Patents Assigned to Western Digital (Fremont), LLP
  • Patent number: 7595967
    Abstract: A method and system for manufacturing a spacer layer in a magnetoresistive element are described. The spacer layer resides between a free layer and a pinned layer. The method and system include providing a first metallic layer and oxidizing the first metallic layer in a first environment including at least oxygen and a first gas inert with respect to the first metallic layer. The method and system further include providing a second metallic layer and oxidizing the second metallic layer in a second environment including at least oxygen and a first gas inert with respect to the first metallic layer.
    Type: Grant
    Filed: September 7, 2004
    Date of Patent: September 29, 2009
    Assignee: Western Digital (Fremont), LLP
    Inventors: Ki-Seok Moon, Chang-Man Park