Abstract: A system for cleaning and etching a wafer. The system includes few buffer tanks to complete the cleaning and etching process. The system further includes a loader for loading the wafer, each buffer tank storing a unique chemical solution. At least one process tank is provided for retaining the loaded wafer, and is coupled to the buffer tank to receive the chemical solution from said buffer tank and to perform the cleaning and etching of the wafer.

Abstract: An apparatus and method for implementing a supplementary column structure for supporting a raised floor. The apparatus includes a number of fixed supporting columns above a lower floor to support at least one raised floor. Each fixed supporting, column has two ends, one of which is attached to a base block fixed to the lower floor while the other end is attached to all upper connecting block supporting the raised floor. The method of adding the supplementary columns includes first choosing two fixed supporting columns and installing a horizontal beam with a U-shaped groove between the two fixed columns. At least one supplementary column is then provided, each supplementary column being attached to an I-shaped slidable base block enclosed by the grooved horizontal beam at its one end, and to an upper connecting, block supporting the raised floor at its other end. The supplementary column can then slide along the groove of the horizontal beam until a desired location is reached.