Patents Assigned to Xradia, Inc.
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Publication number: 20070002215Abstract: A phase contrast x-ray microscope has a phase plate that is placed in proximity of and attached rigidly to the objective to form a composite optic. This enables easier initial and long-term maintenance of alignment of the microscope. In one example, they are fabricated on the same high-transmissive substrate. The use of this composite optic allows for lithographic-based alignment that will not change over the lifetime of the instrument. Also, in one configuration, the phase plate is located between the test object and the objective.Type: ApplicationFiled: August 31, 2006Publication date: January 4, 2007Applicant: XRADIA, INC.Inventors: Wenbing Yun, Yuxin Wang
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Patent number: 7130375Abstract: A projection-based x-ray imaging system combines projection magnification and optical magnification in order to ease constraints on source spot size, while improving imaging system footprint and efficiency. The system enables tomographic imaging of the sample especially in a proximity mode where the same is held in close proximity to the scintillator. In this case, a sample holder is provided that can rotate the sample. Further, a z-axis motion stage is also provided that is used to control distance between the sample and the scintillator.Type: GrantFiled: January 14, 2005Date of Patent: October 31, 2006Assignee: Xradia, Inc.Inventors: Wenbing Yun, David Dean Scott, David R. Trapp, Frederick William Duewer, Yuxin Wang
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Patent number: 7119953Abstract: A phase contrast x-ray microscope has a phase plate that is placed in proximity of and attached rigidly to the objective to form a composite optic. This enables easier initial and long-term maintenance of alignment of the microscope. In one example, they are fabricated on the same high-transmissive substrate. The use of this composite optic allows for lithographic-based alignment that will not change over the lifetime of the instrument. Also, in one configuration, the phase plate is located between the test object and the objective.Type: GrantFiled: December 27, 2002Date of Patent: October 10, 2006Assignee: Xradia, Inc.Inventors: Wenbing Yun, Yuxin Wang
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Publication number: 20060192129Abstract: A scintillated CCD detector system for imaging x rays uses x-rays having a photon energy in the range of 1 to 20 keV. The detector differs from existing systems in that it provides extremely high resolution of better than a micrometer, and high detection quantum efficiency of up to 95%. The design of this detector also allows it to function as an energy filter to remove high-energy x-rays. This detector is useful in a wide range of applications including x-ray imaging, spectroscopy, and diffraction. The scintillator optical system has scintillator material with a lens system for collecting the light that is generated in the scintillator material. A substrate is used for spacing the scintillator material from the lens system.Type: ApplicationFiled: April 6, 2006Publication date: August 31, 2006Applicant: Xradia, Inc.Inventors: Wenbing Yun, Yuxin Wang, David Trapp
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Patent number: 7095822Abstract: This invention pertains to an x-ray microprobe that can be placed very close the sample surface. A practical implementation is an x-ray target material integrated to an atomic force microscope (AFM) tip and an electron beam is focused to the target materials to generate x-ray emission. This microprobe can be combined with energy-resolved detector or a fluorescence imaging system for material analysis applications.Type: GrantFiled: July 28, 2005Date of Patent: August 22, 2006Assignee: Xradia, Inc.Inventor: Wenbing Yun
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Publication number: 20060163501Abstract: A scintillated CCD detector system for imaging x rays uses x-rays having a photon energy in the range of 1 to 20 keV. The detector differs from existing systems in that it provides extremely high resolution of better than a micrometer, and high detection quantum efficiency of up to 95%. The design of this detector also allows it to function as an energy filter to remove high-energy x-rays. This detector is useful in a wide range of applications including x-ray imaging, spectroscopy, and diffraction. The scintillator optical system has scintillator material with a lens system for collecting the light that is generated in the scintillator material. A substrate is used for spacing the scintillator material from the lens system.Type: ApplicationFiled: April 6, 2006Publication date: July 27, 2006Applicant: Xradia, Inc.Inventors: Wenbing Yun, Yuxin Wang, David Trapp
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Patent number: 7057187Abstract: A scintillated CCD detector system for imaging x rays uses x-rays having a photon energy in the range of 1 to 20 keV. The detector differs from existing systems in that it provides extremely high resolution of better than a micrometer, and high detection quantum efficiency of up to 95%. The design of this detector also allows it to function as an energy filter to remove high-energy x-rays. This detector is useful in a wide range of applications including x-ray imaging, spectroscopy, and diffraction. The scintillator optical system has scintillator material with a lens system for collecting the light that is generated in the scintillator material. A substrate is used for spacing the scintillator material from the lens system.Type: GrantFiled: November 7, 2003Date of Patent: June 6, 2006Assignee: Xradia, Inc.Inventors: Wenbing Yun, Yuxin Wang, David R. Trapp
