Abstract: A vapor deposition source for vaporizing a material has a body forming an interior chamber, at least one crucible in the interior chamber, and a divider that divides the interior chamber into a transport channel and a distribution channel. To deposit vapor on an underlying substrate, the deposition source also has a plurality of exit orifices formed in the body adjacent to the distribution channel. The divider has a set of divider apertures between the transport channel and the distribution channel. This divider aperture is positioned generally symmetrically within the interior chamber.
Type:
Application
Filed:
March 22, 2012
Publication date:
September 27, 2012
Applicant:
VACUUM PROCESS TECHNOLOGY LLC
Inventors:
Ralf T. Faber, Ronald A. Crocker, Keqi Zhang, Joseph Patrinostro, James S. Snyder