Patents Assigned to Veeco Instruments, Inc.
  • Publication number: 20210095374
    Abstract: A self-centering substrate carrier system for a chemical vapor deposition reactor includes a substrate carrier chosen to at least partially support a wafer for CVD processing and that comprises a beveled surface. A rotating tube comprising a beveled surface that matches the beveled surface of the substrate carrier, where a shape and dimensions of a cross section of the substrate carrier are chosen such that a center of mass of the substrate carrier is positioned a distance that is below a plane of contact defined by where a rim of substrate carrier contacts a rim of the rotating tube.
    Type: Application
    Filed: May 6, 2020
    Publication date: April 1, 2021
    Applicant: Veeco Instruments, Inc.
    Inventors: Sandeep Krishnan, Bojan Mitrovic, Mandar Deshpande, Alexander Gurary, Aniruddha Bagchi
  • Patent number: 10847381
    Abstract: Laser annealing systems and methods with ultra-short dwell times are disclosed. The method includes locally pre-heating the wafer with a pre-heat line image and then rapidly scanning an annealing image relative to the pre-heat line image to define a scanning overlap region that has a dwell time is in the range from 10 ns to 500 ns. These ultra-short dwell times are useful for performing surface or subsurface melt annealing of product wafers because they prevent the device structures from reflowing.
    Type: Grant
    Filed: August 21, 2018
    Date of Patent: November 24, 2020
    Assignee: Veeco Instruments Inc.
    Inventors: Andrew M. Hawryluk, Serguei Anikitchev
  • Patent number: 10844488
    Abstract: A chuck system for performing a substrate-biased atomic layer deposition process that forms an electrically conductive film on a substrate includes an electrically conductive substrate holder configured to support the substrate and an electrically conductive base that supports the substrate holder. An electrical isolating layer is sandwiched between the substrate holder and the base. The electrical isolating layer has an outer end and an edge recess formed in and that runs around the outer edge. The edge recess is configured to prevent the electrically conductive film from coating the entire interior of the edge recess, thereby maintaining electrical isolation between the substrate holder and the base.
    Type: Grant
    Filed: January 23, 2018
    Date of Patent: November 24, 2020
    Assignee: Veeco Instruments Inc.
    Inventors: Michael J. Sershen, Adam Bertuch
  • Publication number: 20200248307
    Abstract: A substrate carrier that supports a semiconductor substrate in a chemical vapor deposition system that includes a support having a beveled inner top surface including a top surface and a bottom surface. The top surface has a recessed area for receiving at least one substrate for chemical vapor deposition processing. The bottom surface has a beveled edge that forms a conical interface with the beveled inner top surface of the support at a self-locking angle that prevents substrate carrier movement in a vertical direction at a predetermined temperature equal to a maximum operation temperature. A coefficient of thermal expansion of a material forming the substrate carrier is substantially the same as a coefficient of thermal expansion of a material forming the support.
    Type: Application
    Filed: January 26, 2020
    Publication date: August 6, 2020
    Applicant: Veeco Instruments, Inc.
    Inventors: Alexander I. Gurary, Sandeep Krishnan, Yuliy Rashkovsky, Todd Luse, Gaurab Samanta
  • Patent number: 10718052
    Abstract: A rotating disk reactor for chemical vapor deposition includes a vacuum chamber and a ferrofluid feedthrough comprising an upper and a lower ferrofluid seal that passes a motor shaft into the vacuum chamber. A motor is coupled to the motor shaft and is positioned in an atmospheric region between the upper and the lower ferrofluid seal. A turntable is positioned in the vacuum chamber and is coupled to the motor shaft so that the motor rotates the turntable at a desired rotation rate. A dielectric support is coupled to the turntable so that the turntable rotates the dielectric support when driven by the shaft. A substrate carrier is positioned on the dielectric support in the vacuum chamber for chemical vapor deposition processing. A heater is positioned proximate to the substrate carrier that controls the temperature of the substrate carrier to a desired temperature for chemical vapor deposition.
    Type: Grant
    Filed: December 16, 2016
    Date of Patent: July 21, 2020
    Assignee: Veeco Instruments, Inc.
