Abstract: Some embodiments of the invention generally relate to an apparatus configured to monitor emissions. The apparatus includes a sampling chamber, a gas analyzer, and a particulate matter analyzer. The sampling chamber is configured to receive a portion of an exhaust flow from an exhaust stack. The portion of the exhaust flow comprises one or more gases and particulate matter. The gas analyzer is configured to receive the portion of the exhaust flow to measure at least one emission level of the one or more gases using a laser and output a signal indicative thereof. The particulate matter analyzer is operatively connected to the sampling chamber and is configured to measure the particulate matter using optics and output a signal indicative thereof.
Type:
Application
Filed:
December 8, 2009
Publication date:
August 19, 2010
Applicant:
W R SYSTEMS, LTD.
Inventors:
Robert G. Johns, Reginald L. Viray, Edward P. Weaver, Nathan J. Lundin, Megan Jones