Abstract: An ultra-fine microfabrication method using an energy beam is based on the use of shielding provided by nanometer or micrometer sized micro-particles to produce a variety of three-dimensional fine structures which have not been possible by the traditional photolithographic technique which is basically designed to produce two-dimensional structures. When the basis technique of radiation of an energy beam and shielding is combined with a shield positioning technique using a magnetic, electrical field or laser beam, with or without the additional chemical effects provided by reactive gas particle beams or solutions, fine structures of very high aspect ratios can be produced with precision. Applications of devices having the fine structures produced by the method include wavelength shifting in optical communications, quantum effect devices and intensive laser devices.

Abstract: Three-dimensional ultra-fine micro-fabricated structures of the order of .mu.m and less are produced for use in advanced optical communication systems and quantum effect devices. Basic components are an energy beam source, a mask member and a specimen stage. The mask member is an independent component, and various combinations of relative movements of the mask member with respect to the beam axis and/or workpiece can be made with high precision to produce curved or slanted surfaces on a workpiece, thereby producing multiple lines or arrays of convex or concave micro-lenses. Other examples of fine-structures include deposition of thin films in a multiple line pattern or in an array pattern. Because of flexibility of fabrication and material, labyrinth seals having curved surfaces with grooved structures can be used as friction reduction devices for bearing components. Fine groove dimensions of the order of nm are possible.

Abstract: An ultra-fine microfabrication method using an energy beam is based on the use of shielding provided by nanometer or micrometer sized micro-particles to produce a variety of three-dimensional fine structures which have not been possible by the traditional photolithographic technique which is basically designed to produce two-dimensional structures. When the basis technique of radiation of an energy beam and shielding is combined with a shield positioning technique using a magnetic, electrical field or laser beam, with or without the additional chemical effects provided by reactive gas particle beams or solutions, fine structures of very high aspect ratios can be produced with precision. Applications of devices having the fine structures produced by the method include wavelength shifting in optical communications, quantum effect devices and intensive laser devices.

Abstract: An ultra-fine microfabrication method using an energy beam is based on the use of shielding provided by nanometer or micrometer sized micro-particles to produce a variety of three-dimensional fine structures which have not been possible by the traditional photolithographic technique which is basically designed to produce two-dimensional structures. When the basis technique of radiation of an energy beam and shielding is combined with a shield positioning technique using a magnetic, electrical field or laser beam, with or without the additional chemical effects provided by reactive gas particle beams or solutions, fine structures of very high aspect ratios can be produced with precision. Applications of devices having the fine structures produced by the method include wavelength shifting in optical communications, quantum effect devices and intensive laser devices.

Abstract: An energy beam source is used in micro-fabrication tasks, such as fabrication of specific patterns, in-situ bonding, repair, connection and disconnection of electrical paths, applicable to semiconductor devices and other micro-sized circuits in integrated circuits. The beam source is made compact so that several sources can be located inside a vacuum vessel and in conjunction with micro-manipulators or micro-movement stages operated under light or an electron microscope. The beam source is provided with at least three electrodes, and by applying a selected voltage, i.e., high frequency voltage, direct current voltage and ground voltage, on each the three electrodes in association with film-forming substance(s), virtually any type of deposit can be formed at any location of a workpiece.

Abstract: An energy beam source is used in micro-fabrication tasks, such as fabrication of specific patterns, in-situ bonding, repair, connection and disconnection of electrical paths, applicable to semiconductor devices and other micro-sized circuits in integrated circuits. The beam source is made compact so that several sources can be located inside a vacuum vessel and in conjunction with micro-manipulators or micro-movement stages operated under light or an electron microscope. The beam source is provided with at least three electrodes, and by applying a selected voltage, i.e., high frequency voltage, direct current voltage and ground voltage, on each the three electrodes in association with film-forming substance(s), virtually any type of deposit can be formed at any location of a workpiece.

