Patents Assigned to West Chester University
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Patent number: 11492713Abstract: A device for generating hydrogen gas, treated water, and metal-containing nanoparticles. The device includes a vessel containing an electrolyte solution having a preferably iron anode and a preferably copper cathode. A renewable energy source is connected to the anode and the cathode. A valve for disbursing the hydrogen is connected to the hydrogen chamber.Type: GrantFiled: August 12, 2019Date of Patent: November 8, 2022Assignee: WEST CHESTER UNIVERSITYInventor: John M. Pisciotta
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Publication number: 20210035811Abstract: An electroless etching process. The process produces nanostructured semiconductors in which an oxidant (Ox1) is deposited as a metal on a semiconductor surface and used as a catalytic agent to facilitate reaction between a semiconductor and a second oxidant (Ox2). Ox2 is used to initiate etching by injecting holes into the semiconductor valence band as facilitated by the catalytic action of the deposited metal. The extent of reaction is controlled by the amount of Ox2 added; the reaction rate is controlled by the injection rate of Ox2. The process produces high specific surface area and/or hierarchically structured porous Si with higher and controllable yield. In addition, the ability is demonstrated to vary the pore size distribution of mesoporous silicon including producing hierarchically structured mesoporous silicon with more than one peak in the pore size distribution. In principle, the process applies to any semiconductor onto which metal can be deposited galvanically.Type: ApplicationFiled: July 31, 2020Publication date: February 4, 2021Applicant: West Chester UniversityInventors: Kurt W. Kolasinski, Bret Unger
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Patent number: 10590562Abstract: A regenerative electroless etching process produces nanostructured semiconductors in which an oxidant (Ox1) is used as a catalytic agent to facilitate reaction between a semiconductor and a second oxidant (Ox2) that would be unreactive (or slowly reactive compared to Ox1) in the primary reaction. Ox2 is used to regenerate Ox1, which can initiate etching by injecting holes into the semiconductor valence band. The extent of reaction is controlled by the amount of Ox2 added; the reaction rate, by the injection rate of Ox2. This general strategy is demonstrated specifically to produce highly luminescent nanocrystalline porous, amorphous pillared, and hierarchical porous silicon from the reaction of V2O5 in HF(aq) as Ox1 and H2O2(aq) as Ox2 with a silicon-comprising substrate. The process can be performed on silicon-comprising substrates of arbitrary size and shape including powders, reclaimed shards, wafers, pillared silicon, porous silicon, and silicon nanowires.Type: GrantFiled: October 29, 2018Date of Patent: March 17, 2020Assignee: West Chester UniversityInventors: Kurt W Kolasinski, Jarno Salonen, Ermei Makila
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Publication number: 20200048780Abstract: A device for generating hydrogen gas, treated water, and metal-containing nanoparticles. The device includes a vessel containing an electrolyte solution having a preferably iron anode and a preferably copper cathode. A renewable energy source is connected to the anode and the cathode. A valve for disbursing the hydrogen is connected to the hydrogen chamber.Type: ApplicationFiled: August 12, 2019Publication date: February 13, 2020Applicant: West Chester UniversityInventor: John M. Pisciotta
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Publication number: 20190169766Abstract: A regenerative electroless etching process produces nanostructured semiconductors in which an oxidant (Ox1) is used as a catalytic agent to facilitate reaction between a semiconductor and a second oxidant (Ox2) that would be unreactive (or slowly reactive compared to Ox1) in the primary reaction. Ox2 is used to regenerate Ox1, which can initiate etching by injecting holes into the semiconductor valence band. The extent of reaction is controlled by the amount of Ox2 added; the reaction rate, by the injection rate of Ox2. This general strategy is demonstrated specifically to produce highly luminescent nanocrystalline porous, amorphous pillared, and hierarchical porous silicon from the reaction of V2O5 in HF(aq) as Ox1 and H2O2(aq) as Ox2 with a silicon-comprising substrate. The process can be performed on silicon-comprising substrates of arbitrary size and shape including powders, reclaimed shards, wafers, pillared silicon, porous silicon, and silicon nanowires.Type: ApplicationFiled: October 29, 2018Publication date: June 6, 2019Applicant: West Chester UniversityInventors: Kurt W. Kolasinski, Jarno Salonen, Ermei Makila
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Publication number: 20130190321Abstract: Methods and kits for aiding in detection, assessment and treatment of a proliferative disorder of the prostate gland in a subject are provided according to aspects of the present invention which include assaying a first biological sample comprising prostate gland cells obtained from the subject for expression of one or more biomarkers selected from the group consisting of: alcohol dehydrogenase 1B, alcohol dehydrogenase 1C, alcohol dehydrogenase 4 and hepatocyte nuclear factor 1B; and determining, based on the expression of the one or more biomarkers in the sample that the subject has, or is at risk of having, a proliferative disorder of the prostate gland.Type: ApplicationFiled: January 23, 2013Publication date: July 25, 2013Applicant: WEST CHESTER UNIVERSITY OF PENNSYLVANIAInventor: West Chester University of Pennsylvania
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Patent number: 8436197Abstract: The present invention is related to palladium complexes having substituted diarylideneacetone ligands and coupling and polymerization processes thereof.Type: GrantFiled: October 27, 2008Date of Patent: May 7, 2013Assignee: West Chester University of Pennsylvania of the State System of Higher EducationInventor: Felix E Goodson, III