    Inventors: Louise S. Barriss, Richard A. Comunale, Roger P. Fremgen, Alexander I. Gurary, Todd A. Luse, Robert White Milgate, John D. Pollock
  • Patent number: 10707099
    Abstract: The wafer processing system includes a rotatable wafer support member for supporting a wafer and a plurality of collections trays disposed about a peripheral edge of the wafer support member. The collection trays are arranged in a stacked configuration, each collection tray having an inner wall portion and an outer wall portion that converge to define a trough section for collecting fluid. The system includes a chamber exhaust outlet that is formed in the housing for venting gas from the interior of the housing outside of the collection trays and a chemical exhaust outlet that is formed in the housing for venting gas that flows through the collection chamber to the chemical exhaust outlet. The chemical exhaust outlet is fluidly isolated from the chamber exhaust outlet.
    Type: Grant
    Filed: April 25, 2017
    Date of Patent: July 7, 2020
    Assignee: VEECO INSTRUMENTS INC.
    Inventors: William Gilbert Breingan, Chris Hofmeister, John Taddei
  • Patent number: 10676826
    Abstract: Methods of forming 2D metal chalcogenide films using laser-assisted atomic layer deposition are disclosed. A direct-growth method includes: adhering a layer of metal-bearing molecules to the surface of a heated substrate; then reacting the layer of metal-bearing molecules with a chalcogenide-bearing radicalized precursor gas delivered using a plasma to form an amorphous 2D film of the metal chalcogenide; then laser annealing the amorphous 2D film to form a crystalline 2D film of the metal chalcogenide, which can have the form MX or MX2, where M is a metal and X is the chalcogenide. An indirect growth method that includes forming an MO3 film is also disclosed.
    Type: Grant
    Filed: March 29, 2018
    Date of Patent: June 9, 2020
    Assignee: Veeco Instruments Inc.
    Inventor: Ganesh Sundaram
  • Patent number: 10665504
    Abstract: Methods disclosed herein include scanning a focus spot formed by a laser beam over either a metal layer or IC structures that include a metal and a non-metal. The focus spot is scanned over a scan path that includes scan path segments that partially overlap. The focus spot has an irradiance and a dwell time selected to locally melt the metal layer or locally melt the metal of the IC structures without melting the non-metal. This results in rapid melting and recrystallization of the metal, which decreases the resistivity of the metal and results in improved performance of the IC chips being fabricated. Also disclosed is an example laser melt system for carrying out methods disclosed herein is also disclosed.
    Type: Grant
    Filed: July 17, 2018
    Date of Patent: May 26, 2020
    Assignee: Veeco Instruments Inc.
    Inventors: Serguei Anikitchev, Andrew M. Hawryluk
  • Patent number: 10571430
    Abstract: A chemical vapor deposition or atomic layer deposition system includes a gas concentration sensor for determining the quantity of precursor gases admitted thereto. The gas concentration sensor can include a transmitter and a receiver for transmitting an acoustic signal across a chamber. In embodiments, the transmitter and receiver are designed to increase transmitted signal while reducing transmitted noise, facilitating use of the gas concentration sensor at low pressure and high temperature.
    Type: Grant
    Filed: March 10, 2017
    Date of Patent: February 25, 2020
    Assignee: Veeco Instruments Inc.
    Inventors: Chi-Jung Cheng, Leo Chin, Christopher J. Morath, Arindam Sinharoy, Raymond C. Logue
  • Patent number: 10570510
    Abstract: An arrangement of two shutters radially outward from an injector block and a susceptor onto which a wafer carrier is removably mounted are configured to provide a flowpath through a reactor chamber that does not exhibit a vortex, thereby reducing or eliminating buildup on the inside of the reactor chamber and facilitating large temperature gradient between the injector block and the wafer carrier. This can be accomplished by introduction of a purge gas flow at a radially inner wall of an upper shutter, and in some embodiments the purge gas can have a different chemical composition than the precursor gas used to grow desired epitaxial structures on the wafer carrier.
    Type: Grant
    Filed: March 2, 2017
    Date of Patent: February 25, 2020
    Assignee: Veeco Instruments Inc.
