Patents Assigned to Wako Pure Chemical Industries Ltd.
  • Patent number: 9238322
    Abstract: A molding die for molding a substrate to be included in a microchip includes a first die and a second die contactable with and separable from the first die. One of the first die and the second die includes a ridge for molding the groove and a columnar first protrusion for molding at least a smallest diameter portion of a hole in the substrate, the portion having the smallest inner diameter. The other of the first die and the second die includes a second protrusion which is formed to be columnar having a diameter larger than the diameter of the first protrusion and contacts with a distal end of the first protrusion to mold the hole so as to extend through the substrate in cooperation with the first protrusion. A microchip also is provided.
    Type: Grant
    Filed: October 25, 2011
    Date of Patent: January 19, 2016
    Assignees: WAKO PURE CHEMICAL INDUSTRIES, LTD., KONICA MINOLTA, INC.
    Inventor: Kanji Sekihara
  • Patent number: 9238224
    Abstract: A flow path groove is formed in the surface of at least one of two resin substrates; the two resin substrates are joined with the surface in which the flow path groove is formed facing inward; a through-hole having a substantially round cross section is formed in either one of the two resin substrates such that the through-hole connects with the flow path groove from the surface opposite the surface where the two resin substrates join; protruding parts, which protrude in the direction of thickness of the resin substrates and are disposed enclosing the through-hole, are formed in the surface on the opposite side; a space, which has a substantially round cross-sectional shape concentric with the through-hole and has depth in the same direction as the direction of thickness of the resin substrates, is formed in the joined surfaces when the protruding parts are projected from the direction substantially perpendicular to the joined surfaces; and the correlation of fc>fa is satisfied when the edges on the base e
    Type: Grant
    Filed: March 5, 2010
    Date of Patent: January 19, 2016
    Assignees: Konica Minolta, Inc., Wako Pure Chemical Industries, Ltd.
    Inventors: Takashi Washizu, Hiroshi Hirayama
  • Patent number: 9234247
    Abstract: Disclosed is a method for detecting mutation(s) in nucleotide sequence, which comprises performing a nucleic acid amplification reaction by using an oligonucleotide or a salt thereof as a primer and a nucleic acid in a sample as a template and detecting a reaction product, wherein the oligonucleotide is so modified at the nucleotide at the second position from the 3?-terminus as to inhibit the nucleic acid synthesis. Also disclosed is a kit for the method. According to the present invention, since it is possible to completely eliminate any false positive result in the determination and correspond to various mutation patterns by a single run of PCR1 reaction, it becomes possible to design a drug-resistance determination system, which can detect possible plural genetic mutations by a single run of multiplex PCR.
    Type: Grant
    Filed: March 12, 2007
    Date of Patent: January 12, 2016
    Assignee: Wako Pure Chemical Industries, Ltd.
    Inventor: Tomokazu Ishikawa
  • Patent number: 9222950
    Abstract: In an analysis system having an analysis apparatus using a reagent container having a memory to store reagent information concerning the reagent in the reagent container and a remote computer, the following steps are executed: reading out the reagent information from the memory of the reagent container; judging, based on the read reagent information, whether or not the reagent in the reagent container is usable; when it is judged that the reagent in the reagent container is unusable, writing data representing the reagent is unusable into the memory of the reagent container; and when it is judged that the reagent in the reagent container is unusable, registering the data representing the reagent is unusable, into a reagent database managed by the remote computer in association with identification information to identify the reagent container. Thus, it is possible to automatically identify the reagent, which should not be used, and to manage the reagent not so as to use it for the analysis.
    Type: Grant
    Filed: June 6, 2014
    Date of Patent: December 29, 2015
    Assignee: WAKO PURE CHEMICAL INDUSTRIES, LTD.
    Inventors: Masahiro Satomura, Hishiri Komiyama
  • Publication number: 20150364792
    Abstract: It is an object of the present invention to provide an electrochemical device having an electrolytic solution having high current density, as well as high safety, where dissolution and deposition of magnesium progress repeatedly and stably. Furthermore, the present invention relates to an electrolytic solution for an electrochemical device, comprising (1) a supporting electrolyte comprising a magnesium salt, and (2) at least one or more kinds of the compound represented by following general formula (I) (wherein n represents an integer of 0 to 6, and n pieces of R1 and n pieces of R2 each independently represent a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, or a halogenoalkyl group having 1 to 6 carbon atoms.
    Type: Application
    Filed: January 22, 2014
    Publication date: December 17, 2015
    Applicant: WAKO PURE CHEMICAL INDUSTRIES, LTD.
