Abstract: Various embodiments of the present disclosure include a non-volatile memory semiconductor device and a device that uses the same, the semiconductor device including a first semiconductor chip disposed on a substrate, a first sealing resin sealing the first semiconductor chip, a built-in semiconductor device disposed on the first sealing resin, and a second sealing resin sealing the first sealing resin and the built-in semiconductor device and covering a side surface of the substrate. According to an aspect of the present disclosure, it is possible to provide a high-quality semiconductor device, in which downsizing and cost reduction can be realized.
Type:
Grant
Filed:
November 21, 2017
Date of Patent:
July 9, 2019
Assignee:
VALLEY DEVICE MANAGEMENT
Inventors:
Masanori Onodera, Kouichi Meguro, Junji Tanaka
Abstract: Various embodiments of the present disclosure include a non-volatile memory semiconductor device and a device that uses the same, the semiconductor device including a first semiconductor chip disposed on a substrate, a first sealing resin sealing the first semiconductor chip, a built-in semiconductor device disposed on the first sealing resin, and a second sealing resin sealing the first sealing resin and the built-in semiconductor device and covering a side surface of the substrate. According to an aspect of the present disclosure, it is possible to provide a high-quality semiconductor device, in which downsizing and cost reduction can be realized.
Type:
Grant
Filed:
October 13, 2016
Date of Patent:
December 5, 2017
Assignee:
VALLEY DEVICE MANAGEMENT
Inventors:
Masanori Onodera, Kouichi Meguro, Junji Tanaka
Abstract: Various embodiments of the present invention include a method for making a semiconductor device the method including disposing a first semiconductor chip on a first surface of a first substrate, the first substrate comprising a second surface opposing the first surface, depositing a first resin above the first semiconductor chip, disposing a built-in semiconductor device on the first resin. The built-in semiconductor device including a second substrate, a second semiconductor chip disposed on the second substrate, and a second resin that seals the second semiconductor chip. The method including depositing a third resin above the built-in semiconductor device and the first resin and covering a side surface of the first substrate and not extending beyond the second surface of the first substrate. According to an aspect of the present invention, it is possible to provide a high-quality semiconductor device fabrication method, in which downsizing and cost reduction can be realized.
Type:
Grant
Filed:
May 19, 2015
Date of Patent:
October 18, 2016
Assignee:
VALLEY DEVICE MANAGEMENT
Inventors:
Masanori Onodera, Kouichi Meguro, Junji Tanaka
Abstract: Various embodiments of the present invention include a semiconductor device, the semiconductor device including a first semiconductor chip disposed on a substrate, a first sealing resin sealing the first semiconductor chip, a built-in semiconductor device disposed on the first sealing resin, and a second sealing resin sealing the first sealing resin and the built-in semiconductor device and covering a side surface of the substrate. According to an aspect of the present invention, it is possible to provide a high-quality semiconductor device, in which downsizing and cost reduction can be realized.
Type:
Grant
Filed:
December 11, 2012
Date of Patent:
May 26, 2015
Assignee:
VALLEY DEVICE MANAGEMENT
Inventors:
Masanori Onodera, Kouichi Meguro, Junji Tanaka