Patents Assigned to Weir Slurry Group, Inc.
  • Patent number: 7871241
    Abstract: A self-monitoring adjustment system is provided for evaluating and effecting adjustment of the leakage restricting mechanism between the rotating and non-rotating elements of a rotodynamic pump to restrict leakage and to establish desired gap dimensions between the rotating and non-rotating elements of the pump. The adjustment system is structured to be self-monitoring for determination of when an adjustment of the leakage restricting mechanism is warranted by the conditions of the pump, and is structured with adjusting mechanisms that are self-adjusting responsive to the monitored conditions of the pump, though manual adjustment is also enabled.
    Type: Grant
    Filed: January 14, 2009
    Date of Patent: January 18, 2011
    Assignee: Weir Slurry Group, Inc.
    Inventors: Ronald J. Bourgeois, Randy J. Kosmicki, Jeffrey C. Vian, Tyler M. Erlandson, Michael L. Viken
  • Patent number: 7780402
    Abstract: In a rotodynamic pump, a seal chamber conditioning valve mechanism is positioned at least partially within the seal chamber of the pump to selectively and intermittently deliver fluid to or discharge contents from the seal chamber to modify the condition or content of the seal chamber and effectively protect the mechanical seal from failure due to, for example, built up solids or the presence of air. The conditioning valve mechanism may be actuated by a control device in communication with monitoring apparatus that determines the condition of the seal chamber, and particularly the mechanical seal face.
    Type: Grant
    Filed: January 30, 2007
    Date of Patent: August 24, 2010
    Assignee: Weir Slurry Group, Inc.
    Inventor: Kevin Buschkopf
  • Publication number: 20090180866
    Abstract: A self-monitoring adjustment system is provided for evaluating and effecting adjustment of the leakage restricting mechanism between the rotating and non-rotating elements of a rotodynamic pump to restrict leakage and to establish desired gap dimensions between the rotating and non-rotating elements of the pump. The adjustment system is structured to be self-monitoring for determination of when an adjustment of the leakage restricting mechanism is warranted by the conditions of the pump, and is structured with adjusting mechanisms that are self-adjusting responsive to the monitored conditions of the pump, though manual adjustment is also enabled.
    Type: Application
    Filed: January 14, 2009
    Publication date: July 16, 2009
    Applicant: WEIR SLURRY GROUP, INC.
    Inventors: Ronald J. Bourgeois, Randy J. Kosmicki, Jeffrey C. Vian, Tyler M. Erlandson, Michael L. Viken
  • Patent number: 7429160
    Abstract: A floating ring seal arrangement for rotodynamic pumps comprises a flexible ring that is structured to fit within a circular channel formed by generally concentric grooves in the rotating and non-rotating elements of the pump, the ring further being sized to rest against the inner diameter of the groove of the rotating element when static, and capable of radially expansion under centrifugal forces to cause the flexible ring to float in the circular channel during operation of the pump, or deformation under centrifugal or pressure forces such that gaps between the flexible ring and groove in the non-rotating element are minimized or eliminated.
    Type: Grant
    Filed: January 10, 2006
    Date of Patent: September 30, 2008
    Assignee: Weir Slurry Group, Inc.
    Inventors: Aleksander S. Roudnev, Randy J. Kosmicki
  • Patent number: 7179057
    Abstract: In accordance with the present invention, an impeller for use in a centrifugal pump has at least one vane the radially outer terminal end of which is configured to produce a flow velocity profile that controls and reduces the wear caused by slurry fluid being expelled from the impeller on the inner surface of the pump casing. The impeller vanes of the present invention are generally configured with a radially outwardly extending portion, as compared with the conventional straight or concave edge of an impeller vane. The outwardly extending portion may vary in shape, but is selected to produce a flow velocity profile that reduces wear in the pump casing.
    Type: Grant
    Filed: March 31, 2004
    Date of Patent: February 20, 2007
    Assignee: Weir Slurry Group, Inc.
    Inventors: Craig I. Walker, Aleksander S. Roudnev
  • Patent number: 6988870
    Abstract: A pump casing for a centrifugal pump of the type that is used to process abrasive slurries is disclosed having at least one side or side liner that has a radially extending portion oriented toward the cutwater of the pump casing to localize the abrasive wear caused by the abrasive slurries to the side of the pump casing. The side liner of the pump is configured with a perimeter edge that is non-circular. The pump casing may preferably be configured with an open cutwater configuration or other suitable configuration for localizing wear to the sides of the casing.
    Type: Grant
    Filed: January 27, 2004
    Date of Patent: January 24, 2006
    Assignee: Weir Slurry Group, Inc.
    Inventor: Craig I. Walker
  • Patent number: 6953321
    Abstract: A selectively configured volute for incorporation into a centrifugal pump of the volute type is disclosed for use in processing heavy duty slurries that are characterized by containing particularly large and/or abrasive particulates that are known to degrade the pump casing or pump casing liner. The configured volute of the present invention is particularly suitable for use in connection with the use of an impeller having expelling vanes that aggressively pump out slurry from the seal face of the pump. The configured volute of the present invention provides resistance to wear when processing heavy duty slurries and provides stable flow performance and improved pump performance.
    Type: Grant
    Filed: December 31, 2002
    Date of Patent: October 11, 2005
    Assignee: Weir Slurry Group, Inc.
    Inventors: Aleksander S. Roudnev, Ronald J. Bourgeois, Ricardo Augusto Abarca Melo
  • Patent number: 6758343
    Abstract: The main technical problem with Dual Cyclones with Water Injection used as classifiers in grinding circuits is that they do not allow for control and regulation of the input velocity ratio between the first and second cyclone as well as the high pressure required at the intake of the first cyclone to achieve a sound operation of the second cyclone. The disclosed invention solves the technical problem by making the feeding and discharge of both cyclones' overflows form a volute in the horizontal plane with the body of the respective cyclone and by placing, between its bottom and the expansion zone, a selectively, axially-positionable member.
    Type: Grant
    Filed: December 30, 1999
    Date of Patent: July 6, 2004
    Assignee: Weir Slurry Group, Inc.
    Inventor: Oscar Castro Soto
  • Patent number: 6588729
    Abstract: A packing system for a gate valve is disclosed which includes a sealing member structured to be positioned between a compression member and packing material housed in a cavity formed in the upper edge of a valve housing to provide even and consistent pressure of the packing material against the gate of the valve, thereby preventing leakage from about the gate of the valve. The packing may also include a gasket between the compression member and sealing member to provide additional sealing assurance.
    Type: Grant
    Filed: October 18, 2001
    Date of Patent: July 8, 2003
    Assignee: Weir Slurry Group, Inc.
    Inventor: Alvin A. Kimpel