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Publication number: 20050282300Abstract: Systems and methods for performing inspection and metrology operations on metallization processes such as on back-end-of-line (BEOL) metallization thickness and step coverage are disclosed. Specific examples include measurements of thickness and uniformity of barrier layers, including tantalum for example, and seed layers, including copper for example, in Damascene, including dual-Damascene, trenches during the interconnect fabrication steps of integrated circuit production. The invention also relates to the detection and measurement of void formation during and after copper electroplating. The invention utilizes x-ray fluorescence to measure the absolute thicknesses and the thickness uniformity of the barrier layers in the trenches, the copper seed layers for electroplating, and the final copper interconnects.Type: ApplicationFiled: July 8, 2005Publication date: December 22, 2005Applicant: Xradia, Inc.Inventors: Wenbing Yun, Yuxin Wang, Michael Feser, Kenneth Nill
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Publication number: 20050226376Abstract: A digital dual-band detector functions as an imaging platform capable of extracting hard and soft tissue images, for example. The detector has a first detector system comprising a first scintillator for converting x-rays from a sample to an first optical signal, and a first detector for detecting the first optical signal in combination with a second detector system comprising a second scintillator for converting x-rays from the sample and passing through the first scintillator to a second optical signal, and a second detector for detecting the second optical signal. The detector can facilitate the implementation and deployment of recent developments and can permit low cost practical deployment in clinical applications as well as biomedical research applications where significant improvement in spatial resolution and image contrast is required.Type: ApplicationFiled: November 16, 2004Publication date: October 13, 2005Applicant: Xradia, Inc.Inventors: Wenbing Yun, Yuxin Wang, David Scott
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Patent number: 6917472Abstract: An achromatic Fresnel optic that combines a Fresnel zone plate and a refractive Fresnel lens. The zone plate provides high resolution for imaging and focusing, while the refractive lens takes advantage of the refraction index change properties of appropriate elements near absorption edges to recombine the electromagnetic radiation of different energies dispersed by the zone plate. This compound lens effectively solves the high chromatic aberration problem of zone plates. The AFO has a wide range of potential applications in lithography, microimaging with various contrast mechanisms and measurement techniques.Type: GrantFiled: April 25, 2002Date of Patent: July 12, 2005Assignee: Xradia, Inc.Inventors: Wenbing Yun, Yuxin Wang
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Patent number: 6914723Abstract: A mask blank inspection tool includes an AFO having a diffractive lens and a refractive lens formed on a common substrate. The diffractive lens is a Fresnel zone plate and the refractive lens is a refractive Fresnel lens. The AFO is used to image light from a defect particle on a multilayer mask blank or the surface of the multilayer mask blank to a detector.Type: GrantFiled: April 29, 2003Date of Patent: July 5, 2005Assignee: Xradia, Inc.Inventors: Wenbing Yun, Yuxin Wang
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Publication number: 20050109936Abstract: An element-specific imaging technique utilizes the element-specific fluorescence X-rays that are induced by primary ionizing radiation. The fluorescence X-rays from an element of interest are then preferentially imaged onto a detector using an optical train. The preferential imaging of the optical train is achieved using a chromatic lens in a suitably configured imaging system. A zone plate is an example of such a chromatic lens; its focal length is inversely proportional to the X-ray wavelength. Enhancement of preferential imaging of a given element in the test sample can be obtained if the zone plate lens itself is made of a compound containing substantially the same element. For example, when imaging copper using the Cu La spectral line, a copper zone plate lens is used.Type: ApplicationFiled: November 23, 2004Publication date: May 26, 2005Applicant: Xradia, Inc.Inventors: Wenbing Yun, Kenneth Nill
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Patent number: 6885503Abstract: A lithography apparatus having achromatic Fresnel objective (AFO) that combines a Fresnel zone plate and a refractive Fresnel lens. The zone plate provides high resolution for imaging and focusing, while the refractive lens takes advantage of the refraction index change properties of appropriate elements near absorption edges to recombine the electromagnetic radiation of different energies dispersed by the zone plate. This compound lens effectively solves the high chromatic aberration problem of zone plates. The lithography apparatus allows the use of short wavelength radiation in the 1-15 nm spectral range to print high resolution features as small as 20 nm.Type: GrantFiled: November 5, 2002Date of Patent: April 26, 2005Assignee: Xradia, Inc.Inventors: Wenbing Yun, Yuxin Wang, Kenneth W. Nill
