Abstract: Disclosed is a substrate transfer apparatus including a moving plate including an upper magnetic levitation rail and a lower magnetic levitation rail, a processing chamber disposed adjacent to the moving plate and that processes a substrate, and a shuttle disposed between the upper magnetic levitation rail and the lower magnetic levitation rail, being moved on the moving plate, and that accommodates the substrate.

Abstract: Disclosed is a substrate transfer apparatus including a moving plate including an upper magnetic levitation rail and a lower magnetic levitation rail, a processing chamber disposed adjacent to the moving plate and that processes a substrate, and a shuttle disposed between the upper magnetic levitation rail and the lower magnetic levitation rail, being moved on the moving plate, and that accommodates the substrate.

Abstract: Provided is an electrostatic chuck with multiple heater zones. The electrostatic chuck with multiple heater zones comprises multiple micro heater zones; a switch module having each switching means connected to each micro heater zone; and a switch controlling module for controlling an operation of the switch module, wherein each micro heater zone can be heated individually by a corresponding heating element, and each partial area of a wafer secured on the electrostatic chuck is heated independently by each micro heater zone.

Abstract: Disclosed is a substrate transfer apparatus including a first moving plate, a second moving plate located at a lower portion of the first moving plate, and an EFEM including a first rail, a first moving body that is moved on the first rail, and a first robot connected to the moving body and that transports a substrate, and connected to the first moving plate and the second moving plate and that provides the substrate to the first moving plate or the second moving plate.

Abstract: Disclosed is a substrate transfer apparatus including a first moving plate, a second moving plate located on a lower side of the first moving plate, a shuttle that is moved on the first moving plate or the second moving plate and that accommodates a substrate, and a first layer transfer connected to the first moving plate and the second moving plate, and that moves the shuttle from any one of the first moving plate and the second moving plate to the other one.

Abstract: Disclosed is a substrate transfer apparatus including a moving plate including an upper magnetic levitation rail and a lower magnetic levitation rail, a processing chamber disposed adjacent to the moving plate and that processes a substrate, and a shuttle disposed between the upper magnetic levitation rail and the lower magnetic levitation rail, being moved on the moving plate, and that accommodates the substrate.

Abstract: A substrate transfer apparatus includes a moving plate, a load lock chamber disposed at one end of the moving plate, a plurality of processing chambers disposed in a longitudinal direction at opposite ends of the moving plate, and a first arm that is connected with the moving plate and that transfers a substrate between one processing chamber among the plurality of processing chambers and the load lock chamber. The moving plate provides a first path along which a first pivot axis of the first arm performs a circular motion on the moving plate.

Abstract: A substrate transfer apparatus includes a moving plate, a load lock chamber disposed at one end of the moving plate, a plurality of processing chambers disposed in a longitudinal direction at opposite ends of the moving plate, and an arm that is connected with the moving plate and that transfers a substrate between one processing chamber among the plurality of processing chambers and the load lock chamber. The moving plate provides a first path along which a first pivot axis of the arm linearly moves in a lateral direction on the moving plate.