Patents Assigned to Yasuhiko Yoshida
  • Method for reforming surface
    Patent number: 5346728
    Abstract: The present invention has an object to ensure advanced use of plasma and obtain a plasma-treated reformed surface.In order to realize the objects above-mentioned, the present invention comprises the step of treating the surface of a macromolecular material with iodine plasma.
    Type: Grant
    Filed: March 31, 1993
    Date of Patent: September 13, 1994
    Assignees: C. Itoh Fine Chemical Co., Ltd., Yoichi Murayama, Yasuhiko Yoshida
    Inventor: Yasuhiko Yoshida