Abstract: The present invention provides an ultraviolet light irradiation device having a planer UV light source in which the irradiation intensity of UV light can be adjusted finely in a wider range. The ultraviolet light irradiation device of the present invention comprises an UV light source and a housing that holds the planer UV light source. In the UV light source, a plurality of thin plasma tubes, each of which has an UV phosphor layer formed therein, are arranged in parallel with each other on an electrode support sheet, and drive circuits apply a pulse voltage to electrode pairs provided between the electrode support sheet and an array of the thin plasma tubes. A control circuit controls a factor of the pulse voltage to be applied to the electrode pairs so as to adjust the irradiation intensity of the UV light.
Abstract: A large-area and high-luminance deep ultraviolet light source device is provided under circumstances where the scales of existing mercury lamps used as ultraviolet light sources cannot be reduced and light-emitting diodes of 365 nm or less do not reach the practical level. The deep ultraviolet light source device comprises at least an anode substrate having an ultraviolet phosphor thin film doped with rare-earth metal ions such as gadolinium (Gd) ions and containing with aluminum nitride as the host material, a cathode substrate having a field electron emission material thin film, a spacer for holding the anode substrate and the cathode substrate opposite to each other and maintaining the space between the substrates in a vacuum atmosphere, and a voltage circuit for applying an electric field to the space between the anode substrate and the cathode substrate.
Type:
Grant
Filed:
September 3, 2008
Date of Patent:
February 21, 2012
Assignees:
National University Corporation KOBE University, Yumex, Inc.
Abstract: The present invention provides an ultraviolet light irradiation device having a planer UV light source in which the irradiation intensity of UV light can be adjusted finely in a wider range. The ultraviolet light irradiation device of the present invention comprises an UV light source and a housing that holds the planer UV light source. In the UV light source, a plurality of thin plasma tubes, each of which has an UV phosphor layer formed therein, are arranged in parallel with each other on an electrode support sheet, and drive circuits apply a pulse voltage to electrode pairs provided between the electrode support sheet and an array of the thin plasma tubes. A control circuit controls a factor of the pulse voltage to be applied to the electrode pairs so as to adjust the irradiation intensity of the UV light.