carrying path formed within the one-piece manifold. The active device may be a manual valve, a pneumatic valve, a pressure regulator, a pressure transducer, a purifier, a filter or a flow controller. The gas is received from the active device at a continuation of the gas flow path in the manifold body and is conveyed to a manifold outlet for ultimate to the tool.
    Type: Grant
    Filed: August 10, 1999
    Date of Patent: November 7, 2000
    Assignee: Unit Instruments, Inc.
    Inventors: Eric J. Redemann, Kim N. Vu
  • Patent number: 6044701
    Abstract: A thermal mass flow controller having a thermal mass flow meter with an orthogonal thermal mass flow sensor includes a base defining a primary fluid flow path therein for carrying a flow of fluid to be metered. A pressure dropping bypass is positioned in the primary fluid flow path. A flow measuring portion of a thermal mass flow sensor is oriented substantially transversely or orthogonally with respect to and is in communication with the primary fluid flow path. The flow measuring portion includes a portion of an electrical bridge for determining a temperature of the sensor and produces a mass flow rate signal in response thereto. A valve is connected to an outlet of the primary flow path to control the flow of fluid in response to the mass flow rate signal.
    Type: Grant
    Filed: March 10, 1997
    Date of Patent: April 4, 2000
    Assignee: Unit Instruments, Inc.
    Inventors: Michael J. Doyle, Dan B. LeMay, Kim N. Vu
  • Patent number: 5992463
    Abstract: A gas panel for use with a tool for manufacturing a semiconductor includes a one-piece manifold body having an inlet for receiving a process gas. The manifold body has at least one lateral wall extending in the general direction of gas flow. The lateral wall includes at least one active device site having an active device thereon. The active device is in gas communication with a gas carrying path formed within the one-piece manifold. The active device may be a manual valve, a pneumatic valve, a pressure regulator, a pressure transducer, a purifier, a filter or a flow controller. The gas is received from the active device at a continuation of the gas flow path in the manifold body and is conveyed to a manifold outlet for ultimate to the tool.
    Type: Grant
    Filed: October 30, 1996
    Date of Patent: November 30, 1999
    Assignee: Unit Instruments, Inc.
    Inventors: Eric J. Redemann, Kim N. Vu
  • Patent number: 5925829
    Abstract: Method and apparatus for determining a mass rate of flow of gas by a rate of change of pressure includes an inlet for communicating a flow of gas from a source of gas whose mass flow rate is to be measured. A volumetric container is connected to the gas inlet to receive the gas. The volumetric container precisely defines a standard volume in its interior. Positioned within the volumetric container is a heat conductive assembly for maintaining the interior of the system substantially isothermal during pressure changes of the gas as gas flows into or leaves the container. Attached to the container is a pressure measuring transducer which measures the gas pressure within the container. The rate of change of the gas pressure under isothermal conditions within the container is indicative of the rate of mass flow of the gas into or out of the volumetric container.
    Type: Grant
    Filed: February 3, 1997
    Date of Patent: July 20, 1999
    Assignee: Unit Instruments, Inc.
    Inventors: Robert Laragione, Dan B. LeMay, Eric J. Redemann, Michael D. Upchurch
  • Patent number: 5803507
    Abstract: Apparatus for handling process fluid, that is a meter includes a mass flow meter block. A deformable metal seal is positioned between the mass flow meter block and a thermal mass flow sensor in deformable engagement with a pair of edges formed thereon to provide a low contamination, high integrity metal seal.
    Type: Grant
    Filed: November 13, 1995
    Date of Patent: September 8, 1998
    Assignee: Unit Instruments, Inc.
    Inventor: Kim N. Vu
  • Patent number: 5730181
    Abstract: A mass flow controller and purifier has a canister arranged at right angles to a flow path through the mass flow controller. The canister holds a contaminant scavenging material which a gas stream contacts as it flows to remove a contaminant such as water. A purified process gas stream is fed through a bypass of a mass flow meter. A portion of the gas is supplied to a mass flow sensor which generates a signal indicative of a rate of mass flow. The mass flow signal is amplified and the amplified mass flow signal is linearized in a linearizer. The linearized mass flow signal is fed to a comparator which compares the linearized mass flow signal with an error signal and provides an output signal indicative of a mass rate of flow through the mass flow meter. A valve is connected to the mass flow meter and is controlled by the mass flow meter signal to meter the gas.