    Inventors: Tsutomu Watahiki, Takahiro Kiyosu, Kazuhiko Sato, Goro Mori, Kuniaki Okamoto
  • Patent number: 9207163
    Abstract: A glass-cell vial is provided which can examine specimen without causing any hindrance even when as minimum as possible specimen is used, and prevents mixture of foreign substances from causing examination errors. A vial is provided which comprises function of cell capable of optical examination, and the inner surface of bottom of the vial is formed to be a round-state convex part upwardly and the outer surface of the bottom is formed to be in convex state. When a small amount of liquid specimen is introduced into this cell vial, a part which can be a light irradiation part for optical examination can be positioned between the meniscus part of the liquid specimen and the upper end of the inner bottom. Consequently, it becomes possible to examine light quantity variation even though the specimen is in small amount.
    Type: Grant
    Filed: March 24, 2008
    Date of Patent: December 8, 2015
    Assignees: WAKO PURE CHEMICAL INDUSTRIES, LTD., SHIOTANI M.S. CO., LTD.
    Inventors: Hiromi Shiraishi, Haruki Oishi, Kazuto Shiotani, Kazuhiro Mori, Jun Mutoh
  • Patent number: 9190695
    Abstract: The present invention provides a non-aqueous electrolytic solution including a methylenebissulfonate derivative and improving initial irreversible capacity and other characteristics of a battery such as cycle characteristics, electric capacity, and storage characteristics; a method for producing thereof; and a battery using the electrolytic solution. The non-aqueous electrolytic solution includes: (1) a non-aqueous solvent comprising a cyclic carbonate ester, a straight chained carbonate ester, and/or a cyclic carboxylic acid ester, (2) a lithium salt which may be dissolved in the non-aqueous solvent, as an electrolyte salt, and (3) a methylenebissulfonate derivative of formula [I]: The method includes steps of dissolving a lithium salt in a non-aqueous solvent, and then dissolving the methylenebissulfonate derivative. The non-aqueous electrolytic solution battery includes (i) the non-aqueous electrolytic solution above, (ii) a negative electrode, (iii) a positive electrode, and (iv) a separator.
    Type: Grant
    Filed: August 2, 2011
    Date of Patent: November 17, 2015
    Assignee: Wako Pure Chemical Industries, Ltd.
    Inventors: Kuniaki Okamoto, Motoshige Sumino, Tsutomu Watahiki, Kouki Ohkubo, Tatsuko Ikeda
  • Patent number: 9162225
    Abstract: A microchip having a substrate, a cover member joined to one surface of the substrate, and a flow path formed on at least one of joined surfaces of the substrate and the cover member, wherein the microchip includes: a well which is an first opening for communicating into the flow path with a surface opposite to the joined surface of the substrate and is arranged on the substrate; and a chimney which is a member arranged so as to project from the surface opposite to the joined surface of the substrate and has an second opening which communicating into the well, wherein a liquid rise prevention section is formed in the chimney to prevent the liquid from rising to a top portion of the chimney.
    Type: Grant
    Filed: March 15, 2010
    Date of Patent: October 20, 2015
    Assignees: KONICA MINOLTA, INC., Wako Pure Chemical Industries, Ltd.
    Inventors: Hiroshi Hirayama, Takashi Washizu, Naoki Shimizu, Toshinori Takimura, Takehiko Goshima, Yoshiyuki Masuda
  • Patent number: 9157911
    Abstract: In the method of assaying an analyte in a sample of the present invention, magnetic silica particles are used. The magnetic silica particles include: silica particles containing 60 to 95% by weight of a superparamagnetic metal oxide that has an average particle size of 1 to 15 nm; and the analyte, an analog of the analyte, or a substance capable of specifically binding to the analyte immobilized on the surface of the silica particles.
    Type: Grant
    Filed: May 31, 2012
    Date of Patent: October 13, 2015
    Assignees: SANYO CHEMICAL INDUSTRIES, LTD., WAKO PURE CHEMICAL INDUSTRIES, LTD.
    Inventors: Yusuke Mizuno, Masamitsu Miyamori, Shinjiro Matsuda, Yo Yagura
  • Publication number: 20150287993
    Abstract: It is an object of the present invention to provide an electrode capable of maintaining superior capacity retention without destruction of an electrode structure, even in the case of using an active material including silicon.
    Type: Application
    Filed: October 25, 2013
    Publication date: October 8, 2015
    Applicants: WAKO PURE CHEMICAL INDUSTRIES, LTD., Tokyo University of Science Foundation
    Inventors: Shinichi Komaba, Naoaki Yabuuchi, Zhen-Ji Han, Takeo Sasaki, Shota Hashimoto, Kuniaki Okamoto, Tsuneaki Maesawa
  • Patent number: 9110087
    Abstract: The present invention provides a polymer of the compound represented by formula [1]: and the compound represented by formula [2]: to a glycidyl group of which an anion exchanging group is introduced; a filler for measuring an acidic group binding to a perfluoro compound at a terminal, which comprises the polymer; a column filled with the filler; a method for measuring said perfluoro compound having an acidic group at a terminal by using the column; a filler or a column filled with the filler comprising the polymer for measuring a drug; and a method for measuring a drug by using the column.