    Inventors: Bojan Mitrovic, Eric Armour, Ian Kunsch
  • Patent number: 10512862
    Abstract: Filter elements for gaseous fluid (e.g., air) filtration for wafer processing systems. The filter elements have a pleat ratio of no greater than 7, where the pleat ratio is the number of pleats per mean diameter of the filter. By having a pleat ratio no greater than 7, and in some implementations also greater than 5, the filter is optimized for wafer processing systems and methods. This pleat ratio optimizes the spacing between pleats, thus balancing filtration media area against effective area, such as what might be lost due to contaminant bridging.
    Type: Grant
    Filed: September 26, 2017
    Date of Patent: December 24, 2019
    Assignee: VEECO INSTRUMENTS INC.
    Inventors: Maria Ferreira, Joseph Lamb, Ankit Modi, David Gant
  • Publication number: 20190362963
    Abstract: A self-centering wafer carrier system for a chemical vapor deposition (CVD) reactor includes a wafer carrier comprising an edge. The wafer carrier at least partially supports a wafer for CVD processing. A rotating tube comprises an edge that supports the wafer carrier during processing. An edge geometry of the wafer carrier and an edge geometry of the rotating tube being chosen to provide a coincident alignment of a central axis of the wafer carrier and a rotation axis of the rotating tube during process at a desired process temperature.
    Type: Application
    Filed: July 17, 2019
    Publication date: November 28, 2019
    Applicant: Veeco Instruments, Inc.
    Inventors: Sandeep Krishnan, Alexander I. Gurary, Chenghung Paul Chang, Earl Marcelo
  • Patent number: 10438795
    Abstract: A self-centering wafer carrier system for a chemical vapor deposition (CVD) reactor includes a wafer carrier comprising an edge. The wafer carrier at least partially supports a wafer for CVD processing. A rotating tube comprises an edge that supports the wafer carrier during processing. An edge geometry of the wafer carrier and an edge geometry of the rotating tube being chosen to provide a coincident alignment of a central axis of the wafer carrier and a rotation axis of the rotating tube during process at a desired process temperature.
    Type: Grant
    Filed: June 10, 2016
    Date of Patent: October 8, 2019
    Assignee: Veeco Instruments, Inc.
    Inventors: Sandeep Krishnan, Alexander I. Gurary, Chenghung Paul Chang, Earl Marcelo
  • Patent number: D860146
    Type: Grant
    Filed: November 30, 2017
    Date of Patent: September 17, 2019
    Assignee: Veeco Instruments Inc.
    Inventors: Yuliy Rashkovsky, Mandar Deshpande, Alexander Gurary, Sandeep Krishnan, Aniruddh Parekh
  • Patent number: D860147
    Type: Grant
    Filed: March 26, 2018
    Date of Patent: September 17, 2019
    Assignee: Veeco Instruments Inc.
    Inventors: Sandeep Krishnan, Yuliy Rashkovsky, Alexander Gurary, Leo Chin, Mandar Deshpande
  • Patent number: D863239
    Type: Grant
    Filed: March 26, 2018
    Date of Patent: October 15, 2019
    Assignee: Veeco Instruments Inc.
    Inventors: Sandeep Krishnan, Yuliy Rashkovsky, Alexander Gurary, Leo Chin, Mandar Deshpande
  • Patent number: D866491
    Type: Grant
    Filed: March 26, 2018
    Date of Patent: November 12, 2019
    Assignee: Veeco Instruments Inc.
    Inventors: Sandeep Krishnan, Yuliy Rashkovsky, Alexander Gurary, Leo Chin, Mandar Deshpande
  • Patent number: D893088
    Type: Grant
    Filed: July 13, 2018
    Date of Patent: August 11, 2020
    Assignee: Veeco Instruments Inc.
    Inventors: Premkumar Suhandira Viran, Hao Chen, Joe Lamb
  • Patent number: D908102
    Type: Grant
    Filed: February 20, 2019
    Date of Patent: January 19, 2021
    Assignee: Veeco Instruments Inc.
    Inventors: Michael W. Pacier, Michael J. Sershen, Adam F. Bertuch, Laurent Lecordier
  • Patent number: D908103
    Type: Grant
    Filed: February 20, 2019
    Date of Patent: January 19, 2021
    Assignee: Veeco Instruments Inc.
    Inventors: Michael W. Pacier, Michael J. Sershen, Adam F. Bertuch, Laurent Lecordier