Patents Assigned to Vorgem Limited
  • Process monitor
    Patent number: 6894786
    Abstract: A substrate is etched in a vacuum enclosure in a process which generates plasma light emission. The process is monitored by passing emitted light via a window, a thin film narrow band filter and a “Fabry-Perot” etalon to a detector. The output signal from the detector is analyzed by shape recognition techniques to derive a measure of the progress of the process. The shape recognition preferably makes use of digital filtering and comparison with reference data derived from the theoretical analysis or from a calibration run.
    Type: Grant
    Filed: July 12, 1999
    Date of Patent: May 17, 2005
    Assignee: Vorgem Limited
    Inventors: Mark Burton Holbrook, William George Beckmann, Jacques Andre Grange
  • Thickness monitoring
    Patent number: 6226086
    Abstract: The thickness of a thin layer structure is monitored during deposition or etching. The structure is illuminated with a predetermined energy (visible or near visible light or x-ray) and a modified parameter of the illumination is measured, which may be reflection intensity, transmission intensity or polarisation. The detected signal is examined by shape recognition techniques using adaptive digital filters.
    Type: Grant
    Filed: April 19, 1999
    Date of Patent: May 1, 2001
    Assignee: Vorgem Limited
    Inventors: Mark Burton Holbrook, William George Beckmann, Simon Eric Hicks, Christopher David Wicks Wilkinson