Abstract: A RRAM device includes a bottom electrode, a resistive material layer, atop electrode, a hard mask and high work function sidewall parts. The bottom electrode, the resistive material layer, the top electrode and the hard mask are sequentially stacked on a substrate. The high work function sidewall parts cover sidewalls of the top electrode and sidewalls of the hard mask, thereby constituting a RRAM cell. A method of forming the RRAM device is also provided.
Type:
Application
Filed:
November 8, 2023
Publication date:
February 29, 2024
Applicant:
UNITED MICROELCTRONICS CORP.
Inventors:
Wen-Jen Wang, Chun-Hung Cheng, Chuan-Fu Wang