Patents Assigned to VTT-NTM OU
  • Patent number: 10012491
    Abstract: A diffraction interferometer includes a reference light passage, a test light passage and a pinhole substrate. The pinhole substrate includes a test pinhole and a reference pinhole. The diffracted wavefront emitted from the test pinhole is reflected by the optical component to be tested adjacent to the pinhole substrate and a converge adjacent to the reference pinhole. The diffracted wavefront includes surface shape information of an optical component to be tested that is reflected by the pinhole substrate. Interference with the diffracted wavefront is emitted by the reference pinhole and forms interference fringes. The large numerical aperture phase-shifting dual pinhole diffraction interferometer adopts a dual pinhole substrate and a illumination manner with two converged light paths to enable the separation of the reference light and test light, to prevent disturbance between the two light paths, which would induce the change of interferogram status during phase-shifting.
    Type: Grant
    Filed: October 27, 2014
    Date of Patent: July 3, 2018
    Assignees: CHANGCHUN INSTITUTE OF OPTICS, FINE MECHANICS AND PHYSICS, CHINESE ACADEMY OF SCIENCES, VTT-NTM OU
    Inventors: Nikolay Voznesenskiy, Dongmei Ma, Chunshui Jin, Haitao Zhang, Jie Yu, Mariia Voznesenskaia, Tatiana Voznesenskaia, Wenlong Zhang
  • Publication number: 20170184391
    Abstract: The present invention relates to a large numerical aperture phase-shifting dual pinhole diffraction interferometer and its test method, the diffraction interferometer comprises: reference light passage, test light passage and pinhole substrate; wherein, said pinhole substrate comprises test pinhole and reference pinhole; the diffracted wavefront emitted from the test pinhole would be reflected by the optical component to be tested near the pinhole substrate and converge near the reference pinhole, and said diffracted wavefront comprising surface shape information of optical component to be tested, would be reflected by the pinhole substrate and interference with the diffracted wavefront emitted by reference pinhole, forming interference fringes.
    Type: Application
    Filed: October 27, 2014
    Publication date: June 29, 2017
    Applicants: CHANGCHUN INSTITUTE OF OPTICS, FINE MECHANICS AND PHYSICS, CHINESE ACADEMY OF SCIENCES, VTT-NTM OÜ
    Inventors: Nikolay VOZNESENSKIY, Dongmei MA, Chunshui JIN, Haitao ZHANG, Jie YU, Mariia VOZNESENSKAIA, Tatiana VOZNESENSKAIA, Wenlong ZHANG
  • Publication number: 20110249272
    Abstract: The present invention is related with the optical instrument such as interferometer for testing the optical systems and samples whereas the optical instrument comprises the laser (1) for generating the laser beam which passes the beam expander (2), beam-splitter (23) dividing the laser beam to a working light beam and reference light beam, focusing objectives (3, 7), flat glass plate (4) with one side coated by thin metal highly reflecting coating with the pattern including a pinhole, computer (12), CCD camera (13), tested part or optical system (6). In addition the optical instrument comprises at least two flat mirrors (24, 25), observation objective and at least one stop (20) placed between the beam-splitter (23), flat mirrors (24, 25) and/or focusing objective (7).
    Type: Application
    Filed: November 30, 2009
    Publication date: October 13, 2011
    Applicant: VTT-NTM OU
    Inventors: Maria Voznesenskaya, Aleksei Kuznetsov, Jung Mee Suk, Heorhi Tsikhanchuk