    Type: Grant
    Filed: December 2, 1996
    Date of Patent: March 24, 1998
    Assignee: Unit Instruments, Inc.
    Inventors: Michael J. Doyle, Nelson Urdaneta, Kim N. Vu
  • Patent number: 5303731
    Abstract: A liquid flow controller for metering a flow of liquid has an inlet to receive the liquid. The inlet feeds the liquid to a high resistance liquid flow path across which a pressure drop arises. A pressure sensor measures the liquid flow induced pressure drop and generates pressure drop signal which is fed to an electronic circuit. A temperature sensor is connected to the high resistance liquid flow path and generates a temperature signal which is also fed to the electronic circuit. The circuit energizes a viscosity-normalized liquid flow signal, which is compared to a set point signal to generate an error signal. A valve connected downstream of the high resistance liquid flow path to control the flow of liquid is driven by the error signal and thereby controls the flow of liquid.
    Type: Grant
    Filed: June 30, 1992
    Date of Patent: April 19, 1994
    Assignee: Unit Instruments, Inc.
    Inventors: Randall J. Vavra, Michael J. Doyle, Kim N. Vu
  • Patent number: 5279154
    Abstract: A vertical flow thermal mass flow sensor for a vertical flow thermal mass flow meter of a vertical flow thermal mass flow controller has a sensor tube having a gas inlet for receiving a gas to be metered. The sensor tube includes a first curved convection trap and a second curved convection trap for preventing convective flow of the gas through the sensor tube. A thermally responsive winding is wound about the sensor tube and is energized from a source of electrical energy. The resistance of the thermally responsive winding is responsive to the rate of flow of the gas through the sensor tube and provides an indication thereof.
    Type: Grant
    Filed: September 18, 1992
    Date of Patent: January 18, 1994
    Assignee: Unit Instruments, Inc.
    Inventors: Randall J. Vavra, Lam T. Nguyen, Erik Q. Tran
  • Patent number: 4928048
    Abstract: A fast response control circuit for providing an output signal in miminum time after receiving an enabling input signal. The control circuit includes an amplifier which provides an output signal having a magnitude determined by a variable input signal when the enabling input signal indicates that an output signal is desired. A feedback network and the amplifier together define a control loop which has a characteristic response time. When the enable signal is absent, a bias control biases a reactive component in the control loop so as to minimize this response time. The circuit is adapted for use in a fluid mass flow controller to provide rapid response to an enabling input signal, particularly when a very low fluid flow rate is desired.
    Type: Grant
    Filed: March 28, 1988
    Date of Patent: May 22, 1990
    Assignee: Unit Instruments, Inc.
    Inventor: James H. Doyle
  • Patent number: 4913192
    Abstract: Gas flow control apparatus for controlling the flow of a process gas through a conduit system to a process site, for halting the flow of gas when the process is completed, and for then developing a partial vacuum in the conduit system sufficiently high to reduce the concentration of process gas and maintain it in a gaseous state. The partial vacuum is developed by carrier gas flowing through a venturi in communication with the conduit system supplying the process gas. The carrier gas also expels any remnants of the process gas from all points between the venturi and the process site. Further, the system can be used for vaporizing gases from liquids for use in an atmospheric process at the process site, the carrier gas flowing through the venturi and vaporizing a liquid in a chamber upstream of the venturi. The vaporized gases can then be regulated by a mass flow controller.
    Type: Grant
    Filed: April 3, 1989
    Date of Patent: April 3, 1990
    Assignee: Unit Instruments, Inc.
    Inventor: Randall J. Vavra
  • Patent number: 4858643
    Abstract: A fluid flow stabilizer which includes two pluralities of stabilizer units adjacent one another. Each unit includes a plurality of parallel axially extending tubules. The units are movable into different relative positions so that certain of the tubules of a unit are aligned in fluid communication with tubules of another unit. Index means are provided for fixing the units in different selected relative positions.
    Type: Grant
    Filed: March 14, 1988
    Date of Patent: August 22, 1989
    Assignee: Unit Instruments, Inc.
    Inventors: Randall J. Vavra, Michael Doyle