Abstract: An apparatus for aligning an edge, such as a leading edge of a plate, in particular a printing plate or a printing plate precursor. The apparatus includes a support configured for supporting the plate on a support surface, and to be located upstream of a treatment station. At least two movable elements are arranged to be moved by an edge, such as a leading edge, of the plate. The at least two movable elements include a first and a second movable element; a detection means configured to detect a first and second measure representative for a first and second position of the first and second movable element, respectively, at least one controllable component configured to perform an action on the plate, and a control means configured to control the at least one controllable component based on the first and second measure.

Abstract: An apparatus for exposure of a relief precursor having a first side and an opposite second side includes a light source to expose the relief precursor during relative movement between the light source and the relief plate precursor; a moving means to cause a first relative movement between the light source and the relief precursor to expose the first side of the relief precursor, to cause a second relative movement between the light source and the relief precursor to expose the second side of the relief precursor, and to move the light source between a first position and a second position. The first and second positions are on opposite sides of a plane of the relief precursor. At least one of the first and the second relative movement is a reciprocating movement.

Abstract: An apparatus for exposure of a relief precursor includes a substrate layer and at least one photosensitive layer. The apparatus includes a first light source configured to illuminate a first side of the relief precursor, a movable second light source configured to illuminate a second side of the relief precursor opposite the first side, a movable shield located between the first light source and the second light source and configured to capture at least a portion of the light of the second light source transmitted through the relief precursor, and a moving means configured to move the movable shield simultaneously with the second light source.

Abstract: A method for imaging a mask layer includes reading imaging data for a sequence of at least (C1+C2) pixels, at a first moment, using a group of C1 first imaging beams for imaging substantially simultaneously a first group of C1 pixels of said sequence in accordance with the imaging data, at a second moment, using a group of C2 second imaging beams for imaging substantially simultaneously a second group of C2 pixels of said sequence in accordance with the imaging data, repeating the reading of imaging data, the using of a group of C1 first imaging beams for imaging at a first moment, and the using of a group of C2 second imaging beams for imaging at a second moment for a next sequence of at least (C1+C2) pixels.

Abstract: Apparatus for exposure of a relief precursor includes a substrate layer and at least one photosensitive layer. The apparatus includes a first light source configured to illuminate a first side of the relief precursor, a movable second light source configured to illuminate a second side of the relief precursor opposite the first side, a movable shield located between the first light source and the second light source and configured to capture at least a portion of the light of the second light source transmitted through the relief precursor, and a moving means configured to move the movable shield simultaneously with the second light source.

Abstract: An apparatus for treating a relief precursor with a liquid includes a housing, a conveying mechanism for transporting the relief precursor along a support plane in a transport direction through the housing, and a treatment section for treating the relief precursor with a liquid. The treatment section includes a plurality of brushes arranged in the housing for treating the relief precursor, the plurality of brushes including at least a first brush and a second brush downstream of the first brush and having a rotating axis with bristles. A squeeze element squeezes the bristles of the second brush and extends over a radial distance into the bristles of the second brush. The radial distance is at least 15% of the length of the bristles.

Abstract: An exposure unit for exposing a relief plate precursor includes a support structure with a support surface configured for supporting a relief plate precursor, and a plurality of UV light sources arranged next to each other and configured to emit UV light to a side of the relief plate precursor. The plurality of UV light sources cover a light source area parallel to the support surface. A light adjustment structure is configured to block and/or reflect a portion of the light emitted by the plurality of UV light sources so as to render a light intensity measured in the support surface more uniform as compared to a situation without the light adjustment structure. The light adjustment structure is arranged at least partially between the light source area and the support surface.

Abstract: A method of preparing image job data for imaging a mask layer includes receiving at least one raster image file, preparing image job data for imaging the mask layer, the preparing comprising: including data relative to the at least one raster image file in the image job data so as to image at least one corresponding image area of the mask layer; determining a non-functional area of the mask layer outside of the at least one corresponding image area; and including filling imaging data in said image job data for imaging said non-functional area.

Abstract: A system for moving a flexible plate, in particular a printing plate or a printing plate precursor, over a support surface in the direction of a treatment station, comprising a support for supporting the plate on a support surface thereof; an articulated operating arm extending substantially parallel to the support surface and comprising a first segment and a second segment; said first segment having a first end which is rotatably connected to said second segment around a first rotation axis substantially perpendicular to the support surface, and a second end provided with a plate engagement means to contact the plate; said second segment being rotatable around a second rotation axis substantially perpendicular to the support surface; a control means to control the rotation of the first and second segment, such that the plate is slid over the support in the direction of the treatment station.

Abstract: An apparatus for aligning an edge, such as a leading edge of a plate, in particular a printing plate or a printing plate precursor. The apparatus includes a support configured for supporting the plate on a support surface, and to be located upstream of a treatment station. At least two movable elements are arranged to be moved by an edge, such as a leading edge, of the plate. The at least two movable elements include a first and a second movable element; a detection means configured to detect a first and second measure representative for a first and second position of the first and second movable element, respectively, at least one controllable component configured to perform an action on the plate, and a control means configured to control the at least one controllable component based on the first and second measure.

Abstract: A system for moving a flexible plate, in particular a printing plate or a printing plate precursor, over a support surface in the direction of a treatment station, such as a washer station. The system includes a support configured for supporting the plate on a support surface thereof, and intended to be located upstream of the treatment station. A movement means includes a plate engagement means configured to contact the plate in such a way that the plate is engaged by adhesion or by friction or a combination thereof, in a movement mode, and that the plate can be slid over the support surface by controlling the movement means in the movement mode. A control means is configured to control the movement means such that the plate is slid over the support in the direction of the treatment station.

Abstract: A method to determine an exposure time and/or intensity to be used for obtaining a desired feature of a relief structure, in particular a desired floor thickness, includes exposing a first side of a relief precursor with electromagnetic radiation, where the exposure is done in an area having a first position A and a second position B and is performed such that for a plurality of points between said first and second positions A, B the values for the exposure time and the exposure intensity are known, wherein the exposure time and/or the exposure intensity are automatically controlled to be varied at said plurality of points; determining one or more points of said plurality of points representative for the desired feature; and determining the required exposure time and/or exposure intensity for the desired feature based on the determined one or more points and the known values.

Abstract: An apparatus for exposure of a relief precursor having a first side and an opposite second side includes a light source to expose the relief precursor during relative movement between the light source and the relief plate precursor; a moving means to cause a first relative movement between the light source and the relief precursor to expose the first side of the relief precursor, to cause a second relative movement between the light source and the relief precursor to expose the second side of the relief precursor, and to move the light source between a first position and a second position. The first and second positions are on opposite sides of a plane of the relief precursor. At least one of the first and the second relative movement is a reciprocating movement.

Abstract: Apparatus for exposure of a relief precursor includes a substrate layer and at least one photosensitive layer. The apparatus includes a first light source configured to illuminate a first side of the relief precursor, a movable second light source configured to illuminate a second side of the relief precursor opposite the first side, a movable shield located between the first light source and the second light source and configured to capture at least a portion of the light of the second light source transmitted through the relief precursor, and a moving means configured to move the movable shield simultaneously with the second light source.