Patents Assigned to Vacuum Optics Corporation of Japan
  • Patent number: 4948391
    Abstract: An improvement of a known pressure swing adsorption process for separating a desired gas from a gas mixture using a cylinder containing an adsorption column is disclosed. The improvement resides in a procedure for regenerating the adsorption column for repeated use, which comprises returning a portion of the desired gas having been separated in the cylinder back into the cylinder at an intermittently varying rate to flow through the column, to efficiently desorb a gas component having been adsorbed by the adsorption column and purge away the desorbed gas from the cylinder.
    Type: Grant
    Filed: May 12, 1989
    Date of Patent: August 14, 1990
    Assignee: Vacuum Optics Corporation of Japan
    Inventor: Yutaka Noguchi
  • Patent number: 4938859
    Abstract: In a high frequency ion plating device, when an evaporation substrate is intended to be rotated to form a uniform evaporated film, a variation in resistance of a contact in a rotating portion arises, making it almost impossible to provide a constant duration of high frequency discharge.A supply of a high frequency power to the substrate is effected through an auxiliary electrode such as a coil, and a dc voltage is induced in the auxiliary electrode and applied to the substrate simultaneously with a high frequency voltage. As a result of the coil the high frequency discharge is stabilized, and a stabilized supply of power is rendered possible.
    Type: Grant
    Filed: July 30, 1985
    Date of Patent: July 3, 1990
    Assignee: Vacuum Optics Corporation of Japan
    Inventors: Yoshio Ide, Masahiro Mori, Ryo Yoshida, Masaaki Miyake, Tsukasa Sawaki, Kazuo Hara