    Type: Grant
    Filed: July 24, 2013
    Date of Patent: August 18, 2015
    Assignees: WAKO PURE CHEMICAL INDUSTRIES, LTD., NIPPON FILCON CO., LTD.
    Inventors: Yoshinori Inoue, Kimiko Yoshida, Mamoru Kubota, Hitoshi Uemori
  • Publication number: 20150140820
    Abstract: A cleaning agent is provided for a semiconductor substrate superior in corrosion resistance of a tungsten wiring or a tungsten alloy wiring, and superior in removal property of polishing fines (particle) such as silica or alumina, remaining at surface of the semiconductor substrate, in particular, at surface of a silicon oxide film such as a TEOS film, after a chemical mechanical polishing process; and a method for processing a semiconductor substrate surface. A cleaning agent for a semiconductor substrate is to be used in a post process of a chemical mechanical polishing process of the semiconductor substrate having a tungsten wiring or a tungsten alloy wiring, and a silicon oxide film, comprising (A) a phosphonic acid-based chelating agent, (B) a primary or secondary monoamine having at least one alkyl group or hydroxyalkyl group in a molecule and (C) water, wherein a pH is over 6 and below 7.
    Type: Application
    Filed: April 26, 2013
    Publication date: May 21, 2015
    Applicant: WAKO PURE CHEMICAL INDUSTRIES, LTD.
    Inventors: Hiromi Kawada, Hironori Mizuta, Tsuneaki Maesawa
  • Patent number: 9034810
    Abstract: The present invention is directed to provide a semiconductor surface treating agent; composition which is capable of stripping an anti-reflection coating layer, a resist layer, and a cured resist layer in the production process of a semiconductor device and the like easily and in a short time, as well as a method for treating a semiconductor surface, comprising that the composition is used.
    Type: Grant
    Filed: September 1, 2010
    Date of Patent: May 19, 2015
    Assignee: Wako Pure Chemical Industries, Ltd.
    Inventors: Hironori Mizuta, Takuhiro Kimura
  • Publication number: 20150125985
    Abstract: It is the object of the present invention to provide an alkali etching solution for solar cell manufacturing, which is capable of forming uniformly a fine hubbly structure throughout a whole wafer on the surface of a wafer having a silicon as a main component, and still more is applicable to various wafers; and a method for manufacturing a silicon-based substrate for solar cell manufacturing, using the etching solution.
    Type: Application
    Filed: May 10, 2013
    Publication date: May 7, 2015
    Applicant: WAKO PURE CHEMICAL INDUSTRIES, LTD.
    Inventors: Naoko Ohuchi, Masahiko Kakizawa, Hiroyuki Tsurumoto, Terumi Watanabe, Shinshi Kawara
  • Publication number: 20150111218
    Abstract: Provided are a method for accurately evaluating the differentiation status of stem cells by selectively staining only stem cells in an undifferentiated state, and a method for positively isolating only stem cells in an undifferentiated state. Specifically provided is a method for determining differentiation of a cell comprising a step of contacting a test cell with a probe comprising protein (A) or (B) below and a step of detecting the presence of binding of the probe to the test cell. The method for determining differentiation of a cell is capable of detecting the presence or absence of an undifferentiated stem cell in test cells by using a probe that specifically reacts with undifferentiated stem cells and detecting the presence of bonding to the test cell.
    Type: Application
    Filed: February 27, 2013
    Publication date: April 23, 2015
    Applicants: National Institute of Advanced Industrial Science and Technology, Wako Pure Chemical Industries, Ltd.
    Inventors: Hiroaki Tateno, Jun Hirabayashi, Makoto Asashima, Yuzuru Ito, Yasuko Onuma, Masaki Warashina, Masakazu Fukuda
  • Patent number: 9006164
    Abstract: The present invention is directed to provide a resist remover composition for semiconductor substrate which enables to remove a resist simply and easily in the photolithography process in the semiconductor field, and a method for removing a resist comprising that the composition is used. The present invention relates to a resist remover composition for semiconductor substrate, comprising [I] a carbon radical generating agent, [II] an acid, [III] a reducing agent, and [IV] an organic solvent, and having pH of lower than 7, and a method for removing a resist, comprising that the composition is used.
    Type: Grant
    Filed: September 1, 2010
    Date of Patent: April 14, 2015
    Assignee: Wako Pure Chemical Industries, Ltd.
