Abstract: According to various embodiments, a vacuum arrangement may comprise the following: a first dehydration chamber and a second dehydration chamber, which are gas-separated from one another; a substrate transfer chamber for changing clocked substrate transport into continuous substrate transport towards the second dehydration chamber; a first high-vacuum pump of gas-transfer type for evacuating the first dehydration chamber; and a second high-vacuum pump of gas-binding type for evacuating the second dehydration chamber; wherein the first dehydration chamber is, with respect to the substrate transport, arranged between the second dehydration chamber and the substrate transfer chamber.

Abstract: According to various aspects of the disclosure, a method may comprise: varying a drive force, by which a chamber valve of a vacuum chamber is held closed, when the vacuum chamber has been evacuated; and aerating the vacuum chamber after the variation of the drive force; transporting a substrate through the chamber valve when the chamber valve has been opened.

Abstract: According to various aspects of the disclosure, a circulation conveyor transport wheel (100) may have: a framework (102) at which the circulation conveyor transport wheel (100) can be rotatably mounted; a multiplicity of coupling devices (104) which are arranged at an outer circumference of the framework (102) and of which each of the coupling devices has at least one form-fit contour (104f) for the form-fitting coupling-on of a substrate carrier (400), wherein the multiplicity of coupling devices (104) has a pair (302) of coupling devices (104), the form-fit contours of which have a smaller spacing to one another along the circumference than to the form-fit contours of the multiplicity of coupling devices (104) which are arranged immediately adjacent to the pair (302).

Abstract: Coating processes for vacuum chamber arrangements and apparatus thereof are herein disclosed. In some aspects, a coating process may include coating at least one workpiece using a vacuum chamber arrangement. The vacuum chamber arrangement may include a vacuum chamber, a substrate holding arrangement, an additional substrate holding arrangement, one or more bearings, a supply hose and an additional supply hose. The vacuum chamber may include a lock chamber, an additional lock chamber, a heating chamber, an additional heating chamber, and a coating chamber. The one or more bearings may support the substrate holding arrangement in such a way that it can be moved between the lock chamber and the coating chamber. The one or more bearings may also support the additional substrate holding arrangement in such a way that it can be moved between the additional lock chamber and the coating chamber.

Abstract: According to various embodiments, the temperature control roller may comprise: a cylindrical roller shell, which has a multiplicity of gas outlet openings; a temperature control device, which is configured to supply and/or extract thermal energy to or from the cylindrical roller shell; multiple gas lines made to extend along the axis of rotation; a gas distributing structure, which couples the multiple gas lines and the multiplicity of gas outlet openings to one another in a gas-conducting manner, the gas distributing structure having a lower structure density than the multiplicity of gas outlet openings.

Abstract: A method comprises: forming a first layer stack on a first substrate by means of a multiplicity of coating processes, each coating process of which forms at least one layer of the first layer stack; detecting an optical spectrum of the first layer stack; determining correction information for at least one coating process of the multiplicity of coating processes using a model, wherein the model provides a right-unique mapping function between a deviation of the spectrum from a desired spectrum and the correction information; and changing at least one control parameter for controlling the at least one coating process of the multiplicity of coating processes using the correction information; and forming a second layer stack on the first or a second substrate by means of the multiplicity of coating processes using the changed control parameter, each coating process of which forms at least one layer of the second layer stack.

Abstract: In accordance with various embodiments, an electron beam evaporator can comprise the following: a tubular target; an electron beam gun for producing at least one vapor source on a removal surface of the tubular target by means of an electron beam; wherein the removal surface is a ring-shaped axial end surface or a surface of the tubular target that extends conically or in a curved fashion from the free end edge.

Abstract: The invention relates to various embodiments of a solid particle-source (100a, 100a) that can comprise: a container (104) which comprises an area for receiving solid particles; at least one electron source (106) for introducing electrons into the solid particles such that an electrostatic charge of the solid particles produced by the electrons separates them from each other and accelerates them in a direction out from the container (104); a vibration source (110) which is designed to introduce a vibration in the region in order to loosen the solid particles, the electronic source comprising an emission surface for emitting electrons into a vacuum emission region.

Abstract: A vacuum chamber having a vacuum chamber; at least one processing region arranged in the vacuum chamber; and a substrate holding arrangement for transporting and/or positioning a substrate or multiple substrates in the processing region, wherein the substrate holding arrangement has: a first drive train with a first substrate holder, the first substrate holder being configured to rotatably hold one or more substrates, a second drive train with a first support arm, wherein the first substrate holder is held rotatably by the first support arm, a third drive train with a second substrate holder, the second substrate holder being configured for rotatably holding one or more substrates, and a fourth drive train with a second support arm, wherein the second substrate holder is held rotatably by the second support arm, and wherein the first, second, third and fourth drive trains are each configured to be controllable independently of one another.

Abstract: An ion source can have: a multiplicity of electrodes, which are mounted electrically separated from one another and have: a first electrode, which has a depression; a second electrode, which is arranged in the depression; a third electrode, which partially covers the depression and through which a slit passes which exposes the second electrode; one or more than one magnet, which is designed to provide a magnetic field in the slit.

