Patents Assigned to West Chester University
  • Patent number: 11492713
    Abstract: A device for generating hydrogen gas, treated water, and metal-containing nanoparticles. The device includes a vessel containing an electrolyte solution having a preferably iron anode and a preferably copper cathode. A renewable energy source is connected to the anode and the cathode. A valve for disbursing the hydrogen is connected to the hydrogen chamber.
    Type: Grant
    Filed: August 12, 2019
    Date of Patent: November 8, 2022
    Assignee: WEST CHESTER UNIVERSITY
    Inventor: John M. Pisciotta
  • Publication number: 20210035811
    Abstract: An electroless etching process. The process produces nanostructured semiconductors in which an oxidant (Ox1) is deposited as a metal on a semiconductor surface and used as a catalytic agent to facilitate reaction between a semiconductor and a second oxidant (Ox2). Ox2 is used to initiate etching by injecting holes into the semiconductor valence band as facilitated by the catalytic action of the deposited metal. The extent of reaction is controlled by the amount of Ox2 added; the reaction rate is controlled by the injection rate of Ox2. The process produces high specific surface area and/or hierarchically structured porous Si with higher and controllable yield. In addition, the ability is demonstrated to vary the pore size distribution of mesoporous silicon including producing hierarchically structured mesoporous silicon with more than one peak in the pore size distribution. In principle, the process applies to any semiconductor onto which metal can be deposited galvanically.
    Type: Application
    Filed: July 31, 2020
    Publication date: February 4, 2021
    Applicant: West Chester University
    Inventors: Kurt W. Kolasinski, Bret Unger
  • Patent number: 10590562
    Abstract: A regenerative electroless etching process produces nanostructured semiconductors in which an oxidant (Ox1) is used as a catalytic agent to facilitate reaction between a semiconductor and a second oxidant (Ox2) that would be unreactive (or slowly reactive compared to Ox1) in the primary reaction. Ox2 is used to regenerate Ox1, which can initiate etching by injecting holes into the semiconductor valence band. The extent of reaction is controlled by the amount of Ox2 added; the reaction rate, by the injection rate of Ox2. This general strategy is demonstrated specifically to produce highly luminescent nanocrystalline porous, amorphous pillared, and hierarchical porous silicon from the reaction of V2O5 in HF(aq) as Ox1 and H2O2(aq) as Ox2 with a silicon-comprising substrate. The process can be performed on silicon-comprising substrates of arbitrary size and shape including powders, reclaimed shards, wafers, pillared silicon, porous silicon, and silicon nanowires.
    Type: Grant
    Filed: October 29, 2018
    Date of Patent: March 17, 2020
    Assignee: West Chester University
    Inventors: Kurt W Kolasinski, Jarno Salonen, Ermei Makila
  • Publication number: 20200048780
    Abstract: A device for generating hydrogen gas, treated water, and metal-containing nanoparticles. The device includes a vessel containing an electrolyte solution having a preferably iron anode and a preferably copper cathode. A renewable energy source is connected to the anode and the cathode. A valve for disbursing the hydrogen is connected to the hydrogen chamber.
    Type: Application
    Filed: August 12, 2019
    Publication date: February 13, 2020
    Applicant: West Chester University
    Inventor: John M. Pisciotta
  • Publication number: 20190169766
    Abstract: A regenerative electroless etching process produces nanostructured semiconductors in which an oxidant (Ox1) is used as a catalytic agent to facilitate reaction between a semiconductor and a second oxidant (Ox2) that would be unreactive (or slowly reactive compared to Ox1) in the primary reaction. Ox2 is used to regenerate Ox1, which can initiate etching by injecting holes into the semiconductor valence band. The extent of reaction is controlled by the amount of Ox2 added; the reaction rate, by the injection rate of Ox2. This general strategy is demonstrated specifically to produce highly luminescent nanocrystalline porous, amorphous pillared, and hierarchical porous silicon from the reaction of V2O5 in HF(aq) as Ox1 and H2O2(aq) as Ox2 with a silicon-comprising substrate. The process can be performed on silicon-comprising substrates of arbitrary size and shape including powders, reclaimed shards, wafers, pillared silicon, porous silicon, and silicon nanowires.
    Type: Application
    Filed: October 29, 2018
    Publication date: June 6, 2019
    Applicant: West Chester University
    Inventors: Kurt W. Kolasinski, Jarno Salonen, Ermei Makila
  • Publication number: 20130190321
    Abstract: Methods and kits for aiding in detection, assessment and treatment of a proliferative disorder of the prostate gland in a subject are provided according to aspects of the present invention which include assaying a first biological sample comprising prostate gland cells obtained from the subject for expression of one or more biomarkers selected from the group consisting of: alcohol dehydrogenase 1B, alcohol dehydrogenase 1C, alcohol dehydrogenase 4 and hepatocyte nuclear factor 1B; and determining, based on the expression of the one or more biomarkers in the sample that the subject has, or is at risk of having, a proliferative disorder of the prostate gland.
    Type: Application
    Filed: January 23, 2013
    Publication date: July 25, 2013
    Applicant: WEST CHESTER UNIVERSITY OF PENNSYLVANIA
    Inventor: West Chester University of Pennsylvania
  • Patent number: 8436197
    Abstract: The present invention is related to palladium complexes having substituted diarylideneacetone ligands and coupling and polymerization processes thereof.
    Type: Grant
    Filed: October 27, 2008
    Date of Patent: May 7, 2013
    Assignee: West Chester University of Pennsylvania of the State System of Higher Education
    Inventor: Felix E Goodson, III