Patents Assigned to Universite d'Aix Marseille I
  • Patent number: 7580694
    Abstract: A circuit and method for supplying an electronic circuit with a direct supply voltage using high frequency antenna signals. The method includes producing a primary direct voltage equal to a fraction of the supply voltage using at least one antenna signal, producing at least two pumping signals having a frequency lower than the frequency of the antenna signals by means of an oscillator electrically powered by the primary voltage and boosting the primary voltage by means of a charge pump driven by the pumping signals, to obtain the supply voltage.
    Type: Grant
    Filed: December 7, 2006
    Date of Patent: August 25, 2009
    Assignees: STMicroelectronics SA, Universite d'Aix-Marseille I
    Inventors: Pierre Rizzo, Emmanuel Bergeret, Jean Gaubert, Philippe Pannier
  • Patent number: 7375502
    Abstract: A method and a circuit for scrambling the current signature of a load comprising at least one integrated circuit executing digital processings, including supplying at least the integrated circuit from a supply voltage external to the circuit by combining a current provided by a first linear regulator with a current provided by at least one capacitive switched-mode power supply circuit with one or several switched capacitances.
    Type: Grant
    Filed: February 7, 2006
    Date of Patent: May 20, 2008
    Assignees: STMicroelectronics S.A., Universite D.Aix-Marseille I
    Inventors: Alexandre Malherbe, Edith Kussener, Vincent Telandro
  • Patent number: 7307472
    Abstract: An amplitude demodulation method and device comprising a converter sampling an input signal having its sampling frequency corresponding to three times the modulation carrier frequency.
    Type: Grant
    Filed: October 27, 2004
    Date of Patent: December 11, 2007
    Assignees: STMicroelectronics S.A., Universite d'Aix Marseille I
    Inventors: Jean-Pierre Enguent, Olivier Artigue, Claude Tetelin
  • Patent number: 7242621
    Abstract: The present invention relates to a floating-gate MOS transistor, comprising drain and source regions implanted into a silicon substrate, a channel extending between the drain and source regions, a tunnel oxide, a floating gate, a gate oxide and a control gate extending according to a determined gate length. According to the present invention, the control gate comprises a small gate and a large gate arranged side by side and separated by an electrically insulating material. Application to the production of memory cells without access transistor, and to the implementation of an erase-program method with reduced electrical stress for the tunnel oxide.
    Type: Grant
    Filed: June 17, 2005
    Date of Patent: July 10, 2007
    Assignees: STMicroelectronics Rousset SAS, Universite d'Aix Marseille I
    Inventors: Jean-Michel Mirabel, Arnaud Regnier, Rachid Bouchakour, Romain Laffont, Pascal Masson
  • Publication number: 20070155357
    Abstract: A circuit and method for supplying an electronic circuit with a direct supply voltage using high frequency antenna signals. The method includes producing a primary direct voltage equal to a fraction of the supply voltage using at least one antenna signal, producing at least two pumping signals having a frequency lower than the frequency of the antenna signals by means of an oscillator electrically powered by the primary voltage and boosting the primary voltage by means of a charge pump driven by the pumping signals, to obtain the supply voltage.
    Type: Application
    Filed: December 7, 2006
    Publication date: July 5, 2007
    Applicants: STMicroelectronics S.A., Universite D'Aix-Marseille I
    Inventors: Pierre Rizzo, Emmanuel Bergeret, Jean Gaubert, Philippe Pannier
  • Publication number: 20070069278
    Abstract: A non-volatile memory point including a floating gate placed above a semiconductor substrate, the floating gate comprising active portions insulated from the substrate by thin insulating layers, and inactive portions insulated from the substrate by thick insulating layers that do not conduct electrons, the active portions being principally P-type doped, and the inactive portions comprising at least one N-type doped area forming a portion of a PN junction.
    Type: Application
    Filed: September 22, 2006
    Publication date: March 29, 2007
    Applicants: STMicroelectronics S.A., STMicroelectronics (Rousset) SAS, FRANCE UNIVERSITE D'AIX-MARSEILLE I
    Inventors: Rachid Bouchakour, Virginie Bidal, Philippe Candelier, Richard Fournel, Philippe Gendrier, Romain Laffont, Pascal Masson, Jean-Michel Mirabel, Arnaud Regnier
  • Publication number: 20060176033
    Abstract: A method and a circuit for scrambling the current signature of a load including at least one integrated circuit executing digital processings, including the step of, at least on the load ground side, combining a current absorbed by a first linear regulator with a current absorbed by at least one capacitive switched-mode circuit with one or several switched capacitances.
    Type: Application
    Filed: February 7, 2006
    Publication date: August 10, 2006
    Applicants: STMicroelectronics S.A., Universite D'Aix-Marseille I
    Inventors: Alexandre Malherbe, Edith Kussener, Vincent Telandro
  • Publication number: 20060176032
    Abstract: A method and a circuit for scrambling the current signature of a load comprising at least one integrated circuit executing digital processings, including supplying at least the integrated circuit from a supply voltage external to the circuit by combining a current provided by a first linear regulator with a current provided by at least one capacitive switched-mode power supply circuit with one or several switched capacitances.
    Type: Application
    Filed: February 7, 2006
    Publication date: August 10, 2006
    Applicants: STMicroelectronics S.A., Universite D'Aix-Marseille I
    Inventors: Alexandre Malherbe, Edith Kussener, Vincent Telandro
  • Publication number: 20050286303
    Abstract: The present invention relates to a floating-gate MOS transistor, comprising drain and source regions implanted into a silicon substrate, a channel extending between the drain and source regions, a tunnel oxide, a floating gate, a gate oxide and a control gate extending according to a determined gate length. According to the present invention, the control gate comprises a small gate and a large gate arranged side by side and separated by an electrically insulating material. Application to the production of memory cells without access transistor, and to the implementation of an erase-program method with reduced electrical stress for the tunnel oxide.
    Type: Application
    Filed: June 17, 2005
    Publication date: December 29, 2005
    Applicants: STMicroelectronics Rousset SAS, Universite d'Aix Marseille I
    Inventors: Jean-Michel Mirabel, Arnaud Regnier, Rachid Bouchakour, Romain Laffont, Pascal Masson