Abstract: A method for determining the authenticity of an article including a microchip package, wherein the microchip package includes a sensing element. The method includes receiving a value of a measurable quantity. The value of the measurable quantity is measured using the sensing element. The value of the measurable quantity is indicative of an environment. Reference information indicative of the environment I received. The received value of a measurable quantity and the reference information are used to determine the authenticity of the article comprising the microchip package. A computer program product including a non-transitory computer readable medium and computer program code which when executed by a data processor is for executing the method. An apparatus for determining the authenticity of an article including a microchip package including a sensing element.

Abstract: The application discloses a radio-frequency transponder having a tamper loop functionality the state of which is readable. The radio-frequency transponder comprises attaching means comprising at least one pin and a counterpart for the pin. The attaching means is configured to attach said radio-frequency transponder to an item by means of the pin and the counterpart. The attaching means is configured to create the tamper loop for the radio-frequency transponder when the pin is in contact with the counterpart. The application also discloses a method for monitoring such a radio-frequency transponder.

Abstract: A method for manufacturing a component by etching, the component including a substrate and an electrically conductive line configuration supported by the substrate, the electrically conductive line configuration being formed by etching away locally an electrically conductive coating supported by the substrate. An etching mask is used to control locally removal and maintenance of the electrically conductive coating by using an etchant and it includes barrier material on at least one main area corresponding to the electrically conductive line configuration to be maintained during etching The etching mask further includes at least one sub-area comprising barrier material, the sub-area being arranged at a distance from the edge of the main area.