Patents Assigned to XTPL S.A.
  • Publication number: 20210381943
    Abstract: A method of obtaining a numerical model is disclosed. The numerical model correlates estimated line width values to minimum pressure for gas bubble generation (MPGBG) values. An MPGBG value of each capillary tube in the reference group is measured for a liquid. A nanoparticle composition is deposited, under standard conditions, on substrate(s) from each respective reference capillary tube, to form nanoparticle lines. A line width of each of the nanoparticle lines deposited using each respective reference capillary tube is measured by a microscope apparatus. A numerical model that correlates estimated line width values to MPGBG values for the liquid is calculated.
    Type: Application
    Filed: June 2, 2021
    Publication date: December 9, 2021
    Applicant: XTPL S.A.
    Inventors: Szymon Zieba, Maciej Tybel, Piotr Kowalczewski, Filip Granek
  • Publication number: 20210354361
    Abstract: A metallic nanoparticle composition dispenser includes a piston-cylinder assembly and a capillary tube. The piston-cylinder assembly includes a cylinder, a pneumatic port at first end of the cylinder, an outlet port at a second end of the cylinder opposite the first end, and a piston movable in the cylinder between the first end and the second end. The capillary tube has a tube inlet and a tube outlet, with the tube inlet being coupled to the outlet port of the cylinder. A metallic nanoparticle composition is contained in the cylinder. The metallic nanoparticle composition dispenser is configured such that the metallic nanoparticle composition is extruded by the piston through the capillary tube under pneumatic actuation by a regulated pneumatic system coupled to the pneumatic port.
    Type: Application
    Filed: May 7, 2021
    Publication date: November 18, 2021
    Applicant: XTPL S.A.
    Inventors: Krzysztof Kaczmarz, Maciej Tybel, Lukasz Witczak, Karolina Fiaczyk, Filip Granek
  • Publication number: 20210285091
    Abstract: A method of decreasing a sheet resistance of a transparent conductor is disclosed. The method includes the following: forming a first transparent conductor layer on a substrate; dispensing a metallic nanoparticle composition on the first transparent conductor layer to form metallic nanoparticle features; and sintering at least the first transparent conductor layer and the metallic nanoparticle features. The first transparent conductor layer includes a crystalline metal oxide. The aperture ratio of the transparent conductor is in a range of 90% to 99%. A multilayer transparent conductor and a method of forming a multilayer transparent conductor are also disclosed.
    Type: Application
    Filed: March 15, 2021
    Publication date: September 16, 2021
    Applicant: XTPL S.A.
    Inventors: Anna Stanczak, Jolanta Gadzalinska, Mateusz Lysien, Aneta Wiatrowska, Filip Granek
  • Patent number: 10731268
    Abstract: A method is provided for forming structures upon a substrate. The method comprises: depositing fluid onto a substrate so as to define a wetted region, the fluid containing electrically polahzable nanoparticles; applying an alternating electric field to the fluid on the region, using a first electrode and a second electrode, so that a plurality of the nanoparticles are assembled to form an elongate structure extending from the first electrode towards the second electrode; and removing the fluid such that the elongate structure remains upon the substrate.
    Type: Grant
    Filed: March 21, 2017
    Date of Patent: August 4, 2020
    Assignee: XTPL S.A.
    Inventors: Filip Granek, Zbigniew Rozynek