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Publication number: 20040165165Abstract: An extreme ultraviolet (EUV) AIM tool for both the EUV actinic lithography and high-resolution imaging or inspection is described. This tool can be extended to lithography nodes beyond the 32 nanometer (nm) node covering other short wavelength radiation such as soft X-rays. The metrology tool is preferably based on an imaging optic referred to as an Achromatic Fresnel Optic (AFO). The AFO is a transmissive optic that includes a diffractive Fresnel zone plate lens component and a dispersion-correcting refractive lens component. It retains all of the imaging properties of a Fresnel zone plate lens, including a demonstrated resolution capability of better than 25 nanometers and freedom from image distortion. It overcomes the chromatic aberration of the Fresnel zone plate lens and has a larger usable spectral bandwidth.Type: ApplicationFiled: October 10, 2003Publication date: August 26, 2004Applicant: Xradia, Inc.Inventors: Wenbing Yun, Yuxin Wang
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Publication number: 20040130785Abstract: Methods for fabricating refractive element(s) and aligning the elements in a compound optic, typically to a zone plate element are disclosed. The techniques are used for fabricating micro refractive, such as Fresnel, optics and compound optics comprising two or more optical elements for short wavelength radiation. One application is the fabrication of the Achromatic Fresnel Optic (AFO). Techniques for fabricating the refractive element generally include: 1) ultra-high precision mechanical machining, e.g,. diamond turning; 2) lithographic techniques including. gray-scale lithography and multi-step lithographic processes; 3) high-energy beam machining, such as electron-beam, focused ion beam, laser, and plasma-beam machining; and 4) photo-induced chemical etching techniques. Also addressed are methods of aligning the two optical elements during fabrication and methods of maintaining the alignment during subsequent operation.Type: ApplicationFiled: October 17, 2003Publication date: July 8, 2004Applicant: Xradia, Inc.Inventors: Wenbing Yun, Yuxin Wang, Michael Feser, Alan Lyon
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Publication number: 20040125442Abstract: A phase contrast x-ray microscope has a phase plate that is placed in proximity of and attached rigidly to the objective to form a composite optic. This enables easier initial and long-term maintenance of alignment of the microscope. In one example, they are fabricated on the same high-transmissive substrate. The use of this composite optic allows for lithographic-based alignment that will not change over the lifetime of the instrument. Also, in one configuration, the phase plate is located between the test object and the objective.Type: ApplicationFiled: December 27, 2002Publication date: July 1, 2004Applicant: Xradia, Inc.Inventors: Wenbing Yun, Yuxin Wang
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Publication number: 20040085641Abstract: A lithography apparatus having achromatic Fresnel objective (AFO) that combines a Fresnel zone plate and a refractive Fresnel lens. The zone plate provides high resolution for imaging and focusing, while the refractive lens takes advantage of the refraction index change properties of appropriate elements near absorption edges to recombine the electromagnetic radiation of different energies dispersed by the zone plate. This compound lens effectively solves the high chromatic aberration problem of zone plates. The lithography apparatus allows the use of short wavelength radiation in the 1-15 nm spectral range to print high resolution features as small as 20 nm.Type: ApplicationFiled: November 5, 2002Publication date: May 6, 2004Applicant: XRADIA, INC.Inventors: Wenbing Yun, Yuxin Wang, Kenneth W. Nill
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Publication number: 20040057107Abstract: A mask blank inspection tool includes an AFO having a diffractive lens and a refractive lens formed on a common substrate. The diffractive lens is a Fresnel zone plate and the refractive lens is a refractive Fresnel lens. The AFO is used to image light from a defect particle on a multilayer mask blank or the surface of the multilayer mask blank to a detector.Type: ApplicationFiled: April 29, 2003Publication date: March 25, 2004Applicant: XRADIA, INC.Inventors: Wenbing Yun, Yuxin Wang
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Publication number: 20030223536Abstract: An element-specific imaging technique utilizes the element-specific fluorescence X-rays that are induced by primary ionizing radiation. The fluorescence X-rays from an element of interest are then preferentially imaged onto a detector using an optical train. The preferential imaging of the optical train is achieved using a chromatic lens in a suitably configured imaging system. A zone plate is an example of such a chromatic lens; its focal length is inversely proportional to the X-ray wavelength. Enhancement of preferential imaging of a given element in the test sample can be obtained if the zone plate lens itself is made of a compound containing substantially the same element. For example, when imaging copper using the Cu La spectral line, a copper zone plate lens is used.Type: ApplicationFiled: May 29, 2002Publication date: December 4, 2003Applicant: Xradia, Inc.Inventors: Wenbing Yun, Kenneth W. Nill