Abstract: A coating for an article comprising layers of nitrides of certain transition metals to provide an electrically-conductive, light-attenuating, antireflection surface.
Type:
Grant
Filed:
September 3, 1991
Date of Patent:
April 18, 1995
Assignee:
Viratec Thin Films, Inc.
Inventors:
Erik J. Bjornard, Debra Steffenhagen, R. Russel Austin
Abstract: An apparatus for rotatably mounting a cylindrical magnetron in a vacuum chamber. The apparatus includes a bearing housing having one end extending into the vacuum chamber with the other end located outside the chamber. A drive shaft is rotatably mounted in the bearing housing. Each end of the drive shaft extends beyond the housing. The cylindrical magnetron is attached to the end of the drive shaft inside the chamber. A vacuum seal is located in the bearing housing for sealing the drive shaft to the housing. The drive shaft is mounted in the housing such that the load of the magnetron is not transferred to the vacuum seal.
Type:
Grant
Filed:
July 29, 1991
Date of Patent:
April 6, 1993
Assignee:
Viratec Thin Films, Inc.
Inventors:
David E. Stevenson, Erik J. Bjornard, Geoffrey H. Humberstone
Abstract: A coating or multilayer structure for a substrate. The coating comprises an induced transmission filter coupled to a short wavelength pass filter.
Abstract: A mask arrangement is located between the cathode and substrate in an in-line sputtering system. The relative shape of the mask may be changed from outside the system. Thus, film thickness uniformity can be modified and controlled without interrupting the sputtering process.
Type:
Grant
Filed:
October 12, 1990
Date of Patent:
October 20, 1992
Assignee:
Viratec Thin Films, Inc.
Inventors:
Erik J. Bjornard, Michael J. Valiska, Clifford L. Taylor
Abstract: A multilayer, thin-film, broad-band, anti-reflection structure applicable to transparent substrates. The present invention makes use of the UV absorption properties of zinc oxide to provide UV rejection for wavelengths shorter than 380 nm, while providing anti-reflection properties in the visible region of the spectrum. The structure provides a reflection value less than 0.25% in the visible region of the spectrum, and blocks 99 percent of UV radiation below 380 nm.
Abstract: An in-line sputtering system with rotating cylindrical magnetrons is fitted with a system of anodes having a large surface area. The surface area is equal to or greater than the surface area of the sputtering chambers' internal walls. The anodes may be grounded, allowed to float electrically, or connected to a separate bias power supply. The anode surfaces are protected from contamination by sputtered material or are designed so the electron collecting surface may be replaced during the sputtering process. The anodes may be equipped with a magnet array for improving electron collecting efficiency.
Type:
Grant
Filed:
November 21, 1990
Date of Patent:
April 21, 1992
Assignee:
Viratec Thin Films, Inc.
Inventors:
Eric R. Dickey, Erik J. Bjornard, James J. Hoffmann
Abstract: A multilayer antireflection coating designed for deposition in in-line coating machines by DC reactive sputtering. About half of the total thickness of the coating may be formed from zinc oxide which has a high sputtering rate.
Abstract: A rotatable magnetron having a cathode and a bearing assembly wherein the cathode may be removed from a coating chamber while the bearing assembly remains in place.
Type:
Grant
Filed:
October 18, 1990
Date of Patent:
March 31, 1992
Assignee:
Viratec Thin Films, Inc.
Inventors:
David E. Stevenson, Erik J. Bjornard, Geoffrey Humberstone
Abstract: A coating for an article comprising layers of nitrides of certain transition metals to provide an electrically-conductive, light-attenuating, antireflection surface.