Abstract: A semiconductor device includes a first substrate, a second substrate, a first connection structure, and a second connection structure. A transistor is formed in a first side of the first substrate. A doped region is formed in a first side of the second substrate. The first connection structure is formed over a second side of the second substrate, and coupled to the doped region through a first VIA that extends from the second side of the second substrate to the doped region. The second connection structure is formed over the first side of the first substrate, connected with the first connection structure via a through silicon VIA, and coupled to the transistor through a bonding VIA. The first substrate is bonded to the second substrate by the bonding VIA, with the first side of the first substrate and the first side of the second substrate being facing each other.

Abstract: A method for conducting a read-verification operation on a target memory cell in a three-dimensional (3D) memory device includes removing fast charges of the target memory cell at a read-prepare step and measuring a threshold voltage of the target memory cell at a sensing step. Removing the fast charges of the target memory cell includes applying a prepare voltage (Vprepare) on an unselected top select gate (Unsel_TSG) of an unselected memory string, applying a first off voltage (Voff) on a selected word line (Sel_WL) associated with the target memory cell, and applying a pass voltage (Vpass) on an unselected word line (Unsel_WL).

Abstract: The present disclosure provides a method for forming a three-dimensional memory device. The method includes disposing an alternating dielectric stack on a substrate in a first direction perpendicular to the substrate; and forming a staircase structure and a dividing wall in the alternating dielectric stack. The staircase structure and the dividing wall extend in a second direction parallel to the substrate, and the dividing wall is adjacent to the staircase structure. The method also includes forming, sequentially on the staircase structure, a first barrier layer and a second barrier layer different from the first barrier layer. The method further includes forming a gate line slit (GLS) opening in the dividing wall. The GLS opening penetrates through the alternating dielectric stack in the first direction and is distant from the second barrier layer in a third direction that is parallel to the substrate and is perpendicular to the second direction.

Abstract: The present disclosure is directed to a memory structure including a staircase structure. The staircase structure can include a bottom select gate, a plate line formed above the bottom select gate, and a word line formed above the plate line. The pillar can extend through the bottom select gate, the plate line, and the word line. The memory structure can also include a source structure formed under the pillar and a drain cap formed above the pillar. The memory structure can further include a bit line formed above the drain cap.

Abstract: A memory device includes a memory string and a control circuit coupled to the memory string. The memory string includes a top select gate, word lines, a bottom select gate, and a P-well. The control circuit is configured to, in an erasing operation, apply an erasing voltage to the P-well, apply a verifying voltage to a selected word line of the word lines after applying the erasing voltage to the P-well, and apply a first turn-on voltage to the bottom select gate, starting after applying the erasing voltage to the P-well and before applying the verifying voltage to the selected word line.

Abstract: A memory system includes a memory cell array and a controller coupled to the memory cell array. The controller is configured to control applying a first program voltage to a word line to program memory cells in the memory cell array, the memory cells being coupled to the word line, and in response to receiving a suspend command, control applying a positive bias discharge voltage to the word line when the first program voltage ramps down.

Abstract: A memory device includes bit lines, and a cell array including strings, each of which includes memory cells, a select cell coupled to a respective one of the bit lines, and a dummy cell between the select cell and the memory cells. The memory device also includes a select line coupled to the select cells, a dummy word line coupled to the dummy cells, word lines each coupled to a respective row of the memory cells, and a controller coupled to the cell array. The controller is configured to drive a voltage on the dummy word line from a first level to a second level lower than the first level. The controller is also configured to drive a voltage on the select line from the first level to the second level, such that the voltage on the select line reaches the second level after the voltage on the dummy word line reaches the second level.

Abstract: In certain aspects, a method for training a model is disclosed. A model for measuring a geometric attribute of a hole structure in a semiconductor chip is provided by at least one processor. A plurality of training samples each including a pair of an optical spectrum signal and a reference signal corresponding to a same hole structure are obtained by the at least one processor. The reference signal is labeled with a labeled geometric attribute of the hole structure. An estimated geometric attribute of the hole structure is estimated using the model. A parameter of the model is adjusted based, at least in part, on a difference between the labeled geometric attribute and the estimated geometric attribute in each of the training samples by the at least one processor.

Abstract: Methods of peak power management (PPM) for a storage system having multiple memory dies are disclosed. Each memory die includes a first PPM circuit and a second PPM circuit. First PPM circuits of the multiple memory dies are electrically connected to form a first PPM group. Similarly, second PPM circuits are electrically connected to form a second PPM group. Peak power operations can be managed by switching on a first pull-down driver of the first PPM circuit on a selected memory die when a first PPM enablement signal of the first PPM group is zero; waiting for a first delay period; switching on a second pull-down driver of the second PPM circuit on the selected memory die when a second PPM enablement signal of the second PPM group is zero. The first and second PPM enablement signals depend on the current flowing through each pull-down driver in the first and second PPM groups.

Abstract: The present disclosure is directed to methods and systems for analyzing integrated circuits. The method includes performing a first resistor capacitor (RC) extraction process on a power-receiving circuit and producing a first RC model. The method also includes scanning a netlist of a power distribution network, the power distribution network electrically connected to the power-receiving circuit. The method further includes determining a selection of circuit elements of the power distribution network based on a predetermined criteria. The method further includes performing a second RC extraction process on the selection of circuit elements and producing a second RC model. The method further includes performing a simulation process on the power-receiving circuit and the power distribution network using the first and second RC models.

Abstract: Aspects of the disclosure provide a semiconductor device and a method to manufacture the semiconductor device. A channel hole is formed in a stack including alternating first layers and second layers. The stack is formed over a substrate of the semiconductor device. A gate dielectric layer and a channel layer are sequentially formed in the channel hole. Laser annealing is performed on the channel layer using laser light. An incidence angle of the laser light on an upper surface of the channel layer causes a total internal reflection to occur at an interface between the channel layer and the gate dielectric layer and an interface between the channel layer and an insulating layer that is adjacent to the channel layer.

