Abstract: Processes and associated devices for high precision positioning of a template an substrate during imprint lithography includes a calibration system with a course calibration stage and a fine orientation stage capable of maintaining a uniform gap between the template and substrate. The fine orientation stage includes a pair of flexure members having flexure joints for motion about a pivot point intersected by first and second orientation axes. Actuators lengthen or shorten to expand or contract the flexure members. Separation of the template is achieved using a peel-and-pull method that avoids destruction of imprinted features from the substrate.
Type:
Application
Filed:
July 10, 2003
Publication date:
August 5, 2004
Applicant:
University of Texas System, Board of Regents, UT System
Inventors:
Byung Jin Choi, Sidlgata V. Sreenivasan, Stephen C. Johnson
Abstract: A system of determining and correcting alignment during imprint lithography process is described. During an imprint lithographic process the template may be aligned with the substrate by the use of alignment marks disposed on both the template and substrate. The alignment may be determined and corrected for before the layer is processed.
Type:
Application
Filed:
December 29, 2003
Publication date:
July 22, 2004
Applicant:
The University of Texas System Board of Regents, UT System
Inventors:
S. V. Sreenivasan, Byung J. Choi, Matthew Colburn, Todd Bailey
Abstract: Described are imprint lithography templates, methods of forming and using the templates, and a template holder device. An imprint lithography template may include a body with a plurality of recesses on a surface of the body. The body may be of a material that is substantially transparent to activating light. At least a portion of the plurality of recesses may define features having a feature size less than about 250 nm. A template may be formed by obtaining a material that is substantially transparent to activating light and forming a plurality or recesses on a surface of the template. In some embodiments, a template may further include at least one alignment mark. In some embodiments, a template may further include a gap sensing area. An imprint lithography template may be used to form an imprinted layer in a light curable liquid disposed on a substrate. During use, the template may be disposed within a template holder.
Type:
Application
Filed:
December 29, 2003
Publication date:
July 22, 2004
Applicant:
The University of Texas System, Board of Regents, UT System
Inventors:
Todd Bailey, Byung J. Choi, Matthew E. Colburn, S. V. Sreenivasan, C. Grant Willson, John Ekerdt
Abstract: A method of determining and correcting alignment during imprint lithography process is described. During an imprint lithographic process the template may be aligned with the substrate by the use of alignment marks disposed on both the template and substrate. The alignment may be determined and corrected for before the layer is processed.
Type:
Application
Filed:
May 27, 2003
Publication date:
May 6, 2004
Applicant:
University of Texas System Board of Regents, UT System
Inventors:
S. V. Sreenivasan, Byung J. Choi, Matthew Colbum, Todd Bailey
Abstract: A method of determining and correcting alignment during imprint lithography process is described. During an imprint lithographic process the template may be aligned with the substrate by the use of alignment marks disposed on both the template and substrate. The alignment may be determined and corrected for before the layer is processed.
Type:
Application
Filed:
May 27, 2003
Publication date:
March 18, 2004
Applicant:
University of Texas System Board of Regents, UT System
Inventors:
S.V. Sreenivasan, Byung J. Choi, Matthew Colburn, Todd Bailey