Abstract: A rinsing tank for rinsing with ultra clean liquid comprises a rinsing chamber confined by an enclosure equipped at the bottom part with a diffusing device with a perforated base plate connected to a first pressurized cleaning liquid supply system, and with an overflow spout at the upper part. The periphery of the perforated base plate of the diffusing device is equipped with a plurality of projection nozzles or injectors connected to a second pressurized liquid supply system. The rising flow coming from the injectors causes a downward circulation of liquid designed to remove the contaminants and particles present at the surface of the substrates. The hydraulic piston effect generated by the first supply system of the base plate forces the rinsing liquid upwards towards the overflow spout. The tank may be used for rinsing of silicon, quartz, germanium, glass, etc. substrates commonly used in the semi-conductors, micro-systems and flat screen industries.