Patents Assigned to Veeco Metrology, Inc.
  • Patent number: 8213021
    Abstract: Correction factors for the ALR and PTR parameters of magnetic-head sliders are determined by calculating an effective reflectivity and a corresponding PCOR at each pixel of the air-bearing surface. The absolute value of reflectivity at each pixel of the AlTiC air-bearing surface is obtained from an empirical equation relating it to modulation. The ratio of Al2O3 and TiC in the AlTiC surface is then calculated at every pixel assuming a linear relationship between the absolute value of AlTiC reflectivity and the theoretical reflectivity of each constituent. The linear relationship is then also used to calculate the effective (complex) reflectivity for the AlTiC material from the relative concentrations of Al2O3 and TiC at each pixel.
    Type: Grant
    Filed: June 29, 2007
    Date of Patent: July 3, 2012
    Assignee: Veeco Metrology, Inc.
    Inventors: Dong Chen, Florin Munteanu, Erik Novak, G. Lawrence Best
  • Patent number: 7865966
    Abstract: A method of operating a scanning probe microscope (SPM) includes scanning a sample as a probe of the SPM interacts with a sample, and collecting sample surface data in response to the scanning step. The method identifies a feature of the sample from the sample surface data and automatically performs a zoom-in scan of the feature based on the identifying step. The method operates to quickly identify and confirm the location of features of interest, such as nano-asperities, so as to facilitate performing a directed high resolution image of the feature.
    Type: Grant
    Filed: September 12, 2008
    Date of Patent: January 4, 2011
    Assignee: Veeco Metrology Inc.
    Inventors: Chanmin Su, Sergey Belikov
  • Patent number: 7578176
    Abstract: A scanning probe microscope's probe tip dimensions as they exist or existed for a certain data or measurement are inferred based on probe activity taking place since a probe characterization procedure was performed. The inferred probe tip dimensions can be used to correct nanoscale measurements taken by the probe to account for changes in the probe's geometry such as wear.
    Type: Grant
    Filed: December 22, 2006
    Date of Patent: August 25, 2009
    Assignee: Veeco Metrology, Inc.
    Inventors: Tianming Bao, Hao-Chih Liu, Gregory A. Dahlen, Rohit Jain