Patents Assigned to Wafer Tech
  • Patent number: 6459491
    Abstract: A method to monitor a dimension of a pellicle includes projecting a first light signal against a surface of the pellicle. A second light signal reflected from the surface of the pellicle is detected, with the second light signal being a representation of the first light signal. The method determines if the dimension of the pellicle is within an allowable value based on a characteristic of the detected second light signal. The characteristic of the detected second light signal can include time periods between pulses of the detected second light signal, an intensity of the detected second light signal, or a positional displacement of the detected second light signal.
    Type: Grant
    Filed: July 12, 2001
    Date of Patent: October 1, 2002
    Assignee: Wafer Tech
    Inventor: Phong T. Nguyen