Abstract: A method of preparing image job data for imaging a mask layer includes receiving at least one raster image file, preparing image job data for imaging the mask layer, the preparing comprising: including data relative to the at least one raster image file in the image job data so as to image at least one corresponding image area of the mask layer, determining a non-functional area of the mask layer outside of the at least one corresponding image area; and including filling imaging data in said image job data for imaging said non-functional area.

Abstract: A method to determine an exposure time and/or intensity to be used for obtaining a desired feature of a relief structure, in particular a desired floor thickness, includes exposing a first side of a relief precursor with electromagnetic radiation, where the exposure is done in an area having a first position A and a second position B and is performed such that for a plurality of points between said first and second positions A, B the values for the exposure time and the exposure intensity are known, wherein the exposure time and/or the exposure intensity are automatically controlled to be varied at said plurality of points; determining one or more points of said plurality of points representative for the desired feature; and determining the required exposure time and/or exposure intensity for the desired feature based on the determined one or more points and the known values.

Abstract: An apparatus for treating a relief precursor with a liquid includes a housing, a conveying mechanism for transporting the relief precursor along a support plane in a transport direction through the housing, and a treatment section for treating the relief precursor with a liquid. The treatment section includes a plurality of brushes arranged in the housing for treating the relief precursor, the plurality of brushes including at least a first brush and a second brush downstream of the first brush and having a rotating axis with bristles. A squeeze element squeezes the bristles of the second brush and extends over a radial distance into the bristles of the second brush. The radial distance is at least 15% of the length of the bristles.

Abstract: A method of preparing image job data for imaging a mask layer includes receiving at least one raster image file, preparing image job data for imaging the mask layer, the preparing comprising: including data relative to the at least one raster image file in the image job data so as to image at least one corresponding image area of the mask layer; determining a non-functional area of the mask layer outside of the at least one corresponding image area; and including filling imaging data in said image job data for imaging said non-functional area.

Abstract: A method of controlling a relief plate production system comprising a plurality of production units, the method comprising the steps of: each of the plurality of production units receiving a job instruction from a central control means and storing said job instruction in a list of job instructions, said job instruction including at least an identifier of a relief plate to be produced from a relief precursor; after the plurality of production units have received the job instruction, one production unit of the plurality of production units receiving a relief precursor and an indication of the identifier of this relief precursor and treating the relief precursor in accordance with the received job instruction.

Abstract: A system for moving a flexible plate, in particular a printing plate or a printing plate precursor, over a support surface in the direction of a treatment station, such as a washer station. The system includes a support configured for supporting the plate on a support surface thereof, and intended to be located upstream of the treatment station. A movement means includes a plate engagement means configured to contact the plate in such a way that the plate is engaged by adhesion or by friction or a combination thereof, in a movement mode, and that the plate can be slid over the support surface by controlling the movement means in the movement mode. A control means is configured to control the movement means such that the plate is slid over the support in the direction of the treatment station.

Abstract: A method of determining at least one layout for imaging at least one relief precursor, comprising: receiving image job data for at least one image job comprising at least two raster image files having at least two different resolutions and/or at least two different quality settings requiring different imaging modes; and determining, using processing means, at least one layout including the image job data for imaging at least one mask layer of the at least one relief precursor, taking into account a total amount of imaging time required to image the at least one mask layer.

Abstract: A system for moving a flexible plate, in particular a printing plate or a printing plate precursor, over a support surface in the direction of a treatment station includes a support for supporting the plate on a support surface thereof. An articulated operating arm extends substantially parallel to the support surface and comprising a first segment and a second segment. The first segment has a first end which is rotatably connected to said second segment around a first rotation axis substantially perpendicular to the support surface, and a second end provided with a plate engagement means to contact the plate. The second segment is rotatable around a second rotation axis substantially perpendicular to the support surface. A control means controls the rotation of the first and second segments such that the plate is slid over the support in the direction of the treatment station.

Abstract: A method for imaging a mask layer includes reading imaging data for a sequence of at least (C1+C2) pixels, at a first moment, using a group of C1 first imaging beams for imaging substantially simultaneously a first group of C1 pixels of said sequence in accordance with the imaging data, at a second moment, using a group of C2 second imaging beams for imaging substantially simultaneously a second group of C2 pixels of said sequence in accordance with the imaging data, repeating the reading of imaging data, the using of a group of C1 first imaging beams for imaging at a first moment, and the using of a group of C2 second imaging beams for imaging at a second moment for a next sequence of at least (C1+C2) pixels.

Abstract: A method for imaging a mask layer includes providing a mask layer, receiving an image file and detecting at least one solid area and at least one halftone area in the image file, imaging an area of the mask layer corresponding to the at least one solid area, using a first imaging setting, wherein prior to or during the imaging a sampling pattern is superimposed on pixels of the at least one solid area, so that only a portion of the pixels of the at least one solid area is imaged, and imaging an area of the mask layer corresponding to said at least one halftone area, using a second imaging setting which is different from the first imaging setting.

