Patents Assigned to Zond, LLC
  • Publication number: 20190368030
    Abstract: A high current density plasma generator includes a chamber that contains a feed gas. An anode is positioned in the chamber. A cathode assembly is position adjacent to the anode inside the chamber. A power supply having an output is electrically connected between the anode and the cathode assembly. The power supply generates at the output an oscillating voltage that produces a plasma from the feed gas. At least one of an amplitude, frequency, rise time, and fall time of the oscillatory voltage is chosen to increase an ionization rate of the feed gas.
    Type: Application
    Filed: August 12, 2019
    Publication date: December 5, 2019
    Applicant: Zond, LLC
    Inventor: Roman CHISTYAKOV
  • Publication number: 20180044780
    Abstract: A plasma generator includes a chamber for confining a feed gas. An anode is positioned inside the chamber. A cathode assembly is positioned adjacent to the anode inside the chamber. A pulsed power supply comprising at least two solid state switches and having an output that is electrically connected between the anode and the cathode assembly generates voltage micropulses. A pulse width and a duty cycle of the voltage micropulses are generated using a voltage waveform comprising voltage oscillation having amplitudes and frequencies that generate a strongly ionized plasma.
    Type: Application
    Filed: October 23, 2017
    Publication date: February 15, 2018
    Applicant: Zond, LLC
    Inventors: Roman Chistyakov, Bassam Hanna Abraham
  • Publication number: 20150315697
    Abstract: A plasma generator includes a chamber for confining a feed gas. An anode is positioned inside the chamber. A cathode assembly is positioned adjacent to the anode inside the chamber. A pulsed power supply comprising at least two solid state switches and having an output that is electrically connected between the anode and the cathode assembly generates voltage micropulses. A pulse width and a duty cycle of the voltage micropulses are generated using a voltage waveform comprising voltage oscillation having amplitudes and frequencies that generate a strongly ionized plasma.
    Type: Application
    Filed: July 15, 2015
    Publication date: November 5, 2015
    Applicant: Zond, LLC
    Inventors: Roman Chistyakov, Bassam Hanna Abraham
  • Publication number: 20150315698
    Abstract: A high current density plasma generator includes a chamber that contains a feed gas. An anode is positioned in the chamber. A cathode assembly is position adjacent to the anode inside the chamber. A power supply having an output is electrically connected between the anode and the cathode assembly. The power supply generates at the output an oscillating voltage that produces a plasma from the feed gas. At least one of an amplitude, frequency, rise time, and fall time of the oscillatory voltage is chosen to increase an ionization rate of the feed gas.
    Type: Application
    Filed: July 13, 2015
    Publication date: November 5, 2015
    Applicant: ZOND, LLC
    Inventor: Roman Chistyakov
  • Patent number: 9123508
    Abstract: A plasma generator includes a chamber for confining a feed gas. An anode is positioned inside the chamber. A cathode assembly is positioned adjacent to the anode inside the chamber. A pulsed power supply comprising at least two solid state switches and having an output that is electrically connected between the anode and the cathode assembly generates voltage micropulses. A pulse width and a duty cycle of the voltage micropulses are generated using a voltage waveform comprising voltage oscillation having amplitudes and frequencies that generate a strongly ionized plasma.
    Type: Grant
    Filed: January 20, 2011
    Date of Patent: September 1, 2015
    Assignee: Zond, LLC
    Inventors: Roman Chistyakov, Bassam Hanna Abraham