    Inventors: Hironori Mizuta, Masahiko Kakizawa
  • Patent number: 8969591
    Abstract: The present invention is directed to provide an efficient production method which is capable of not only obtaining a cyclic sulfonic acid ester (sultone) at low cost and in high yield, but also the sulfonic acid ester (sultone) stably even in a commercial scale. The present invention relates to a method for producing hydroxysultone comprising a first step where a diol having a specified structure and a thionyl halide are reacted to obtain a cyclic sulfite having a specified structure, and a second step where the cyclic sulfite is reacted with water or/and alcohol; a method for producing an unsaturated sultone having a specified structure comprising a third step where a hydroxylsultone having a specified structure is reacted with an acid halide or an acid anhydride to obtain an intermediate, subsequently the intermediate is treated with a base; as well as a cyclic sulfite having a specified structure.
    Type: Grant
    Filed: January 24, 2014
    Date of Patent: March 3, 2015
    Assignee: Wako Pure Chemical Industries, Ltd.
    Inventors: Ayako Kuramoto, Kuniaki Okamoto, Tsutomu Watahiki, Motoshige Sumino
  • Publication number: 20150050749
    Abstract: The invention provides a method for detection of mutant-type DNA or/and wild-type DNA by contacting at least one of a single-stranded DNA having a substituted nucleotide, a deficient nucleotide region, or an inserted nucleotide region (mutant-type DNA), or/and a wild-type single-stranded DNA corresponding to the mutant-type DNA (wild-type DNA) with a probe hybridizing with both single-stranded DNAs, to form a hybrid with the mutant-type DNA (mutant-type hybrid) or/and a hybrid with the wild-type DNA (wild-type hybrid) (at least one of the obtained mutant-type hybrid and wild-type hybrid has a loop structure), (2) contacting the obtained mutant-type hybrid or/and wild-type hybrid with an intercalator, and (3) detecting the presence or absence of the mutant-type DNA or/and the wild-type DNA by separating the conjugate of mutant-type hybrid and intercalator or/and the conjugate of wild-type hybrid and intercalator.
    Type: Application
    Filed: March 22, 2013
    Publication date: February 19, 2015
    Applicants: WAKO PURE CHEMICAL INDUSTRIES, LTD., KANAGAWA PREFECTURAL HOSPITAL ORGANIZATION
    Inventors: Shoichi Matsukuma, Tomokazu Ishikawa, Tatsuo Kurosawa
  • Publication number: 20150050649
    Abstract: The invention provides a method of detecting DNA having a microsatellite region without causing the problem of a non-specific reaction product. The method includes (1) contacting a probe, which does not have a nucleotide sequence complementary to the microsatellite region and hybridizes with both sides of the nucleotide sequences of the microsatellite region, with DNA having the microsatellite region, to form a hybrid of the DNA and the probe, which has a loop structure including a microsatellite region, (2) separating the obtained hybrid, (3) detecting the hybrid. The invention also provides a hybrid of DNA and a probe, having a loop structure including a microsatellite region, which is made by contacting DNA having a microsatellite region with the probe which does not have a nucleotide sequence complementary to the microsatellite region, and hybridizes with both sides of the nucleotide sequence of the microsatellite region.
    Type: Application
    Filed: March 22, 2013
    Publication date: February 19, 2015
    Applicants: WAKO PURE CHEMICAL INDUSTRIES, LTD., KANAGAWA PREFECTURAL HOSPITAL ORGANIZATION
    Inventors: Shoichi Matsukuma, Tomokazu Ishikawa, Tatsuo Kurosawa
  • Patent number: 8957212
    Abstract: There is intended to provide the novel compounds which generate a base easily when irradiated with long wavelength light (active energy rays), a photobase generator containing the compounds and a photobase generation method, and the present invention relates to the compounds represented by the general formula [1], a photobase generator containing the compounds and a photobase generation method: (wherein, Ar represents any of groups with specific structures selected from the group consisting of an anthracenyl group, an anthraquinonyl group and a pyrenyl group; R1 and R2 each independently represent a hydrogen atom or a linear, branched or cyclic alkyl group having 1 to 10 carbon atoms, or represent ones which can form an alicyclic ring containing nitrogen atom(s) or an aromatic ring containing nitrogen atom(s) together with a nitrogen atom to which they are bound, which the rings having 3 to 8 carbon atoms which may have a substituent, R3 and R4 each independently represent a hydrogen atom, a linear, branc
    Type: Grant
    Filed: December 1, 2009
    Date of Patent: February 17, 2015
    Assignee: Wako Pure Chemical Industries, Ltd.
    Inventors: Ayako Kuramoto, Motoshige Sumino, Nobuhiko Sakai