Abstract: A transducer is bonded to a metal carrier that is mounted on an elastomeric frame-like diaphragm. The outer periphery of the diaphragm is mounted on a frame bonded to the bottom of a quartz tank. A vacuum applied to a chamber surrounding the lower portion of the carrier draws the carrier against the tank bottom with a compliant interface between the tank and the carrier. A cover clamps the diaphragm to the support and creates a coolant chamber with the diaphragm and the carrier for cooling the transducer. In other arrangements, resilient material or springs are employed to produce a force to compress the interface against the tank. Also the weight of the tank can produce compressive force on the interface.

Abstract: A cleaning system for semiconductor wafers wherein a megasonic energy cleaning system is utilized. Megasonic energy cleaning systems comprise a piezo-electric transducer and a transmitter. The transducer emits high frequency energy into the body of the transmitter. The transmitter radiates this energy into a container holding processing fluid. The energy causes the liquid to oscillate, thus vibrating contaminants off the surface of the wafer. The megasonic cleaning system is located atop a table which is mounted on a piston. In retracting the piston, the bottom of the container is removed any any liquid held within is dumped out into a second receptacle. The piston can then be returned to its extending position, and a rinsing agent can be added. Thus the megasonic cleaning system can be employed during the rinse cycle as well as the processing cycle, better cleaning the semiconductor wafer.