Abstract: A thermal system includes a base member, a two-phase fluid, a tuning heater, and a chuck. The base member includes at least one fluid passageway. The two-phase fluid is disposed within the fluid passageway. A pressure of the two-phase fluid is controlled such that the two-phase fluid provides at least one of heating and cooling to the base member. The tuning heater is secured to the base member. The chuck is secured to the tuning heater opposite to the base member. The tuning heater includes a plurality of zones to fine tune a heat distribution provided by the base member to the chuck.

Abstract: A semiconductor processing apparatus includes a wafer support assembly, a temperature sensor integrated in the wafer support assembly for measuring a temperature of the wafer support assembly, and a signal transmission device that wirelessly transmits a signal relating to a temperature measurement obtained by the temperature sensor to an external control module.

Abstract: A support assembly for use in semiconductor processing includes an application substrate, a heater layer disposed directly on the application substrate, an insulation layer disposed on the heater layer, and a second substrate disposed on the insulation layer. The heater layer is directly disposed on the application substrate by a layered process such that the heater layer is in direct contact with the application substrate. The application substrate defines a material having a relatively low coefficient of thermal expansion that is matched to a coefficient of thermal expansion of the heater layer. A periphery of the second substrate extends beyond a periphery of the application substrate.

Abstract: A method of heating an exhaust gas in an exhaust aftertreatment system by selecting a heating mode between different heating modes based on an engine load and a status of a component of the exhaust aftertreatment system. The method includes heating the exhaust gas by operating the electric heater in the selected heating mode and heating the exhaust gas to reduce an exhaust temperature gradient across the exhaust conduit.

Abstract: A process controller is provided and includes at least one optical sensor. The optical sensor includes an optical source is configured to emit an electronic signal toward an object. The process controller further includes a control unit in communication with the at least one optical sensor, wherein the control unit controls a controlled device based on the electronic signal received by the at least one optical sensor. In another form, the optical sensor further includes an optical detector configured to receive the return electronic signal reflected by the object. A system for process control in an elevated radio frequency (RF) environment is also provided and includes a process controller having at least one optical sensor and a control unit in communication with the optical sensor. The optical sensor is disposed within the elevated RF environment and includes an optical detector.

Abstract: A support assembly for use in semiconductor processing includes an application substrate, a heater layer disposed directly onto the application substrate, an insulation layer disposed onto the heater layer, and a second substrate disposed onto the insulation layer. The heater layer is directly disposed onto the application substrate by a layered process such that the heater layer is in direct contact with the application substrate. The application substrate defines a material having a relatively low coefficient of thermal expansion that is matched to a coefficient of thermal expansion of the heater layer.

Abstract: A thermal system includes a plurality of resistor circuits that define a number of resistor circuits Rn. The thermal system also has a plurality of nodes that connect the plurality of resistor circuits and define a number of nodes Nn. A plurality of power wires are connected to each of the plurality of nodes, and the plurality of power wires define a number of power wires Pn. A plurality of signal wires connect to each of the plurality of nodes to sense the temperature of each of the resistor circuits, and the plurality of signal wires define a number of signal wires Sn. The number of power wires Pn and the number of signal wires Sn is equal to the number of nodes Nn, and the number of resistor circuits Rn is greater than or equal to the number of nodes Nn.

Abstract: An apparatus for supporting a substrate in a process chamber and regulating surface temperature of the substrate and method of making the same is provided. The apparatus includes a base support having a surface adapted to support the substrate and a heater for heating the substrate with the heater being disposed proximate the base support. The base support is made of a composite material comprising a plurality of thermally conductive arcuate members embedded within a matrix, each of the plurality thermally conductive arcuate members being arranged concentrically and defining predetermined intervals in a radial direction such that the composite material provides an anisotropic thermal conductivity in radial (?), azimuthal (?) and axial (z) directions in a cylindrical coordinate system of the base support.

Abstract: The present disclosure relates generally to a process controller and more specifically to a process controller with integrated optical sensing.

Abstract: A control system for controlling an operation of a resistive heater includes a dielectric parameter determination module for determining a dielectric parameter of the resistive heater when the resistive heater is in an active mode, and a diagnostic module for diagnosing performance of the resistive heater based on the dielectric parameter.