Abstract: An apparatus for aligning an edge, such as a leading edge of a plate, in particular a printing plate or a printing plate precursor. The apparatus includes a support configured for supporting the plate on a support surface, and to be located upstream of a treatment station. At least two movable elements are arranged to be moved by an edge, such as a leading edge, of the plate. The at least two movable elements include a first and a second movable element; a detection means configured to detect a first and second measure representative for a first and second position of the first and second movable element, respectively, at least one controllable component configured to perform an action on the plate, and a control means configured to control the at least one controllable component based on the first and second measure.

Abstract: An apparatus for exposure of a relief precursor having a first side and an opposite second side includes a light source to expose the relief precursor during relative movement between the light source and the relief plate precursor; a moving means to cause a first relative movement between the light source and the relief precursor to expose the first side of the relief precursor, to cause a second relative movement between the light source and the relief precursor to expose the second side of the relief precursor, and to move the light source between a first position and a second position. The first and second positions are on opposite sides of a plane of the relief precursor. At least one of the first and the second relative movement is a reciprocating movement.

Abstract: An apparatus for exposure of a relief precursor includes a substrate layer and at least one photosensitive layer. The apparatus includes a first light source configured to illuminate a first side of the relief precursor, a movable second light source configured to illuminate a second side of the relief precursor opposite the first side, a movable shield located between the first light source and the second light source and configured to capture at least a portion of the light of the second light source transmitted through the relief precursor, and a moving means configured to move the movable shield simultaneously with the second light source.

Abstract: A method for imaging a mask layer includes reading imaging data for a sequence of at least (C1+C2) pixels, at a first moment, using a group of C1 first imaging beams for imaging substantially simultaneously a first group of C1 pixels of said sequence in accordance with the imaging data, at a second moment, using a group of C2 second imaging beams for imaging substantially simultaneously a second group of C2 pixels of said sequence in accordance with the imaging data, repeating the reading of imaging data, the using of a group of C1 first imaging beams for imaging at a first moment, and the using of a group of C2 second imaging beams for imaging at a second moment for a next sequence of at least (C1+C2) pixels.

Abstract: Apparatus for exposure of a relief precursor includes a substrate layer and at least one photosensitive layer. The apparatus includes a first light source configured to illuminate a first side of the relief precursor, a movable second light source configured to illuminate a second side of the relief precursor opposite the first side, a movable shield located between the first light source and the second light source and configured to capture at least a portion of the light of the second light source transmitted through the relief precursor, and a moving means configured to move the movable shield simultaneously with the second light source.

Abstract: An apparatus for treating a relief precursor with a liquid includes a housing, a conveying mechanism for transporting the relief precursor along a support plane in a transport direction through the housing, and a treatment section for treating the relief precursor with a liquid. The treatment section includes a plurality of brushes arranged in the housing for treating the relief precursor, the plurality of brushes including at least a first brush and a second brush downstream of the first brush and having a rotating axis with bristles. A squeeze element squeezes the bristles of the second brush and extends over a radial distance into the bristles of the second brush. The radial distance is at least 15% of the length of the bristles.

Abstract: An exposure unit for exposing a relief plate precursor includes a support structure with a support surface configured for supporting a relief plate precursor, and a plurality of UV light sources arranged next to each other and configured to emit UV light to a side of the relief plate precursor. The plurality of UV light sources cover a light source area parallel to the support surface. A light adjustment structure is configured to block and/or reflect a portion of the light emitted by the plurality of UV light sources so as to render a light intensity measured in the support surface more uniform as compared to a situation without the light adjustment structure. The light adjustment structure is arranged at least partially between the light source area and the support surface.

Abstract: A method of preparing image job data for imaging a mask layer includes receiving at least one raster image file, preparing image job data for imaging the mask layer, the preparing comprising: including data relative to the at least one raster image file in the image job data so as to image at least one corresponding image area of the mask layer; determining a non-functional area of the mask layer outside of the at least one corresponding image area; and including filling imaging data in said image job data for imaging said non-functional area.

Abstract: A system for moving a flexible plate, in particular a printing plate or a printing plate precursor, over a support surface in the direction of a treatment station, comprising a support for supporting the plate on a support surface thereof; an articulated operating arm extending substantially parallel to the support surface and comprising a first segment and a second segment; said first segment having a first end which is rotatably connected to said second segment around a first rotation axis substantially perpendicular to the support surface, and a second end provided with a plate engagement means to contact the plate; said second segment being rotatable around a second rotation axis substantially perpendicular to the support surface; a control means to control the rotation of the first and second segment, such that the plate is slid over the support in the direction of the treatment station.

Abstract: An apparatus for aligning an edge, such as a leading edge of a plate, in particular a printing plate or a printing plate precursor. The apparatus includes a support configured for supporting the plate on a support surface, and to be located upstream of a treatment station. At least two movable elements are arranged to be moved by an edge, such as a leading edge, of the plate. The at least two movable elements include a first and a second movable element; a detection means configured to detect a first and second measure representative for a first and second position of the first and second movable element, respectively, at least one controllable component configured to perform an action on the plate, and a control means configured to control the at least one controllable component based on the first and second measure.