Abstract: A monolithic microplasma source includes a dielectric substrate having an outer surface that is exposed to a time varying electric field. A gap layer is positioned on an inner surface of the dielectric substrate. A shield including a slit is positioned on the gap layer. A relief structure is formed in at least one of the gap layer and the dielectric substrate. The dimensions of the gap layer, the slit in the shield, and the relief structure are chosen so as to prevent a formation of a continuous film across the relief structure. A chamber containing a gas is positioned adjacent to the shield so that the gas is ionized to form a microplasma when an electric field is induced in the chamber by the incident time varying electric field.

Abstract: A microplasma emission spectrometer is described that includes a chamber for confining a sample volume of gas. A microplasma source that includes a resonant antenna structure generates a microplasma in the chamber from the sample volume of gas. A RF power supply provides power to the resonant antenna structure that generates the microplasma from the sample volume of gas. A spectrally sensitive detector is optically coupled to the microplasma. The entrance of the spectrally sensitive detector has dimensions and is positioned so that emissions from at least one-tenth of a total volume of the microplasma are transmitted through the entrance of the spectrally sensitive detector.