Abstract: A plasma lamp for use in a broadband plasma source of an inspection tool is disclosed. The plasma lamp includes a plasma bulb configured to contain a gas and generate a plasma within the plasma bulb. The plasma bulb is formed from a material at least partially transparent to illumination from a pump laser and at least a portion of broadband radiation emitted by the plasma. The plasma bulb includes a conical pocket. The conical pocket is configured to disrupt a plume rising from the plasma.

Abstract: In order to separate a material layer from a substrate at the boundary face between the substrate and the material layer, a laser light is applied to a workpiece from the substrate side through a mask, the work having the material layer formed on the substrate. The laser beam is split into a plurality of small area laser light by the mask 44, and two or more irradiation regions are formed on the workpiece. Adjacent irradiation regions are separated from each other, and an edge part of each irradiation region and an edge part of an adjacent irradiation region, which extend in a direction parallel to the relative moving direction of the workpiece, are arranged such that the edge of the irradiation region and the edge of the adjacent irradiation region are sequentially overlapped each other as the work is moved.

Abstract: A substrate is separated from a material layer formed on the substrate without generating cracks in the material layer formed on the substrate. In order to separate the material layer from the substrate at a boundary between the substrate (1) and the material layer (2), pulsed laser light (L) is applied, through the substrate (1), to a workpiece (3) having the material layer (2) formed on the substrate (1), while from moment to moment changing an irradiation region with respect to the workpiece (3), in such a manner that the adjacent irradiation regions overlap each other on the workpiece (3). The region where the pulsed laser light (L) is applied to the work (3) is set to satisfy the relationship of S/0.125, where S (mm2) is the area of the irradiation region, and L (mm) is the circumferential length of the irradiation region. Consequently, the material layer can be reliably separated from the substrate without generating cracks in the material layer formed on the substrate.

Abstract: An analyzing apparatus contains an image pickup unit and an analysis unit. The image pickup unit contains a view field area that covers at least a reaction area and a background area in a test piece. The reaction area exhibits a reaction color when exposed to a test substance in a specimen. The analysis unit detects the test substance based on the reaction color and determines, during detection of the test substance, whether a state of the background area falls within an acceptable range set for the test substance.

Abstract: The control of the spectral purity width E95 is performed while imparting practically no effect to the control of a central wavelength, and the spectral purity width E95 is stabilized. A wavefront adjuster 32 is provided on an output side of the interior of an optical resonator, i.e., on an output coupler 31 side. Light generated in a laser chamber 10 is transmitted through the wavefront adjuster 32 from the laser chamber 10 side, and reaches the output coupler 31. In the wavefront adjuster 32, the distance between concave and convex lenses 33 and 34 is adjusted so that a desired spectral purity width E95 can be obtained. Then, when the light passes through the wavefront adjuster 32, the wavefront of the light is adjusted to a desired wavefront.

Abstract: A cathode for a discharge lamp contains emitter material, wherein a carbide layer is formed on an outer surface of the cathode, the carbide layer is formed on an area extending from a tip portion of the cathode, and two or more grooves extending toward the tip portion of the cathode are formed on the area where the carbide layer is formed.

Abstract: A spectral purity range (E95) of a laser beam output from an amplifying laser device (300) is measured by spectral purity range measuring means. To have the measured spectral purity range (E95) within an allowable range E950±dE95 of a target spectral purity range (E950), discharge timing from a time when discharge is started by an oscillating laser device (100) to a time when discharge is started by the amplifying laser device (300) is controlled, and the spectral purity range (E95) is controlled to be stabilized.

Abstract: To provide an excimer laser device and method in which the frequency of full gas exchange within the laser chamber is reduced, and more preferably full gas exchange is made unnecessary. The gas supply device and gas exhaust device are controlled so that the laser gas in the laser chamber is partially exchanged in a gas exchange quantity that maintains the quantity of impurities in the laser chamber at or below a fixed level. Also, the gas exchange quantity is obtained using the total quantity of output light energy reduction A, the total gas pressure in the laser chamber P, and output light energy reduction quantity per unit time k, for the case where partial gas exchange is repeated infinitely in the laser chamber.

Abstract: The control of the spectral purity width E95 is performed while imparting practically no effect to the control of a central wavelength, and the spectral purity width E95 is stabilized. A wavefront adjuster 32 is provided on an output side of the interior of an optical resonator, i.e., on an output coupler 31 side. Light generated in a laser chamber 10 is transmitted through the wavefront adjuster 32 from the laser chamber 10 side, and reaches the output coupler 31. In the wavefront adjuster 32, the distance between concave and convex lenses 33 and 34 is adjusted so that a desired spectral purity width E95 can be obtained. Then, when the light passes through the wavefront adjuster 32, the wavefront of the light is adjusted to a desired wavefront.

Abstract: To provide an excimer laser device and method in which the frequency of full gas exchange within the laser chamber is reduced, and more preferably full gas exchange is made unnecessary. The gas supply device and gas exhaust device are controlled so that the laser gas in the laser chamber is partially exchanged in a gas exchange quantity that maintains the quantity of impurities in the laser chamber at or below a fixed level. Also, the gas exchange quantity is obtained using the total quantity of output light energy reduction A, the total gas pressure in the laser chamber P, and output light energy reduction quantity per unit time k, for the case where partial gas exchange is repeated infinitely in the laser chamber.

Abstract: Electric field easing members (corona rings) for easing concentration of electric fields caused at edges of a core are disposed between the core and a winding to form a gap so to allow the presence of a cooling medium (insulating oil) between the top and bottom surfaces of the core and the electric field easing members. Thus, pressboards between the core and the electric field easing members become unnecessary, a wire-wound apparatus can be prevented from having a short service life due to the degradation of the pressboards, and the pressboards can be made to have a long service life because the electric field easing members are not heated by thermal conduction from the core.

Abstract: An electrodeless microwave-generated radiation apparatus includes a microwave cavity wall made of metal material defining a microwave cavity, a lamp arranged in the microwave cavity containing emission material, a microwave generator supplying microwaves for exciting the emission material in the lamp, a microwave-coupling means coupling microwaves to the lamp through a waveguide, and a dielectric mirror arranged behind the lamp. The rise time of the apparatus can be remarkably shortened compared with the known art so that the damage of a magnetron can be reduced. The intensity of emission along the lamp is controlled by a projection or parasitic element. Further, by the use of a dielectric mirror, the object can be processed without temperature of the object to rise too high.