Abstract: A thermal system includes: a base member including at least one fluid passageway in which a two-phase fluid is disposed; a tuning layer secured to the base member; and a control system. The pressure of the two-phase fluid is controlled such that the two-phase fluid provides at least one of heating and cooling to the base member. The tuning layer includes a plurality of zones. The control system includes a plurality of sets of power lines in communication with the tuning layer, and a plurality of addressable control elements in electrical communication with the power lines and with the tuning layer. The control elements provide selective control of the tuning layer zones.

Abstract: An electrical heating device for medical equipment is provided. The electrical heating device includes a conducting body forming a channel therethrough for fluid travel, a base dielectric layer disposed on the conducting body, a heater surrounding the base dielectric layer and the conducting body, a top dielectric layer disposed on the heater, and a protection housing that is preformed and that defines a cavity to receive the top dielectric layer and the heater in the cavity. The base dielectric layer and the top dielectric layer jointly enclose the heater. At least one of the base dielectric layer and the top dielectric layer has a radial portion at a side of the heater such that the radial portion surrounds a portion of the base layer dielectric that is sandwiched between the heater and the conducting body and no portion of the heater is exposed from the base dielectric layer and the top dielectric layer.

Abstract: A heater assembly includes a heating member, a mounting member that mounts the heating member to a wall of an external component, and an insulator disposed between the heating member and the wall. The insulator electrically insulates the heating member from the wall and blocks a ground path from the heating member to the wall of the external component.

Abstract: An apparatus, such as a heater, is provided that includes a base member having at least one fluid passageway. A two-phase fluid is disposed within the fluid passageway, a pressure of the two-phase fluid being controlled such that the two-phase fluid provides at least one of heating and cooling to the base member. A tuning layer is secured to the base member, and the tuning layer includes a plurality of zones. Furthermore, a component, such as a chuck by way of example, is secured to the tuning layer.

Abstract: An electrical heating device for medical equipment is provided. The heating device includes a body, which may be an insulating body forming a channel therethrough for fluid travel, an insulating material surrounding the body, and a heater surrounding the body and the insulating material. In other forms, the electrical heating device for medical equipment has a conducting body, instead of an insulating body, forming a channel therethrough for fluid travel. A base dielectric layer is disposed on the conducting body, and a heater surrounds the base dielectric layer and the conducting body. A top dielectric layer is disposed on the heater, and a protection housing surrounds the top dielectric layer.

Abstract: A thermographic inspection system includes a heat source configured to be removably attached to an exterior surface of an object. A thermal imaging device obtains a thermal image of the object, and an analyzing device determines a location of a defect in the object based on the thermal image.

Abstract: A support pedestal device for an electrostatic chuck includes a base housing defining an internal cavity, and a base insert disposed proximate the internal cavity of the base housing. A fluid pathway is formed in the internal cavity and includes a plurality of linear-parallel cooling channels separated by corresponding plurality of linear-parallel cooling fins, a fluid supply channel, and a fluid return channel. A cooling fluid flows through the fluid supply channel, through the plurality of linear-parallel cooling channels, and back through the fluid return channel to cool the support pedestal device.

Abstract: A process of forming a resistive device such as a load resistor or a heater is provided that includes forming a dielectric layer onto a substrate, a target, or an adjacent functional layer, wherein the dielectric layer in one form defines a single layer of dielectric tape. The dielectric tape is laminated to the substrate, the target, or the adjacent functional layer through a single predetermined cycle of pressure, temperature and time. A resistive layer is formed on the dielectric layer after the dielectric tape is laminated to the substrate. A protective layer is formed over the resistive layer.

Abstract: An active temperature measurement system includes at least one grounded thermocouple and a processor in communication with the at least one grounded thermocouple. The processor is configured to receive measurements from the at least one grounded thermocouple. The at least one grounded thermocouple is biased by an isolated voltage when the processor is receiving a measurement from the at least one grounded thermocouple.

Abstract: A heater includes a resistance coil, a first conducting pin and a second conducting pin. The resistance coil includes a first end connected to the first conducting pin, and a second end connected to the second conducting pin. The resistance coil defines a first portion adjacent the first end, a second portion adjacent the second end, and a third portion disposed between the first portion and the second portion. At least one of the first, second, and third portions has a continuously variable pitch along its length.