Abstract: According to various embodiments, a method for vaporizing a vaporization material by means of an electron beam may include the following: generating a first deflection pattern having a first power density at least on an end face of a rod-shaped vaporization material; and, subsequently, generating a second deflection pattern having a second power density on a portion of an outer edge of the rod-shaped vaporization material and a portion of an inner edge of a ring crucible, which encloses the rod-shaped vaporization material, wherein the second power density is greater than the first power density.

Abstract: In accordance with various embodiments, a coating arrangement may comprise: an electron beam gun for providing an electron beam; a beam trap for trapping the electron beam; a control device for driving the electron beam gun and/or the beam trap, wherein the control device is configured to switch over the driving between a plurality of configurations, of which: in a first configuration, the electron beam is directed onto the beam trap; and in a second configuration, the electron beam is directed past the beam trap.

Abstract: A processing arrangement comprising: a process chamber comprising an upper chamber wall, a lower chamber wall and two lateral chamber walls; an insulating structure, arranged between the processing region and each of the upper chamber wall, the lower chamber wall and the two lateral chamber walls, respectively, for thermally insulating the processing region, wherein the insulating structure is configured as gas-permeable at least in sections in such a way that a process gas from the processing region can flow out of the processing region in the direction in each of the upper chamber wall, the lower chamber wall and the two lateral chamber walls, respectively, through the insulating structure; and a gas channel, arranged between the insulating structure and each of the upper chamber wall, the lower chamber wall and the two lateral chamber walls, respectively, for pumping away the process gas which flows through the insulating structure.

Abstract: Herein is disclosed a process comprising transporting of a foil structure in a coating region in a vacuum chamber, wherein the foil structure has a thickness of less than 40 ?m; and coating the foil structure with a protective layer using a gaseous coating material; wherein the gaseous coating material comprises a metal; applying an active material on the foil structure to form a first electrode which has a first chemical potential; assembling the first electrode with a second electrode, where the second electrode has a second chemical potential; and encapsulating the first electrode and the second electrode.

Abstract: In accordance with various embodiments, provision is made of a substrate holding device, wherein the latter may comprise a carrier plate with a recess, the recess extending from an upper side of the carrier plate to a lower side of the carrier plate through the carrier plate, a holding frame, which has a frame opening and a support area, surrounding the frame opening, for holding a substrate in the recess, wherein the holding frame inserted into the recess lies on the carrier plate in sections.

Abstract: According to the present disclosure, a process includes transporting of a foil structure in a coating region in a vacuum chamber, wherein the foil structure has a thickness of less than 40 ?m; and coating the foil structure by physical vapor deposition, which includes forming a gaseous coating material in the coating region; wherein the gaseous coating material includes carbon, such that a protective layer is formed that includes a carbon microstructure covering more than about 50% of the foil structure and having a fraction of pores or voids less than about 50%.

Abstract: According to various embodiments, a transporting device may comprise: a plurality of transporting rollers, of which at least two transporting rollers comprises: a glass tube mounted rotatably about an axis of rotation; the glass tube being joined together from a plurality of tube segments, a first tube segment of which is arranged between two second tube segments; and the first tube segment having a plurality of portions, the circumferential surfaces of which are surfaces of rotation with respect to the axis of rotation and/or are arranged coaxially; the plurality of transporting rollers providing by means of the circumferential surfaces a transporting surface for transporting a substrate in plate form and/or in strip form.

Abstract: The disclosure relates to a method for coating a substrate with particles, wherein the following method steps are carried out in a vacuum: positioning a substrate surface of the substrate to be coated in a vacuum and in the direction of a region in which there are disposed solid particles with which the substrate surface is to be coated; and; and introducing electrons into the solid particles for electrostatic charging of the solid particles in such a way that a force brought about by the electrostatic charging separates the solid particles from one another and accelerates them in the direction of the substrate surface of the substrate for coating of the substrate surface with at least a portion of the separated solid particles. A device that can be used in accordance with the disclosure has a particle container, a substrate holder and an electron source.

Abstract: According to various embodiments, a socket arrangement for holding an end block on a process chamber may include the following: a first socket element with a first fastening arrangement for fastening the first socket element on a process chamber wall and with a second fastening arrangement; and a second socket element with a third fastening arrangement, for fastening the second socket element on the first socket element and with a fourth fastening arrangement for fastening an end block on the second socket element; wherein the second fastening arrangement of the first socket element and the third fastening arrangement of the second socket element may be formed for engaging in one another with play in such a way that the second socket element may be deflectable in relation to the first socket element.

Abstract: In various embodiments, an end block assembly for rotatably mounting a tubular electrode in a processing chamber is provided. The end block assembly includes a receptacle region for receiving a bearing assembly which has a coupling region for coupling the tubular electrode thereto, the bearing assembly of which the coupling region is supported by a sleeve of the bearing assembly. The sleeve is plug-fitted into the receptacle region. The sleeve is joined together from a plurality of segments, the external faces thereof forming a lateral surface of the bearing assembly and at least two segments thereof being formed from dissimilar materials. The external faces of the two segments are mutually aligned such that they are flush with one another.