Abstract: An ultra-fine microfabrication method using an energy beam is based on the use of shielding provided by nanometer or micrometer sized micro-particles to produce a variety of three-dimensional fine structures which have not been possible by the traditional photolithographic technique which is basically designed to produce two-dimensional structures. When the basic technique of radiation of an energy beam and shielding is combined with a shield positioning technique using a magnetic, electrical field or laser beam, with or without the additional chemical effects provided by reactive gas particle beams or solutions, fine structures of very high aspect ratios can be produced with precision. The microfabrication method include radiating a Fast Atomic beam through a patterned photoresist Film to fabricate a pattern of 0.1 to 100 nm in a target object.

Abstract: Three-dimensional ultra-fine micro-fabricated structures of the order of .mu.m and less are produced for use in advanced optical communication systems and quantum effect devices. The basic components are an energy beam source, a mask member and a specimen stage. Because the mask member is an independent component, various combinations of relative movements of the mask member with respect to the beam axis and/or workpiece can be made with high precision to produce curved or slanted surfaces on a workpiece, thereby producing a multiple lines or arrays of convex or concave micro-lenses. Other examples of fine-structures include deposition of thin films in a multiple line pattern or in an array pattern. Because of the flexibility of fabrication method and material of fabrication, labyrinth seals having curved surfaces with grooved structures can be used as friction reduction means for bearing components. Fine groove dimensions of the order of nm are possible.

Abstract: A micro-working apparatus performs fabrication and assembly tasks for micron/nanometer sized objects while progress of operations is observed in real-time by at least a pair of optical or electron microscopes to provide simultaneous views from at least two directions. This offers spatial visual information regarding the working space which is particularly critical in micro-working. Micro-working is further facilitated by the use of a micro-pallet device specially designed for use in the apparatus, but also offering other application possibilities. Rotational and parallel translation movements provided by the micro-pallet combined with the micro-working capability of the apparatus are utilized to enable production of micron-sized parts for use in advanced applications of optical and electronic devices.

Abstract: An energy beam is irradiated to a workpiece through a beam transmission hole defined in a mask. At that time, a relative position between an energy beam source and the mask or the mask and the workpiece is changed, so that machining depth of the workpiece is varied depending on machining portions of the workpiece, which correspond to amounts of irradiation of the energy beam. With this method, a machined product having locally different depths very easily can be made and further the product can be machined to desired depths with high accuracy by a single machining operation in a short time.

Abstract: A profile working machine includes a support portion, a working portion, and a drive and control system.

Abstract: A fine positioning device is constructed of a parallel flexible-beam displacement mechanism and/or a radial flexible-beam displacement mechanism. The former displacement mechanism comprises a first rigid portion rigid against forces, a second rigid portion rigid against forces, plural parallel flexible beams connecting the first and second rigid portions together, and a first actuator adapted to have the plural flexible beams undergo bending deformation. The latter displacement mechanism comprises a third rigid portion rigid against torques, a fourth rigid portion rigid against torques, plural radial flexible beams connecting the third and fourth rigid portions together, and a second actuator adapted to have the plural flexible beams undergo bending deformation. The fine positioning device can obtain fine linear displacements and/or fine angular displacement with good accuracy. This invention also facilitates the construction of multi-axis positioning devices.

Abstract: A multi-axis load sensor is composed of at least one of a parallel plate structure connecting two members to each other by means of a plurality of flexible beams arranged in parallel to one another and a radial plate structure connecting the two members to each other by means of a plurality of flexible beams arranged radially relative to a given point and equipped with detection means for detecting deformations of the associated flexible beams. The deformations are of the bending deformation mode and are developed by a load applied to the associated flexible beams. At least one of the associated flexible beams is provided with another detection means for detecting deformations of a deformation mode different from the bending mode. The multi-axis load sensor is simple in structure and easily machined.

Abstract: A profile working machine is equipped with a support for holding a work in place, a working tool for machining the work, and drive and control systems for controlling the relative displacements between the support and the working tool. The profile working machine is to machine the work into a desired profile.