Patents Assigned to White Engineering Corporation
  • Patent number: 5252365
    Abstract: A method for stabilizing and lubricating elastomeric material includes depositing a first material film layer of carbide forming material by high energy level vacuum plating onto the elastomeric material to thereby stabilize free carbon atoms present in the elastomeric material. A second material film layer is deposited by high energy vacuum plating onto the first material film layer to thereby lubricate the elastomeric material.
    Type: Grant
    Filed: January 28, 1992
    Date of Patent: October 12, 1993
    Assignee: White Engineering Corporation
    Inventor: Gerald W. White
  • Patent number: 4826365
    Abstract: A method for lubricating a material-working tool comprises depositing a material film by high energy level vacuum plating onto the tool for providing a thin mechanically insulating film having a low shear stress value. The material film has a hardness which is less than the hardness of the tool which it overlies.
    Type: Grant
    Filed: January 20, 1988
    Date of Patent: May 2, 1989
    Assignee: White Engineering Corporation
    Inventor: Gerald W. White
  • Patent number: 4468309
    Abstract: A method for resisting galling of two coacting threaded members (10, 16) is provided. The method includes depositing a material film (36) by high energy level ion plating onto the machined surfaces (12, 14) of at least one of the threaded members (10, 16) for providing a thin mechanically insulating film (36) on the threaded member (10, 16) having a low shear stress value.
    Type: Grant
    Filed: April 22, 1983
    Date of Patent: August 28, 1984
    Assignee: White Engineering Corporation
    Inventor: Gerald W. White
  • Patent number: 4420386
    Abstract: A method for ion plating a substrate (b 40) within a chamber (52) with a plating material (20) is provided. The method includes evacuating the chamber (52) and vaporizing the plating material (20) within the evacuated chamber (52). An electron saturated magnetic field (30) is placed adjacent the substrate (40) for positive ionization of the evaporant atoms of the vaporized plating material (20). A negative bias (61, 62) is applied to the substrate (40) for attracting positive ions of the vaporized plating material (20).
    Type: Grant
    Filed: April 22, 1983
    Date of Patent: December 13, 1983
    Assignee: White Engineering Corporation
    Inventor: Gerald W. White