Abstract: Embodiments of methods for forming a hybrid-bonded semiconductor structure are disclosed. The method include disposing first second, third, and fourth dielectric layers, forming first and second openings by etching the fourth dielectric layer using a first etching selectivity, etching the third and fourth dielectric layers in the first and second openings respectively using a second etching selectivity, etching the second and third dielectric layers in the first and second openings using the first etching selectivity, etching the first dielectric layer in the first opening and the second dielectric layer in the second opening using the second etching selectivity, etching the first dielectric layer in the first and second openings using the first etching selectivity, and forming conductive material in the first and second openings.

Abstract: A bias circuit, a memory system, and a method of boosting a voltage level of a first bit line are provided. The bias circuit includes a first current generator, a second current generator, and a bit line bias generator. The first current generator is configured to generate a first replica charging current according to a charging current flowing through a voltage bias transistor. The second current generator is configured to generate a first replica cell current according to a cell current flowing through a common source transistor. The bit line bias generator is coupled to a first page buffer, the first current generator, and the second current generator, and configured to generate a bit line bias voltage, supplied to the first page buffer, according to a comparison of the first replica charging current and the first replica cell current.

Abstract: Aspects of the disclosure provide a semiconductor device including a string of transistors stacked in a vertical direction over a substrate of the semiconductor device having a channel structure extending in the vertical direction. The string of transistors includes a first substring arranged along a first portion of the channel structure, a second substring arranged along a second portion of the channel structure, and a third substring arranged along a third portion of the channel structure. The second substring is between the first and the third substrings. Gate structures of transistors in the first substring are separated by first insulating layers. Gate structures of transistors in the second substring are separated by second insulating layers. Gate structures of transistors in the third substring are separated by third insulating layers. A volumetric mass density of the second insulating layers is lower than a volumetric mass density of the third insulating layers.

Abstract: Embodiments of 3D memory devices having staircase structures and methods for forming the same are disclosed. In an example, a 3D memory device includes a memory array structure and a staircase structure in an intermediate of the memory array structure and laterally dividing the memory array structure into first and second memory array structures. The staircase structure includes a first staircase zone and a bridge structure connecting the first and second memory array structures. The first staircase zone includes a first pair of staircases facing each other in a first lateral direction and at different depths. Each staircase includes a plurality of stairs. Each staircase includes divisions in a second lateral direction perpendicular to the first lateral direction at different depths. At least one stair in the first pair of staircases is electrically connected to at least one of the first and second memory array structures through the bridge structure.

Abstract: A method of cache programming of a NAND flash memory in a triple-level-cell (TLC) mode is provided. The method includes discarding a lower page of a first programming data from a first set of data latches in a plurality of page buffers when a first group of logic states are programmed and verified. The page buffers include the first, second and third sets of data latches configured to store the lower page, a middle page and an upper page of programming data, respectively. The method also includes uploading a lower page of second programming data to a set of cache latches, transferring the lower page of the second programming data from the set of cache latches to the second set of data latches after the discarding the middle page of the first programming data, and uploading a middle page of the second programming data to the set of cache latches.

Abstract: Embodiments of a peak power management (PPM) circuit on a memory die are disclosed. The PPM circuit includes a first transistor and a second transistor arranged in parallel, wherein the first and second transistors each has a drain terminal electrically connected to a first power source and a second power source, respectively. The PPM circuit also includes a resistor having a first terminal electrically connected to respective source terminals of the first and second transistors. The PPM circuit further includes a first contact pad on the memory die, electrically connected to a second contact pad on a different memory die through a die-to-die connection. The PPM circuit also includes a third transistor with a drain terminal electrically connected to a second terminal of the resistor, and a source terminal electrically connected to the first contact pad.

Abstract: A three-dimensional (3D) memory device may include a first set of memory layers, a second set of memory layers above the first set of memory layers, and a first dummy memory layer between the first and second sets of memory layers. The 3D memory device may further include a peripheral circuit that includes a word line (WL) driving circuit configured to when programming a first memory layer of the first set of memory layers, apply a first pre-charge voltage to the first dummy memory layer during a pre-charge period associated with the first memory layer, and when programming a second memory layer of the first set of memory layers located above the first memory layer, apply a second pre-charge voltage to the first dummy memory layer during a pre-charge period associated with the second memory layer. The first pre-charge voltage may be larger than the second pre-charge voltage.

Abstract: Disclosed is a memory device comprising: a memory cell array having a plurality of rows of memory cells; a plurality of word lines coupled to the plurality of rows of memory cells respectively; wherein the memory device is configured to perform programming operations on a target memory cell in the plurality of rows of memory cells, wherein during the programming operations: applying a programming voltage to a selected word line corresponding to a row where the target memory cell locates to program the target memory cell to a target programming state; applying a predetermined voltage to the selected word line to reduce voltage changes caused by capacitive coupling between an unselected word line adjacent to the selected word line and the selected word line; and applying a verification voltage to the selected word line to perform verification operations to verify whether a threshold voltage of the target memory cell is larger than a target threshold voltage corresponding to the target programming state based on

Abstract: Embodiments of structure and methods for forming a memory device are provided. In an example, a memory device includes a substrate, a stack above the substrate, a channel structure, and a source contact structure each extending vertically through the memory stack. The source contact structure includes (i) a plurality of first source contact portions each extending vertically and laterally separated from one another and (ii) a second source contact portion extending vertically over and in contact with the plurality of first source contact portions, the second source contact portion being laterally continuous.