Abstract: A device for measuring reference points in real time during lithographic printing includes a light source providing an exposure beam; a light modulator modulating the exposure beam according to an exposure pattern; a measurement system configured to measure a position of a number of alignment marks previously arranged on a substrate; and an exposure optical system comprising a control unit. The exposure optical system delivers the modulated exposure beam as an image provided by the light modulator onto the substrate. The exposure system control unit is configured to calculate the orientation of the substrate based on the position of the alignment marks and control the delivering of the modulated exposure beam relative to the calculated orientation of the substrate.
Type:
Grant
Filed:
June 29, 2020
Date of Patent:
February 20, 2024
Assignee:
Visitech AS
Inventors:
Øyvind Tafjord, Trond Jørgensen, Endre Kirkhorn, Roy Almedal
Abstract: A device for measuring reference points in real time during lithographic printing includes a light source providing an exposure beam; a light modulator modulating the exposure beam according to an exposure pattern; a measurement system configured to measure a position of a number of alignment marks previously arranged on a substrate; and an exposure optical system comprising a control unit. The exposure optical system delivers the modulated exposure beam as an image provided by the light modulator onto the substrate. The exposure system control unit is configured to calculate the orientation of the substrate based on the position of the alignment marks and control the delivering of the modulated exposure beam relative to the calculated orientation of the substrate.
Type:
Application
Filed:
June 29, 2020
Publication date:
September 1, 2022
Applicant:
Visitech AS
Inventors:
Øyvind Tafjord, Trond Jørgensen, Endre Kirkhorn, Roy Almedal
Abstract: A system for exposing a material with images includes an exposure table and an electronic light projector arranged above the exposure table. The system is adapted to project images towards a material arranged at the exposure table. The electronic light projector and the exposure table are configured to be moved relative to each other during exposure. The electronic light projector is connected to a projector control unit configured to provide a sequence of images to be exposed represented by image data and superimpose a static image pattern onto the edge sections of the images to be exposed, resulting in a sequence of combined images. The width of the static image pattern is slimmer than the image to be exposed. The electronic light projector is configured to expose the combined images sequentially onto the material.
Type:
Application
Filed:
April 24, 2020
Publication date:
August 4, 2022
Applicant:
Visitech AS
Inventors:
Endre Kirkhorn, Trond Jørgensen, John Daae
Abstract: A light source device for illuminating microdisplay devices, e.g. a DMD, LCOS, LCD, GLV, etc. comprises a housing having a specularly and/or diffusely light reflective interior surface and an exit aperture adapted to the shape and size of the microdisplay device, wherein the housing defines a cavity, at least one light emitting device mounted on or in wall(s) of the housing, for emitting light into the cavity, electrical power supply unit(s) and control electronic unit(s) for controlling the light emitting device(s). The device may also comprise an optical component in the cavity, e.g. a lens in the light path for obtaining even more output efficiency of the device.