Abstract: A shelf-stable concentrated antimicrobial composition and method of using same comprises: at least one cyclic carboxylic acid and/or salt thereof in an amount from about 1 wt. % to about 10 wt. %; at least one anionic surfactant in an amount from about 10 wt. % to about 35 wt. %; at least one non-surfactant strong acid having a pKa less than about 2.3 in an amount from about 2 wt. % to about 25 wt. %; and at least one chelating agent in an amount from about 0.1 wt. % to about 10 wt. %. The composition retains at least 90% of its original antimicrobial efficacy after storage for at least five years at room temperature, and is substantially free of hydrogen peroxide, sources of hydrogen peroxide, parabens, aldehydes, aldehyde releasing agents, phenols, biguanides, peroxycarboxylic acids, quaternary ammonium compounds, chlorine compounds, enzymes, and etchants.

Abstract: A low-foaming cleaning solution and dry particulate formulation which can be diluted with water, deionized water, or mixtures thereof, to form the cleaning solution. The cleaning solution has an alkaline pH, which is preferably from about 8 to about 11.5 and consists essentially of at least one low foaming surfactant in a concentration of from about 0.005% to about 40% w/w of the total solution, at least one active oxygen releasing compound in an amount effective to produce a hydrogen peroxide concentration of from about 0.005% to about 50% w/w of the total solution, at least one builder in a concentration of from about 0.001% to about 50% w/w of the total solution, and at least one diluent selected from the group consisting of water, deionized water, and mixtures thereof.

Abstract: An acidic aqueous hydrogen peroxid solution is provided, with improved disinfectant activity. Concentrated solutions preferably contain up to about 8% and as-used concentrations contain about 0.5% peroxide. The solution also contains from 0.1 to 5.0% of at least one acid compound, e.g. phosphoric and/or a phosphonate with from 1 to 5 phosphonic acid groups, and from 0.02 to 5% of at least one anionic surfactant. The surfactant is selected from C8 to C16-alkyl aryl sulphonic acids, sulphonated C12 to C22 carboxylic acids, C8 to C22-alkyl diphenyl oxide sulphonic acids, naphthalene sulphonic acids, C8 to C22 alkyl sulphonic acids, and alkali metal and ammonium salts thereof, and alkali metal C8 to C18 alkyl sulphates, and mixtures thereof. Most preferably the solution has an emulsifier, e.g. a salt of an alkylated diphenyl oxide. The solution may also contain corrosion inhibitors and/or lower alcohols.