Patents Assigned to University of Wisconsin-Madison
  • Organoelement resists for EUV lithography and methods of making the same
    Patent number: 7326514
    Abstract: Resist compositions containing silicon, boron, or both silicon and boron may be used with ultra-violet lithography processes and extreme ultra-violet (EUV) lithography processes to increase the reactive ion etch resistance of the resist compositions, improve transmission of the resist materials, and to dope substrates.
    Type: Grant
    Filed: March 12, 2004
    Date of Patent: February 5, 2008
    Assignees: Cornell Research Foundation, Inc., University of Wisconsin-Madison
    Inventors: Junyan Dai, Christopher K. Ober, Lin Wang, Franco Cerrina, Paul Nealey